Compositions comprising base-reactive component and processes for photolithography
US-11106137-B2 · Aug 31, 2021 · US
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Wang Deyan patents
Wang Deyan holds 13 patents in our database, with recent filings and technology areas summarized below.
| Metric | Value |
|---|---|
| Total patents | 13 |
| Recent patents | 0 |
| First publication | Apr 14, 2015 |
| Latest publication | Aug 31, 2021 |
Filing trend
Year-over-year patent counts for this assignee.
Recent patents
Latest publications where this party is an assignee.
Compositions comprising hetero-substituted carbocyclic aryl component and processes for photolithography
US-2019346763-A1 · Nov 14, 2019 · US
Compositions comprising hetero-substituted carbocyclic aryl component and processes for photolithography
US-10359698-B2 · Jul 23, 2019 · US
Processes for photolithography
US-10180627-B2 · Jan 15, 2019 · US
Coating compositions for photoresists
US-9958780-B2 · May 1, 2018 · US
Notable patents
Representative or frequently cited publications from precomputed assignee stats.
Compositions comprising base-reactive component and processes for photolithography
US-11106137-B2 · Aug 31, 2021 · US
Compositions comprising hetero-substituted carbocyclic aryl component and processes for photolithography
US-2019346763-A1 · Nov 14, 2019 · US
Compositions comprising hetero-substituted carbocyclic aryl component and processes for photolithography
US-10359698-B2 · Jul 23, 2019 · US
Processes for photolithography
US-10180627-B2 · Jan 15, 2019 · US
Coating compositions for photoresists
US-9958780-B2 · May 1, 2018 · US
Top CPC classifications
Most common classification codes in this portfolio.
| CPC | Patents |
|---|---|
| G03F7/2041 | 13 |
| G03F7/0392 | 11 |
| G03F7/0045 | 10 |
| G03F7/0046 | 10 |
| G03F7/0382 | 9 |
Technology areas
Mapped technology topics for this assignee.
| Technology | Patents |
|---|---|
| Physics | 13 |
| Electricity | 4 |
| Chemistry & Metallurgy | 2 |