Method and device for irradiating spots on a layer

Patent metadata

Field	Value
Publication number	US-RE46433-E
Application number	US-200313079969-A
Country	US
Kind code	E1
Filing date	Nov 20, 2003
Priority date	Dec 19, 2002
Publication date	Jun 13, 2017
Grant date	Jun 13, 2017

Abstract

For irradiating a layer a radiation beam is directed and focussed to a spot on the layer, relative movement of the layer relative to the lens is caused so that, successively, different portions of the layer are irradiated and an interspace between a surface of the lens nearest to the layer is maintained. Furthermore, at least a portion of the interspace through which the radiation irradiates the spot on the layer is maintained filled with a liquid, the liquid being supplied via a supply conduit. At least a portion of the liquid fills up a recess through which the radiation irradiates the spot.

First claim

The invention claimed is:

1. A method of irradiating a layer, the method including:
directing and focussing focusing a radiation beam to a spot on said layer by means of at least one optical element;
causing relative movement of the layer relative to said at least one optical element so that, successively, different portions of the layer are irradiated and an interspace between said layer and a surface of said at least one optical element nearest to said layer is maintained; and
maintaining said interspace through which said radiation irradiates said spot on said layer filled with a liquid, the liquid being supplied via a supply conduit;
characterized in that at least a portion of said interspace is bounded by a recess which is filled by at least a portion of said liquid, said radiation beam passing through said liquid in said recess when irradiating said spot, wherein said recess is bounded at least in part by a passage in a wall between said layer and a surface of said at least one optical element nearest to said layer and by said surface of said at least one optical element nearest to said layer, wherein a passage is formed in said wall as an opening from the recess, wherein said wall has a width-wise axis that extends through the body of the wall, the width-wise axis essentially extending perpendicular to an optical axis, through the interspace, of the radiation beam, wherein said wall has a major exterior surface contacting said liquid, the major exterior surface being essentially perpendicular to the optical axis, extending at least partly underneath said at least one optical element, being a bottom-most surface of the wall and spanning a width that is larger than a height of the wall, and wherein said radiation beam passing passes through said passage while at least a portion of the liquid is flowing out of said passage onto said layer.

2. The method as claimed in claim 1 , wherein the recess has a rim portion positioned between said surface of said at least one optical element nearest to said layer and said layer, closest to said layer and extending around said radiation beam irradiating said spot.

3. The method as claimed in claim 1 , wherein a liquid outflow from said recess via said passage is maintained.

4. A The method as claimed in claim 1 , wherein a smallest thickness of said interspace is maintained at a value selected from within the range of 3-1500 μm.

5. A The method as claimed in claim 1 , wherein said recess includes a concave portion of said surface of said at least one optical element nearest to said layer.

6. A The method as claimed in claim 1 , wherein the liquid flows out from at least one outflow opening in said recess in the form of at least one canal open towards said layer, said canal distributing supplied liquid longitudinally along said canal and dispensing distributed liquid towards said layer.

7. A method of irradiating a layer including:
directing and focusing a radiation beam to spot on said layer by means of at least one optical element;
causing relative movement of the layer relative to said at least one optical element so that, successively, different portions of the layer are irradiated and an interspace between a surface of said at least one optical element nearest to said layer is maintained; and
maintaining at least a portion of said interspace through which said radiation irradiates said spot on said layer filled with a liquid, the liquid being supplied via a supply conduit;
characterized in that at least a portion of said liquid fills up a recess through which said radiation irradiates said spot,

wherein said interspace between said layer and said surface of said at least one optical element nearest to said layer has a thickness H, the layer and the at least one optical element are moved relative to each other at a velocity V, the liquid is supplied via an outflow opening having a width W measured in a plane parallel to said layer and at a flow rate equal to 0.5*•*H*(W+•*H)*V 0.5*β*H*(W+α*H)*V, where • α is a constant between 1 and 10 and • β is a constant between 1 and 3.

8. A device for directing radiation to a layer, the device including:
at least one optical element for focussing a radiation originating beam from said a radiation source to a spot on said layer;
a displacement structure for causing relative movement of the layer relative to said at least one optical element so that, successively, different portions of the layer are irradiated and an interspace between said layer and a surface of said at least one optical element nearest to said spot is maintained; and
an outflow opening for supplying liquid to fill said interspace, in operation, said radiation irradiates said spot on said layer through said liquid,; and
characterized in that said device further comprises a recess having an internal surface bounding at least said a portion of said interspace through which said radiation irradiates said spot on said layer through said liquid, said outflow opening being formed in said recess, wherein said recess is being bounded at least in part by a passage in a wall between said spot and a surface of said at least one optical element nearest to said spot and by said surface of said at least one optical element nearest to said spot, a passage for liquid flow formed in said wall, wherein said wall has a width-wise axis that extends through the body of the wall, the width-wise axis essentially extending perpendicular to an optical axis, through the interspace, of the radiation beam, wherein said wall has a major exterior surface arranged to contact said liquid, the major exterior surface being essentially perpendicular to the optical axis, extending at least partly underneath said at least one optical element, being a bottom-most surface of the wall and spanning a width that is larger than a height of the wall, and wherein said outflow opening is formed in said recess above said passage and said passage forming said outflow opening is a further opening in the recess and is arranged to have the radiation beam pass therethrough onto said spot.

9. The device as claimed in claim 8 , wherein said recess has a rim portion closest to said layer extending around said portion of said interspace through which, in operation, said radiation irradiates said spot.

10. The device as claimed in claim 8 , wherein said device further comprises a liquid supply structure communicating with said recess for maintaining a liquid outflow via said passage.

11. The device as claimed in claim 8 , wherein said device is arranged for maintaining a smallest thickness of said interspace at a value selected from within the range of 3-1500 μm.

12. The device as claimed in claim 8 , wherein said recess includes a concave portion of said surface of said at least one optical element nearest to said spot.

13. The device claimed in claim 8 , wherein the at least one outflow opening is formed by at least one canal open towards said layer, for distributing supplied liquid longitudinally along said canal and dispensing distributed liquid towards said layer.

14. The method as claimed in claim 1, wherein said major surface of the wall is upward facing.

15. A device manufacturing method comprising:
forming a beam of radiation with an image of a mask or reticle; and irradiating a layer with the image using the method as claimed in claim 1.

16. The device as claimed in claim 8, wherein said major surface of the wall is upward facing.

17. A lithography apparatus comprising:
a wafer support table configured to support a wafer to be irradiated; a scanner configured to have

Assignees

• Neijzen Jacobus Hermanus Maria
• Van Santen Helmar
• Asml Netherlands Bv

Inventors

• Neijzen Jacobus Hermanus Maria
• Van Santen Helmar

Classifications

• G11B7/1374

  Objective lenses {(optical objectives per se G02B9/00)} · CPC title

• G11B7/261

  Preparing a master, e.g. exposing photoresist, electroforming · CPC title

• B82Y10/00 Primary

  Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic · CPC title

• G03F7/70341 Primary

  Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply (chemical composition of immersion liquids G03F7/2041) · CPC title

• G11B7/122

  Flying-type heads, e.g. analogous to Winchester type in magnetic recording · CPC title