Coating compositions for photoresists

Patent metadata

Field	Value
Publication number	US-9958780-B2
Application number	US-85821310-A
Country	US
Kind code	B2
Filing date	Aug 17, 2010
Priority date	Jan 8, 2006
Publication date	May 1, 2018
Grant date	May 1, 2018

Abstract

In one aspect, the present invention relates to coating compositions that comprise a resin component, wherein the predominant portion of the resin component comprising one or more resins that are at least substantially free of fluorine. Coating compositions of the invention are useful as photoresist overcoat layers, including in immersion lithography processing.

First claim

What is claimed is:

1. A coated substrate comprising:
(a) a coating layer of a photoresist composition;
(b) above the photoresist composition, an applied composition comprising a resin component, the predominant portion of the resin component comprising one or more resins that are at least substantially free of fluorine.

2. The substrate of claim 1 wherein the resin component comprises an acrylate polymer that is at least substantially free of fluorine.

3. The substrate of claim 1 wherein the applied composition further comprises an acid generator compound.

4. The substrate of claim 2 wherein the applied composition further comprises a fluorinated component.

5. The substrate of claim 1 wherein the applied composition comprises a polymer that has one or more non-acrylate repeat units.

6. A method for processing an electronic device substrate, comprising:
(a) applying a photoresist layer on substrate;
(b) applying above the photoresist layer a composition comprising a resin component, the predominant portion of the resin component comprising one or more resins that are at least substantially free of fluorine.

7. The method of claim 6 wherein the resin comprises (1) an acrylate polymer that is at least substantially free of fluorine; and (2) optionally one or more of (i) a fluorinated resin, (ii) acid or acid generator compound and (iii) surfactant.

8. The method of claim 6 wherein the applied composition further comprises acid generator compound.

9. The method of claim 6 further comprising immersion exposing the photoresist layer.

10. A coating composition removable with an aqueous alkaline developer composition, the coating composition comprising:
(i) a composition comprising a resin component, the predominant portion of the resin component comprising one or more resins that ae at least substantially free of fluorine, at least one or more of the resins comprising (a) acrylate repeat units and (b) non-acrylate repeat units;
(ii) a fluorinated component; and
(iii) an acid or acid generator compound.

11. The substrate of claim 1 wherein the resin component comprises one or more of:
methylmethacrylate-mono-n-butylmaleate-isonorbornylacrylate terpolymer;
poly(vinylalcohol-co-vinylacetate);
poly(methacrylic acid-co-methyl methacrylate-co- 2-acrylamido-2-methylpropanesulfonic acid);
poly(methacrylic acid-co-hydroxy ethyl acrylate-co- 2-acrylamido-2-methylpropanesulfonic acid);
poly(methacrylic acid-co-methyl methacrylate);
poly(vinyl acetate-co-butyl maleate-co-isobornyl acrylate);
poly(tert butyl acrylate-co-methyl methacrylate-co-methacrylic acid);
poly(tert butyl acrylate-co-methyl methacrylate-co-acrylic acid);
poly(methacrylic acid-co-methyl methacrylate-co- 2-acrylamido-2-methylpropanesulfonic acid);
poly(tert butyl methacrylate-co-methyl acrylate-co-methacrylic acid);
poly(tert butyl methacrylate-co-methacrylic acid);
poly(methacrylic acid-co-methyl methacrylate-co- 2-acrylamido-2-methylpropanesulfonic acid);
poly(tert butyl methacrylate-co-methyl methacrylate-co-methacrylic acid);
poly(styrene-co-maleic anhydride);
poly(methyl vinyl ether-alt-maleic anhydride);
poly(tert-butyl acrylate-co-ethyl acrylate-co-methacrylic acid;
poly(styrene-co-maleic anhydride);
esterified poly(styrene-co-maleic anhydride)
poly(maleic anhydride-alt-1-octadecene); and
poly(isobutylene-alt-maleic anhydride).

12. The method of claim 6 wherein the resin component comprises one or more of:
methylmethacrylate-mono-n-butylmaleate-isonorbornylacrylate terpolymer;
poly(vinylalcohol-co-vinylacetate);
poly(methacrylic acid-co-methyl methacrylate-co- 2-acrylamido-2-methylpropanesulfonic acid);
poly(methacrylic acid-co-hydroxy ethyl acrylate-co- 2-acrylamido-2-methylpropanesulfonic acid);
poly(methacrylic acid-co-methyl methacrylate);
poly(vinyl acetate-co-butyl maleate-co-isobornyl acrylate);
poly(tert butyl acrylate-co-methyl methacrylate-co-methacrylic acid);
poly(tert butyl acrylate-co-methyl methacrylate-co-acrylic acid);
poly(methacrylic acid-co-methyl methacrylate-co- 2-acrylamido-2-methylpropanesulfonic acid);
poly(tert butyl methacrylate-co-methyl acrylate-co-methacrylic acid);
poly(tert butyl methacrylate-co-methacrylic acid);
poly(methacrylic acid-co-methyl methacrylate-co- 2-acrylamido-2-methylpropanesulfonic acid);
poly(tert butyl methacrylate-co-methyl methacrylate-co-methacrylic acid);
poly(styrene-co-maleic anhydride);
poly(methyl vinyl ether-alt-maleic anhydride);
poly(tert-butyl acrylate-co-ethyl acrylate-co-methacrylic acid;
poly(styrene-co-maleic anhydride);
esterified poly(styrene-co-maleic anhydride)
poly(maleic anhydride-alt-1-octadecene); and
poly(isobutylene-alt-maleic anhydride).

13. The coating composition of claim 10 wherein the resin component comprises one or more of:
methylmethacrylate-mono-n-butylmaleate-isonorbornylacrylate terpolymer;
poly(vinylalcohol-co-vinylacetate);
poly(methacrylic acid-co-methyl methacrylate-co- 2-acrylamido-2-methylpropanesulfonic acid);
poly(methacrylic acid-co-hydroxy ethyl acrylate-co- 2-acrylamido-2-methylpropanesulfonic acid);
poly(methacrylic acid-co-methyl methacrylate);
poly(vinyl acetate-co-butyl maleate-co-isobornyl acrylate);
poly(tert butyl acrylate-co-methyl methacrylate-co-methacrylic acid);
poly(tert butyl acrylate-co-methyl methacrylate-co-acrylic acid);
poly(methacrylic acid-co-methyl methacrylate-co- 2-acrylamido-2-methylpropanesulfonic acid);
poly(tert butyl methacrylate-co-methyl acrylate-co-methacrylic acid);
poly(tert butyl methacrylate-co-methacrylic acid);
poly(methacrylic acid-co-methyl methacrylate-co- 2-acrylamido-2-methylpropanesulfonic acid);
poly(tert butyl methacrylate-co-methyl methacrylate-co-methacrylic acid);
poly(styrene-co-maleic anhydride);
poly(methyl vinyl ether-alt-maleic anhydride);
poly(tert-butyl acrylate-co-ethyl acrylate-co-methacrylic acid;
poly(styrene-co-maleic anhydride);
esterified poly(styrene-co-maleic anhydride)
poly(maleic anhydride-alt-1-octadecene); and
poly(isobutylene-alt-maleic anhydride).

14. The coated substrate of claim 1 wherein at least 50 weight percent of all coating materials percent of all polymeric materials present in the coating composition comprise one or more resins that are at least substantially free of fluorine.

15. The coated substrate of claim 1 wherein at least 60 weight percent of all coating materials percent of all polymeric materials present in the coating composition comprise one or more resins that are at least substantially free of fluorine.

16. The coated substrate of claim 1 wherein at least 70 weight percent of all coating materials percent of all polymeric materials present in the coating composition comprise one or more resins that are at least substantially free of fluorine.

17. The method of claim 6 wherein at least 50 weight percent of all coating materials percent of all polymeric materials present in the coating composition comprise one or more resins that are at least substantially free of fluorine.

18. The method of claim 6 wherein at least 60 weight percent of all coating materials percent of all polymeric materials present in the coating composition comprise one or more resins that are at least substantially free of fluorine.

19. The method of claim 6 wherein at least 70 weight percent of all coating materials percent of all polymeric materials present in the coating composition comprise one or more resins that are at least substantially free of fluorine.

Assignees

• Wang Deyan
• Trefonas Iii Peter
• Gallagher Michael K
• Rohm & Haas Elect Mat

Inventors

• Wang Deyan
• Trefonas Iii Peter
• Gallagher Michael K

Classifications

• G03F7/0392

  the macromolecular compound being present in a chemically amplified positive photoresist composition · CPC title

• G03F7/11 Primary

  having cover layers or intermediate layers, e.g. subbing layers {(G03F7/091 - G03F7/093, B41N3/03 take precedence)} · CPC title

• G03F7/2041

  in the presence of a fluid, e.g. immersion; using fluid cooling means · CPC title

• G03F7/09 Primary

  characterised by structural details, e.g. supports, auxiliary layers (supports for printing plates in general B41N) · CPC title