Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom

Patent metadata

Field	Value
Publication number	US-9598392-B2
Application number	US-201214238402-A
Country	US
Kind code	B2
Filing date	Aug 9, 2012
Priority date	Aug 12, 2011
Publication date	Mar 21, 2017
Grant date	Mar 21, 2017

Abstract

A resist composition containing a compound represented by the general formula (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, and an alcoholic compound that can be derived therefrom are described.

First claim

The invention claimed is:

1. A polyphenolic compound represented by formula (30):

wherein X′ is a hydrogen atom or a monovalent substituent having 1 to 18 carbon atoms, provided X′ is not phenyl; R 0 are each independently an alkyl group having 1 to 4 carbon atoms or a halogen atom and may be the same or different on the same naphthalene ring; and p is an integer of 0 to 5.

2. A polyphenolic compound represented by formula (40):

wherein X′ is a hydrogen atom or a monovalent substituent having 1 to 18 carbon atoms; R 0 are each independently an alkyl group having 1 to 4 carbon atoms or a halogen atom and may be the same or different on the same naphthalene ring; and p is an integer of 0 to 5.

3. A method for producing the polyphenolic compound according to claim 2 , comprising reacting a compound represented by formula (50) with an aldehyde having 1 to 19 carbon atoms in the presence of an acid catalyst:

wherein R 0 is an alkyl group having 1 to 4 carbon atoms or a halogen atom and may be the same or different on the same naphthalene ring; and p is an integer of 0 to 5.

4. A method for producing the polyphenolic compound according to claim 1 , comprising reacting a compound represented by formula (50) with an aldehyde having 1 to 19 carbon atoms in the presence of an acid catalyst:

wherein R 0 is an alkyl group having 1 to 4 carbon atoms or a halogen atom and may be the same or different on the same naphthalene ring; and p is an integer of 0 to 5.

5. A compound represented by the formula (BisN-3):

6. A compound represented by the formula (BisN-4):

7. A compound represented by the formula (BisN-5):

8. A compound represented by the formula (BisN-6):

9. A compound represented by the formula (XBisN-3):

10. A compound represented by the formula (XBisN-4):

11. A compound represented by the formula (XBisN-5):

12. A compound represented by the formula (XBisN-6):

13. A polyphenolic compound according to claim 1 , wherein X′ is the monovalent substituent having 1 to 18 carbon atoms and comprises a C 1 to C 10 alkyl group.

14. A polyphenolic compound according to claim 1 , wherein X′ is the monovalent substituent having 1 to 18 carbon atoms and comprises a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, a nonyl group, a decyl group, an octadecyl group, a cyclopropyl group, a cyclohexyl group, an adamantyl group, a tosyl group, a dimethylphenyl group, an ethylphenyl group, a propylphenyl group, a butylphenyl group, a cyclohexylphenyl group, a biphenyl group, a terphenyl group, a naphthyl group, an anthracyl group, a phenanthryl group, or a pyrenyl group.

Assignees

• Echigo Masatoshi
• Yamakawa Masako
• Mitsubishi Gas Chemical Co

Inventors

• Echigo Masatoshi
• Yamakawa Masako

Classifications

• C07D311/96

  spiro-condensed with carbocyclic rings or ring systems · CPC title

• C07C2601/10

  the ring being unsaturated · CPC title

• C07D311/78 Primary

  Ring systems having three or more relevant rings · CPC title

• C07C39/14 Primary

  with at least one hydroxy group on a condensed ring system containing two rings · CPC title

• C07C37/20 Primary

  using aldehydes or ketones · CPC title