Composition for forming organic hard mask layer for use in lithography containing polymer having acrylamide structure

Patent metadata

Field	Value
Publication number	US-9514949-B2
Application number	US-201214116157-A
Country	US
Kind code	B2
Filing date	May 18, 2012
Priority date	May 20, 2011
Publication date	Dec 6, 2016
Grant date	Dec 6, 2016

Abstract

Whereas, conventionally, ashing had been used at the time of removal, the present invention provides a material for forming an organic hard mask that can be removed by an alkaline aqueous solution, and thus can be expected to reduce damage to the substrate at the time of the removal. A composition for forming an organic hard mask layer comprising: a polymer (A) including a structural unit of Formula (1) and a structural unit of Formula (2); a crosslinkable compound (B) including at least two of blocked isocyanate groups, methylol groups, or C 1-5 alkoxymethyl groups; and a solvent (C), wherein an organic hard mask layer obtained from the composition for forming an organic hard mask layer is used at the lowest layer in a lithography process using a multi-layer film,

wherein R 1 to R 4 have the same definition as ones in the specification.

First claim

The invention claimed is:

1. A method for manufacturing a semiconductor device, the method comprising:
forming an organic hard mask layer on a semiconductor substrate using a composition for forming an organic hard mask layer comprising:
a polymer (A) including a structural unit of Formula (1) and a structural unit of Formula (2), the structural unit of Formula (1) and the structural unit of Formula (2) having a molar ratio in the range of 1:0.01 to 1:1.5:
a crosslinkable compound (B) including at least two of blocked isocyanate groups, methylol groups, or C 1-5 alkoxymethyl groups; and
a solvent (C), wherein
an organic hard mask obtained from the composition for forming an organic hard mask layer is used at the lowest layer in a lithography process using a multi-layer film,

[in Formula (1), R 1 is a hydrogen atom or a methyl group: R 2 is a C 1-3 alkylene group or a phenylene group optionally having a substituent; and R 3 is a hydroxy group or a carboxy group, and
in Formula (2), R 4 is a hydrogen atom or a methyl group; Y is a linking group of a —C(═O)—NH— group or a —C(═O)—O— group; X is a group including a lactone ring, a group including an adamantane ring, a benzene ring group that is not substituted, or a naphthalene ring group that is not substituted; and a carbon atom in the linking group of Y is bonded to a main chain of the polymer];

forming a resist film on the organic hard mask layer;
forming a resist pattern in the resist film by radiating light or an electron beam and developing;
etching the organic hard mask layer using the resist pattern; and
processing the semiconductor substrate using the organic hard mask layer thus patterned.

2. The method according to claim 1 , wherein the polymer (A) is a polymer (A′) further including a structural unit of Formula (3) in addition to the structural unit of Formula (1) and the structural unit of Formula (2),

[in Formula (3), R 5 is a hydrogen atom or a methyl group; Y 1 is a —C(═O)—NH—group or a —C(═O)—O— group; X 1 is a hydrogen atom, a C 1-10 alkyl group, or a C 7-20 aralkyl group that is optionally substituted].

3. The method according to claim 2 , wherein the crosslinkable compound (B) is included in a ratio in the range of 1% by mass to 40% by mass to the mass of the polymer (A′).

4. The method according to claim 1 , wherein the polymer (A) is a polymer (A″) further including a structural unit of Formula (4) in addition to the structural unit of Formula (1) and the structural unit of Formula (2),

[in Formula (4), R 6 is a hydrogen atom or a methyl group; and X 2 is a C 6-20 aryl group that is optionally substituted].

5. The method according to claim 4 , wherein the crosslinkable compound (B) is included in a ratio in the range of 1% by mass to 40% by mass to the mass of the polymer (A″).

6. The method according to claim 1 , wherein the crosslinkable compound (B) is included in a ratio in the range of 1% by mass to 40% by mass to the mass of the polymer (A).

7. The composition method according to claim 1 , further comprising a crosslinking catalyst.

8. A method for manufacturing a semiconductor device, the method comprising:
forming an organic hard mask layer on a semiconductor substrate using a composition for forming an organic hard mask layer comprising:
a polymer (A) including a. structural unit of Formula (1) and a structural unit of Formula (2), the structural unit of Formula (1 ) and the structural unit of Formula (2) having a molar ratio in the range of 1:0,01 to 1:1.5;
a crosslinkable compound (B) including at least two of blocked isocyanate groups, methylol groups, or C 1-5 alkoxymethyl groups; and
a solvent (C) wherein
an organic hard mask layer obtained from the composition for forming an organic hard mask layer is used at the lowest layer in a lithography process using a multi-layer film,

[in Formula (1), R 1 is a hydrogen atom or a methyl group, R 2 is a C 1-3 alkylene group or a phenylene group optionally having a substituent; and R 3 is a hydroxy group or a carboxy group, and
in Formula (2), R 4 is a hydrogen atom or a methyl group; Y is a linking group of a —C(═O)—NH— group or a —C(═O)—O— group; X is a group including a lactone ring, a group including an adamantane ring, a benzene ring group that is not substituted, or a naphthalene ring group that is not substituted; and a carbon atom in the linking group of Y is bonded to a main chain of the polymer];

forming an inorganic hard mask layer on the organic hard mask layer;
further forming a resist film on the inorganic hard mask layer;
forming a resist pattern in the resist film by radiating light or an electron beam and developing;
etching the inorganic hard mask layer using the resist pattern;
etching the organic hard mask layer using the inorganic hard mask layer thus patterned; and
processing a semiconductor substrate using the organic hard mask layer thus patterned.

9. The method according to claim 8 , wherein the polymer (A) is a polymer (A′) further including a structural unit of Formula (3) in addition to the structural unit of Formula (1) and the structural unit of Formula (2),

[in Formula (3), R 5 is a hydrogen atom or a methyl group; Y 1 is a —C(═O)—NH—group or a —C(═O)—O— group; X 1 is a hydrogen atom, a C 1-10 alkyl group, or a C 7-20 aralkyl group that is optionally substituted].

10. The method according to claim 9 , wherein the crosslinkable compound (B) is included in a ratio in the range of 1% by mass to 40% by mass to the mass of the polymer (A′).

11. The method according to claim 8 , wherein the polymer (A) is a polymer (A″) further including a structural unit of Formula (4) in addition to the structural unit of Formula (1) and the structural unit of Formula (2),

[in Formula (4), R 6 is a hydrogen atom or a methyl group; and X 2 is a C 6-20 aryl group that is optionally substituted].

12. The method according to claim 11 , wherein the crosslinkable compound (B) is included in a ratio in the range of 1% by mass to 40% by mass to the mass of the polymer (A″).

13. The method according to claim 8 , wherein the crosslinkable compound (B) is included in a ratio in the range of 1% by mass to 40% by mass to the mass of the polymer (A).

14. The method according to claim 8 , further comprising a crosslinking catalyst.

Assignees

• Someya Yasunobu
• Usui Yuki
• Kato Masakazu
• Shinjo Tetsuya
• Hashimoto Keisuke
• Karasawa Ryo
• Nissan Chemical Ind Ltd

Inventors

• Someya Yasunobu
• Usui Yuki
• Kato Masakazu
• Shinjo Tetsuya
• Hashimoto Keisuke
• Karasawa Ryo

Classifications

• H10P50/692 Primary

  characterised by their composition, e.g. multilayer masks or materials · CPC title

• H01L21/3081 Primary

  Electricity · mapped topic

• G03F7/091 Primary

  characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement · CPC title

• G03F7/094

  Multilayer resist systems, e.g. planarising layers · CPC title

• G03F7/11

  having cover layers or intermediate layers, e.g. subbing layers {(G03F7/091 - G03F7/093, B41N3/03 take precedence)} · CPC title