Method for producing fluoroalkoxide
US-12338213-B2 · Jun 24, 2025 · US
containing halogen
containing halogen · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C07C59/115 |
| Official title | containing halogen |
| Display label | containing halogen |
| Total patents | 39 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is rapidly declining.
| Year | Patents |
|---|---|
| 2015 | 2 |
| 2016 | 4 |
| 2017 | 1 |
| 2018 | 3 |
| 2019 | 5 |
| 2020 | 6 |
| 2021 | 6 |
| 2022 | 4 |
| 2023 | 3 |
| 2024 | 3 |
| 2025 | 2 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Onium salt, chemically amplified resist composition and patterning process
US-12240804-B2 · Mar 4, 2025 · US
Derivatives of sobetirome
US-2024425437-A1 · Dec 26, 2024 · US
Sulfonium salt, resist composition and pattern forming process
US-2024302740-A1 · Sep 12, 2024 · US
Resist composition and patterning process
US-12001139-B2 · Jun 4, 2024 · US
Fluorinated beta-hydroxybutyric acids for PET imaging
US-11833228-B2 · Dec 5, 2023 · US
Resist composition and pattern forming process
US-11720019-B2 · Aug 8, 2023 · US
Radiation-sensitive resin composition and resist pattern-forming method
US-11609495-B2 · Mar 21, 2023 · US
Iodonium salt, resist composition, and pattern forming process
US-11448961-B2 · Sep 20, 2022 · US
Radiation-sensitive resin composition, resist pattern-forming method, acid diffusion control agent, carboxylic acid salt and carboxylic acid
US-11320735-B2 · May 3, 2022 · US
Onium salt, chemically amplified resist composition and patterning process
US-2022127225-A1 · Apr 28, 2022 · US
Resist composition and patterning process
US-2022043343-A1 · Feb 10, 2022 · US
4-hydroxybutyric acid analogs
US-2021403407-A1 · Dec 30, 2021 · US
Radiation-sensitive resin composition and resist pattern-forming method
US-2021389667-A9 · Dec 16, 2021 · US
Resist composition and patterning process
US-11181823-B2 · Nov 23, 2021 · US
Resist composition and pattern forming process
US-2021278763-A1 · Sep 9, 2021 · US
Radiation-sensitive resin composition and resist pattern-forming method
US-2021124263-A1 · Apr 29, 2021 · US
Fluorinated beta-hydroxybutyric acids for pet imaging
US-2021046196-A1 · Feb 18, 2021 · US
Derivatives of sobetirome
US-10870616-B2 · Dec 22, 2020 · US
Derivatives of sobetirome
US-2020325092-A1 · Oct 15, 2020 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C07C59/115?
- CPC C07C59/115 is the Cooperative Patent Classification code for “containing halogen.”
- How many patents are filed under CPC C07C59/115 (containing halogen)?
- Our database includes 39 publications tagged with this CPC code.
- Is patent activity under CPC C07C59/115 growing?
- Publication counts under this code: 3 in 2024 vs 2 in 2025 (latest complete years).