Method for operating a pulsed arc source

Patent metadata

Field	Value
Publication number	US-9997338-B2
Application number	US-10233705-A
Country	US
Kind code	B2
Filing date	Apr 8, 2005
Priority date	Mar 24, 2005
Publication date	Jun 12, 2018
Grant date	Jun 12, 2018

Abstract

This invention relates to an arc-based method for the deposition of insulating layers and to an arc-based method for low-temperature coating processes, in which an electric arc discharge, ignited and applied on the surface of a target in an arc source, is simultaneously fed a direct current and a pulsed or alternating current.
The invention further relates to an arc source in which the target is connected to a power supply unit that encompasses either a minimum of one pulsed high-current power supply 18, 18 ′ and an additional power supply 13′, 18 ″, or a power supply 21, 21′, 22 designed with switchable combinatorial circuitry.

First claim

The invention claimed is:

1. A process for producing insulating layers by means of arc vaporization deposition comprising the steps of:
igniting an electric arc discharge for operating an arc vaporization source;
applying the arc discharge to a surface of a target material that is operated as cathode during operation of the arc vaporization source in a reactive-gas-containing atmosphere, which comprises oxygen as reactive gas; and
coating the surface of the target at least partially with an electrically insulating layer from the target material that is operated as cathode by simultaneously applying a direct current and a pulsed or alternating current, the direct current being superimposed by the pulsed or the alternating current,
wherein the surface of the target coated in this manner is a result of the reactive gas and its reaction with the target surface,
wherein a percentage of the reactive gas in the reactive-gas-containing atmosphere is at least 70%, and
wherein the percentage of the reactive gas is selected to be so high during operation that it causes an increment of the direct current by at least 20% in comparison with operation without forming the electrically insulating layer.

2. The method of claim 1 , wherein the reactive gas comprises at least one of the following components: nitrogen, acetylene, methane, silanes, trimethyl aluminum, borane, silicon, boron or carbon.

3. The method of claim 1 , wherein the target is made of a material from at least one of the following: a transition metal of subgroup IV, V, VI, or aluminum, boron, carbon or silicon or an alloy or a compound of these materials.

4. The method of claim 3 , wherein the electrically insulating layer consists of an oxide, nitride, boride, silicide, carbide of the target material or a mixture of said compounds of the target material.

5. The method of claim 1 , wherein the DC component is in a range between 30 and 90 A.

6. The method of claim 1 , wherein a reactive gas, an inert gas, or a combination of a reactive and an inert gas is metered and is introduced to the target.

7. The method of claim 1 , wherein the target is made of a material comprising one single crystallographic phase.

8. The method of claim 1 , wherein the direct-current is generated by a direct-current generator and the pulsed or alternating-current is generated by a pulsed or alternating-current generator, where both generators are connected either parallel or in series between an arc cathode and at least one anode or ground.

9. The method of claim 1 , wherein the direct-current and the pulsed-current are generated by two pulsed or alternating-current generators operated in a superimposed and synchronized mode, where both generators are connected either parallel or in series between an arc cathode and at least one anode or ground.

10. The method of claim 1 , wherein the direct-current and the pulsed-current components are generated by a secondary clocked current generator and wherein the secondary clocked current generator is connected either in parallel or in series between an arc cathode and at least one anode or ground.

11. The method of claim 1 , wherein the direct-current and the pulsed-current are generated by a primary clocked current generator and wherein the primary clocked current generator is connected either parallel or in series between an arc cathode and at least one anode or ground.

12. The method of claim 1 , wherein a work piece is coated with at least one layer.

13. The method of claim 12 , wherein the layer comprises at least one of the following materials: a transition metal of subgroup IV, V or VI as well as aluminum and their compounds with oxygen, nitrogen, carbon, boron or silicon.

14. The method of claim 12 , wherein the layer comprises at least of the following materials: aluminum oxide, aluminum nitride, aluminum oxinitride, chromium oxide, chromium nitride, chromium oxinitride, aluminum chromoxide, aluminum chromonitride, aluminum chromoxinitride, aluminum chromoxicarbonitride, silicon oxide, silicon nitride, silicon oxinitride, silicic aluminum oxide, silicic aluminum nitride, silicic aluminum oxinitride, titanous silicon nitride, titanous silicon oxinitride, tantalic silicon nitride, tantalum oxide, tantalum oxinitride, wolframic silicon nitride, wolframic silicon carbide, niobium silicon nitride, titanium carbide, tungsten carbide, or an alloy or compound of the above materials.

15. The method of claim 12 , wherein a DC, pulsed or alternating-current bias is applied to the work piece.

16. The method of claim 12 , wherein a pulsed or alternating-current bias is synchronized with the pulsed or alternating current is applied.

17. The method of claim 12 further comprising the steps of:
adding, at least once, a first gas comprising one of an inert or a reactive gas at a first flow rate;
metering the first gas;
adding, at least once, a second gas comprising a reactive gas at a second flow rate; and,
metering the second gas,
wherein the addition of the first and the second gases changes a layer composition.

18. The method of claim 17 , wherein the first flow rate is reduced before, during or after a setting of the second flow rate and that the second flow rate is adjusted from a lower value to a higher value or from a higher value to a lower value.

19. The method of claim 18 , wherein a metering and adjustments of gas settings are performed along a ramped or stepped pattern so as to bring about an essentially continuous or stepwise change of the layer composition.

20. The method of claim 17 , wherein by alternating an increase and a decrease of the first and second flow rates a multi-layered coat is deposited.

21. The method of claim 12 , wherein several arc sources are simultaneously operated with identical or different target materials.

22. The method of claim 12 , wherein a deposition rate or energy penetration into the work piece is set by adjusting at least one of the following parameters: a pulse width of the pulsed current, a height of the pulsed current or a pulse-width repetition rate.

23. The method of claim 12 , wherein the work piece is a tool or a structural component.

24. The method of claim 12 , wherein the work piece is comprised of silicon or some other semiconductor material.

25. The method of claim 1 further comprising the steps of: applying a DC, pulsed or alternating-current bias to a work piece; and, etching the work piece with metal ions.

26. The method of claim 25 , wherein a DC bias current in the range of −50 and −2000 V is applied to the work piece.

27. The method of claim 26 further comprising a step of adding an etching gas.

28. The method of claim 27 , wherein the etching gas is comprised of at least one of the following components: He, Ar, Kr, oxygen, nitrogen, hydrogen, a halogen or a halogenous compound.

29. The method of claim 3 , wherein the target is made of an alloy or compound from at least one of the following: TiAl, CrAl, TiAlCr, TiSi, TaSi, CrSi, WC.

30. The method of claim 1 , wherein the target is made of an alloy or compound from at least one of the following: TiAl, CrAl, TiAlCr, TiSi, TaSi, CrSi, WC.

31. The method of claim 1 , wherein the target is made of aluminum.

32. The method of claim 1 , wherein a percentage of the holding current corresponds to the DC co

Assignees

• Ramm Juergen
• Gstoehl Oliver
• Widrig Beno
• Lendi Daniel
• Oerlikon Surface Solutions Ag Pfaeffikon

Inventors

• Ramm Jürgen
• Gstoehl Oliver
• Widrig Beno
• Lendi Daniel

Classifications

• H01J37/32055

  Arc discharge · CPC title

• C23C14/325

  Electric arc evaporation · CPC title

• H01J37/34

  operating with cathodic sputtering (H01J37/36 takes precedence {; methods of cathodic sputtering C23C14/34}) · CPC title

• H01J37/3444 Primary

  Associated circuits · CPC title

• C23C14/0641

  Nitrides (C23C14/0617 takes precedence) · CPC title