Composition for forming organic hard mask layer for use in lithography containing polymer having acrylamide structure
US-9514949-B2 · Dec 6, 2016 · US
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Someya Yasunobu — Physics
Someya Yasunobu holds 3 patents in Physics, with representative filings summarized below.
| Metric | Value |
|---|---|
| Company | Someya Yasunobu |
| Technology | Physics |
| Patents in slice | 3 |
| Recent patents in slice | 0 |
| First year | 2016 |
| Last year | 2016 |
Representative patents
Notable publications linking Someya Yasunobu to Physics.
Composition for forming organic hard mask layer for use in lithography containing polymer having acrylamide structure
US-9514949-B2 · Dec 6, 2016 · US
Composition for forming organic hard mask layer for use in lithography containing polymer having acrylamide structure
US-9514949-B2 · Dec 6, 2016 · US
Resist underlayer film-forming composition which contains alicyclic skeleton-containing carbazole resin
US-9343324-B2 · May 17, 2016 · US
Resist underlayer film-forming composition which contains alicyclic skeleton-containing carbazole resin
US-9343324-B2 · May 17, 2016 · US
Recent filings
Latest patents from Someya Yasunobu in Physics.
Composition for forming organic hard mask layer for use in lithography containing polymer having acrylamide structure
US-9514949-B2 · Dec 6, 2016 · US
Composition for forming organic hard mask layer for use in lithography containing polymer having acrylamide structure
US-9514949-B2 · Dec 6, 2016 · US
Composition for forming organic hard mask layer for use in lithography containing polymer having acrylamide structure
US-9514949-B2 · Dec 6, 2016 · US
Resist underlayer film-forming composition which contains alicyclic skeleton-containing carbazole resin
US-9343324-B2 · May 17, 2016 · US
Resist underlayer film-forming composition which contains alicyclic skeleton-containing carbazole resin
US-9343324-B2 · May 17, 2016 · US
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