Radiation-sensitive resin composition, method for forming resist pattern and compound
US-12092957-B2 · Sep 17, 2024 · US
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Monohydroxylic alcohols containing saturated rings
Monohydroxylic alcohols containing saturated rings · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C07C31/13 |
| Official title | Monohydroxylic alcohols containing saturated rings |
| Display label | Monohydroxylic alcohols containing saturated rings |
| Total patents | 9 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is stable.
| Year | Patents |
|---|---|
| 2015 | 1 |
| 2016 | 1 |
| 2018 | 2 |
| 2019 | 1 |
| 2021 | 1 |
| 2022 | 1 |
| 2023 | 1 |
| 2024 | 1 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Method for treating aqueous effluent
US-11746027-B2 · Sep 5, 2023 · US
Radiation-sensitive resin composition, method for forming resist pattern and compound
US-2022043350-A1 · Feb 10, 2022 · US
Method for treating aqueous effluent
US-2021269332-A1 · Sep 2, 2021 · US
Cyclopropanation of substituted alkenes
US-10227269-B2 · Mar 12, 2019 · US
Novel aroma chemicals having a 1,2,2-trimethylcyclopentan-1-yl moiety
US-2018171262-A1 · Jun 21, 2018 · US
Cyclopropanation of substituted alkenes
US-2018170830-A1 · Jun 21, 2018 · US
Compound having cyclopropane ring, and flavor and/or fragrance composition containing same
US-9296675-B2 · Mar 29, 2016 · US
Compound having cyclopropane ring, and flavor and/or fragrance composition containing same
US-2015353461-A1 · Dec 10, 2015 · US