Positive-tone organometallic euv resists
US-2026056462-A1 · Feb 26, 2026 · US
Aromatic compounds
Aromatic compounds · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C07F9/92 |
| Official title | Aromatic compounds |
| Display label | Aromatic compounds |
| Total patents | 27 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is growing.
| Year | Patents |
|---|---|
| 2015 | 1 |
| 2017 | 1 |
| 2021 | 3 |
| 2022 | 4 |
| 2023 | 6 |
| 2024 | 5 |
| 2025 | 5 |
| 2026 | 2 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Resist composition and method of forming pattern by using the same
US-2026016747-A1 · Jan 15, 2026 · US
Photoacid generator for chemically amplified photoresists for deep ultra violet and extreme ultraviolet lithography
US-12306535-B2 · May 20, 2025 · US
Photoacid generator for chemically amplified photoresists
US-12242190-B2 · Mar 4, 2025 · US
Photoacid generator
US-12216402-B2 · Feb 4, 2025 · US
Lithography compositions and methods for forming resist patterns and/or making semiconductor devices
US-2025036023-A1 · Jan 30, 2025 · US
EUV photoresist with low-activation-energy ligands or high-developer-solubility ligands
US-12210283-B2 · Jan 28, 2025 · US
Photoresist for semiconductor fabrication
US-2024385516-A1 · Nov 21, 2024 · US
Organometallic photoresists for DUV or EUV lithography
US-12135503-B2 · Nov 5, 2024 · US
Photoresist for semiconductor fabrication
US-12044966-B2 · Jul 23, 2024 · US
Photoacid generator
US-2024069442-A1 · Feb 29, 2024 · US
Photoacid generators, photoresist compositions, and pattern formation methods
US-2024027905-A1 · Jan 25, 2024 · US
Photoacid generator
US-11846886-B2 · Dec 19, 2023 · US
Photoresist for semiconductor fabrication
US-2023367208-A1 · Nov 16, 2023 · US
Euv Photoresist With Low-Activation-Energy Ligands Or High-Developer-Solubility Ligands
US-2023305396-A1 · Sep 28, 2023 · US
Photoresist for semiconductor fabrication
US-11726405-B2 · Aug 15, 2023 · US
Photoacid generator for chemically amplified photoresists for deep ultraviolet and extreme ultraviolet lithography
US-2023229077-A1 · Jul 20, 2023 · US
EUV photoresist with low-activation-energy ligands or high-developer-solubility ligands
US-11681221-B2 · Jun 20, 2023 · US
Organometallic photoresists for duv or euv lithography
US-2022317572-A1 · Oct 6, 2022 · US
Photoacid generator for chemically amplified photoresists
US-2022308448-A1 · Sep 29, 2022 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C07F9/92?
- CPC C07F9/92 is the Cooperative Patent Classification code for “Aromatic compounds.”
- How many patents are filed under CPC C07F9/92 (Aromatic compounds)?
- Our database includes 27 publications tagged with this CPC code.
- Is patent activity under CPC C07F9/92 growing?
- Publication counts under this code: 5 in 2024 vs 5 in 2025 (latest complete years).