Encapsulant film based on functionalized polyolefins
US-2025374687-A1 · Dec 4, 2025 · US
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Acyclic compounds
Acyclic compounds · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C08F16/04 |
| Official title | Acyclic compounds |
| Display label | Acyclic compounds |
| Total patents | 14 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is rapidly declining.
| Year | Patents |
|---|---|
| 2015 | 2 |
| 2016 | 1 |
| 2017 | 3 |
| 2018 | 3 |
| 2019 | 1 |
| 2020 | 1 |
| 2021 | 2 |
| 2025 | 1 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Water-based barrier coatings
US-11118079-B2 · Sep 14, 2021 · US
Antifouling film
US-10913862-B2 · Feb 9, 2021 · US
Method for producing hydroxyl group-containing vinyl ether polymer
US-10633469-B2 · Apr 28, 2020 · US
Antifouling film
US-2019338149-A1 · Nov 7, 2019 · US
Water-based barrier coatings
US-2018355204-A1 · Dec 13, 2018 · US
Polymerizable composition and optically anistropic body using same
US-2018277780-A1 · Sep 27, 2018 · US
Improved method for producing hydroxyl group-containing vinyl ether polymer
US-2018179305-A1 · Jun 28, 2018 · US
Resist composition and patterning process
US-9846360-B2 · Dec 19, 2017 · US
Method for producing copolymer for semiconductor lithography containing reduced amount of metal impurities, and method for purifying polymerization initiator for production of copolymer
US-9546133-B2 · Jan 17, 2017 · US
Resist composition and patterning process
US-2017003590-A1 · Jan 5, 2017 · US
Method for producing copolymer for semiconductor lithography containing reduced amount of metal impurities, and method for purifying polymerization initiator for production of copolymer
US-2016023992-A1 · Jan 28, 2016 · US
Method for producing copolymer for semiconductor lithography containing reduced amount of metal impurities, and method for purifying polymerization initiator for production of copolymer
US-9216948-B2 · Dec 22, 2015 · US
Recording medium for ink jet ink, ink jet printed material, and method for producing the same
US-9005726-B2 · Apr 14, 2015 · US