Compositions comprising hetero-substituted carbocyclic aryl component and processes for photolithography

Patent metadata

Field	Value
Publication number	US-10359698-B2
Application number	US-59215609-A
Country	US
Kind code	B2
Filing date	Nov 19, 2009
Priority date	Nov 19, 2008
Publication date	Jul 23, 2019
Grant date	Jul 23, 2019

Abstract

New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprises one or more materials that have hetero-substituted carbocyclic aryl groups. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.

First claim

What is claimed is:

1. A method for processing a photoresist composition, comprising:
(a) applying on a substrate a layer of a photoresist composition comprising:
(i) one or more resins,
(ii) a photoactive component, and
(iii) one or more materials that are distinct from and substantially non-mixable with the one or more resins, and the one or more materials comprise 1) hetero-substituted multi-ring carbocyclic aryl groups and 2) one or more C(OH)(CF 3 ) 2 moieties; and

(b) immersion exposing the photoresist composition layer to radiation activating for the photoresist composition wherein immersion fluid directly contacts the photoresist composition layer;
wherein the one or more materials migrate to top or upper portions of the photoresist coating layer.

2. The method of claim 1 wherein the one or more materials (iii) comprise resins that comprise hetero-substituted multi-ring carbocyclic aryl groups.

3. The method of claim 2 wherein the one or more resins (iii) comprise hydroxy naphthyl groups.

4. The method of claim 1 , wherein the one or more substantially non-mixable materials comprise one or more photoacid labile groups.

5. A method for processing a photoresist composition, comprising:
(a) applying on a substrate a layer of a photoresist composition comprising:
(i) one or more resins,
(ii) a photoactive component, and
(iii) one or more materials that are distinct from and substantially non-mixable with the one or more resins, and the one or more materials comprise 1) hetero-substituted multi-ring carbocyclic aryl groups, 2) one or more C(OH)(CF 3 ) 2 moieties and 3) silicon substitution; and

(b) immersion exposing the photoresist composition layer to radiation activating for the photoresist composition wherein immersion fluid directly contacts the photoresist composition layer.

6. The method of claim 5 , wherein the one or more substantially non-mixable materials comprise one or more photoacid labile groups.

7. A method for processing a photoresist composition, comprising:
(a) applying on a substrate a layer of a photoresist composition comprising:
(i) one or more resins,
(ii) a photoactive component, and
(iii) one or more resins that (1) are distinct from and substantially non-mixable with the (i) one or more resins, and (2) comprise 1) hetero-substituted multi-ring carbocyclic aryl groups, and 2) one or more C(OH)(CF 3 ) 2 groups; and

(b) immersion exposing the photoresist composition layer to radiation activating for the photoresist composition wherein immersion fluid directly contacts the photoresist composition layer;
wherein the one or more materials migrate to top or upper portions of the photoresist coating layer.

8. The method of claim 7 wherein the (iii) one or more resins comprise hydroxyl naphthyl.

Assignees

• Wang Deyan
• Xu Cheng Bai
• Barclay George G
• Rohm & Haas Elect Mat

Inventors

• Wang Deyan
• Xu Cheng-Bai
• Barclay George G

Classifications

• G03F7/0382

  the macromolecular compound being present in a chemically amplified negative photoresist composition · CPC title

• G03F7/2041

  in the presence of a fluid, e.g. immersion; using fluid cooling means · CPC title

• G03F7/0046

  with perfluoro compounds, e.g. for dry lithography (G03F7/0048 takes precedence) · CPC title

• G03F7/0045

  with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors · CPC title

• G03F7/0048 Primary

  characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents · CPC title