Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom
US-9598392-B2 · Mar 21, 2017 · US
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Echigo Masatoshi patents
Echigo Masatoshi holds 8 patents in our database, with recent filings and technology areas summarized below.
| Metric | Value |
|---|---|
| Total patents | 8 |
| Recent patents | 0 |
| First publication | Mar 3, 2015 |
| Latest publication | Mar 21, 2017 |
Filing trend
Year-over-year patent counts for this assignee.
Recent patents
Latest publications where this party is an assignee.
Underlayer film-forming material for lithography, underlayer film for lithography, and pattern formation method
US-9316913-B2 · Apr 19, 2016 · US
Compound, radiation-sensitive composition and resist pattern formation method
US-9239517-B2 · Jan 19, 2016 · US
Bicyclohexane derivative compound and manufacturing method of the same
US-9150491-B2 · Oct 6, 2015 · US
Cyclic compound, method for producing same, composition, and method for forming resist pattern
US-9122153-B2 · Sep 1, 2015 · US
Notable patents
Representative or frequently cited publications from precomputed assignee stats.
Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom
US-9598392-B2 · Mar 21, 2017 · US
Underlayer film-forming material for lithography, underlayer film for lithography, and pattern formation method
US-9316913-B2 · Apr 19, 2016 · US
Compound, radiation-sensitive composition and resist pattern formation method
US-9239517-B2 · Jan 19, 2016 · US
Bicyclohexane derivative compound and manufacturing method of the same
US-9150491-B2 · Oct 6, 2015 · US
Cyclic compound, method for producing same, composition, and method for forming resist pattern
US-9122153-B2 · Sep 1, 2015 · US
Top CPC classifications
Most common classification codes in this portfolio.
| CPC | Patents |
|---|---|
| G03F7/0045 | 5 |
| C07C2601/14 | 4 |
| G03F7/004 | 3 |
| H10P76/20 | 3 |
| G03F7/091 | 3 |
Technology areas
Mapped technology topics for this assignee.
| Technology | Patents |
|---|---|
| Chemistry & Metallurgy | 8 |
| Physics | 8 |
| Electricity | 5 |