Apparatus and method for providing uniform flow of gas

Patent metadata

Field	Value
Publication number	US-RE47440-E
Application number	US-201715678883-A
Country	US
Kind code	E1
Filing date	Aug 16, 2017
Priority date	Oct 19, 2011
Publication date	Jun 18, 2019
Grant date	Jun 18, 2019

Abstract

Provided are gas distribution apparatus with a delivery channel having an inlet end, an outlet end and a plurality of apertures spaced along the length. The inlet end is connectable to an inlet gas source and the outlet end is connectable with a vacuum source. Also provided are gas distribution apparatus with spiral delivery channels, intertwined spiral delivery channels, splitting delivery channels, merging delivery channels and shaped delivery channels in which an inlet end and outlet end are configured for rapid exchange of gas within the delivery channels.

First claim

What is claimed is:

1. A gas distribution apparatus for controlling flow of gas into a process chamber, comprising:
a spiral delivery channel having an inlet end, an outlet end and a length, the delivery channel having a plurality of apertures spaced along the length;
an inlet on the inlet end of the delivery channel, the inlet connectable to a gas source, wherein flow of the gas is controllable by a gas valve in communication with the inlet; and
an outlet on the outlet end of the delivery channel, the outlet connectable to a vacuum source, wherein vacuum pressure through the outlet is controllable by an outlet valve to provide a reduced pressure at the outlet; and
a controller to regulate the flow of the gas through the delivery channel and into the process chamber by opening and closing the outlet valve during gas delivery and gas purging in the channel to control the flow of gas through the apertures along the length of the channel.

2. The gas distribution apparatus of claim 1 , wherein a flow of gas through the gas distribution apparatus has a more uniform conductance along an axial length of the gas distribution apparatus than the flow of gas through a similar gas distribution apparatus without the vacuum source connected to the outlet.

3. The gas distribution apparatus of claim 1 , wherein when the gas valve is closed, the gas is purged from the delivery channel faster than a similar gas distribution apparatus without the vacuum source.

4. The gas distribution apparatus of claim 1 , wherein the delivery channel is a recessed channel in a back side of a gas distribution plate and the plurality of apertures extend through the gas distribution plate to a front side of the gas distribution plate.

5. The gas distribution apparatus of claim 4 , wherein the gas distribution plate is round and the delivery channel forms a spiral shape with one of the inlet end and outlet end positioned in an outer peripheral region of the gas distribution plate and the other of the inlet end and outlet end positioned in a central region of the gas distribution plate.

6. The gas distribution apparatus of claim 3 4, wherein the inlet end is positioned at an outer peripheral region of the gas distribution plate and the outlet end is positioned at a central region of the gas distribution plate.

7. The gas distribution apparatus of claim 3 4, wherein the outlet end is positioned at an outer peripheral region of the gas distribution plate and the inlet end is positioned at a central region of the gas distribution plate.

8. The gas distribution apparatus of claim 4 , wherein there are two delivery channels recessed in the back side of the gas distribution plate.

9. The gas distribution apparatus of claim 8 , wherein each of the delivery channels forms a spiral shape with one of the inlet end and outlet end positioned in an outer peripheral region of the gas distribution plate and the other of the inlet end and outlet end positioned in a central region of the gas distribution plate.

10. The gas distribution apparatus of claim 9 , wherein the two delivery channels are intertwined along the spiral shape.

11. The gas distribution apparatus of claim 9 , wherein each delivery channel has the inlet end positioned in the outer periphery region of the gas distribution plate and the outlet end positioned in the central region of the gas distribution plate.

12. The gas distribution apparatus of claim 9 , wherein each delivery channel has the outlet end positioned in the outer periphery region of the gas distribution plate and the inlet end positioned in the central region of the gas distribution plate.

13. The gas distribution apparatus of claim 9 , wherein inlet end of one delivery channel is positioned in the outer periphery region of the gas distribution plate and the outlet end of the other delivery channel is positioned in the outer periphery region of the gas distribution plate.

14. The gas distribution apparatus of claim 4 , further comprising a back cover on the back side of the gas distribution plate, the back cover covering the recessed channel.

15. The gas distribution apparatus of claim 1 , wherein the delivery channel is a tubular spiral having a substantially planar shape.

16. The gas distribution apparatus of claim 15 , wherein the gas distribution apparatus comprises a plurality of delivery channels.

17. The gas distribution apparatus of claim 16 , wherein more than one of the delivery channels are connected to the inlet so that a gas flowing through the inlet flows through each of the delivery channels.

18. The gas distribution apparatus of claim 17 , wherein each of the delivery channels connected to the inlet merge and are connected to one outlet.

19. The gas distribution apparatus of claim 17 , wherein each of the delivery channels connected to the inlet has a separate outlet connected to a separate outlet valve.

20. The gas distribution apparatus of claim 19 , wherein the controller independently adjusts each of the outlet valves to maintain a substantially uniform flow of gas through each of the delivery channels.

21. The gas distribution apparatus of claim 16 , wherein the plurality of delivery channels are shaped so that the a hole pattern seen by a substrate is uniform across the gas distribution apparatus.

22. A processing chamber comprising the gas distribution apparatus of claim 1 .

23. The processing chamber of claim 22 , wherein the gas distribution apparatus comprises a tubular spiral having a substantially planar shape, the gas distribution apparatus positioned between a substrate support and a gas distribution plate.

24. A gas distribution apparatus, comprising:
a spiral gas delivery channel recessed in a back side of a gas distribution plate, the recessed gas delivery channel having an inlet end, an outlet end and a length, the gas delivery channel having a plurality of apertures spaced along the length extending through the gas distribution plate to a front side of the gas distribution plate so that gas flowing through the gas delivery channel can pass through the apertures exiting the gas distribution plate;
a back cover on the back side of the gas distribution plate, the back cover covering the recessed channel;
an inlet connected to the inlet end of the gas delivery channel through the back cover, the inlet connectable to a gas source, wherein a flow of gas is controllable by a gas valve in communication with the inlet;
an outlet connected to the outlet end of the gas delivery channel through the back cover, the outlet connectable to a vacuum source, wherein vacuum pressure through the outlet is controllable by an outlet valve to provide a reduced pressure at the outlet; and
a controller to regulate the flow of the gas through the gas delivery channel and into a process chamber by opening and closing the outlet valve during gas delivery and gas purging to control the flow of gas through the apertures along the length of the channel.

25. The gas distribution apparatus of claim 24 , wherein the gas distribution plate is round and the delivery channel forms a spiral shape with one of the inlet end and outlet end positioned in an outer peripheral region of the gas distribution plate and the other of the inlet end and outlet end positioned in a central region of the gas distribution plate.

26. The gas distribution apparatus of claim 25 , wherein there are two delivery channels recessed in the back side

Assignees

• Applied Materials Inc

Inventors

• Yudovsky Joseph
• Chang Mei
• Gungor Faruk
• Ma Paul F
• Chu David
• Kao Chien-Teh
• Lam Hyman
• Wu Dien-Yeh

Classifications

• F17D3/00 Primary

  Arrangements for supervising or controlling working operations · CPC title

• C23C16/45565

  Shower nozzles · CPC title

• C23C16/45578 Primary

  Elongated nozzles, tubes with holes · CPC title

• C23C16/45544

  characterized by the apparatus · CPC title

• Y10T137/7833

  With means for mounting or connecting to system · CPC title