CMOS image sensor having enhanced near infrared quantum efficiency

US9991309B1 · US · B1

Patent metadata
FieldValue
Publication numberUS-9991309-B1
Application numberUS-201715642177-A
CountryUS
Kind codeB1
Filing dateJul 5, 2017
Priority dateJul 5, 2017
Publication dateJun 5, 2018
Grant dateJun 5, 2018

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

An image sensor comprises a semiconductor material having an illuminated surface and a non-illuminated surface; a photodiode formed in the semiconductor material extending from the illuminated surface to receive an incident light through the illuminated surface, wherein the received incident light generates charges in the photodiode; a transfer gate electrically coupled to the photodiode to transfer the generated charges from the photodiode in response to a transfer signal; a floating diffusion electrically coupled to the transfer gate to receive the transferred charges from the photodiode; a near infrared (NIR) quantum efficiency (QE) enhancement structure comprising at least two NIR QE enhancement elements within a region of the photodiode, wherein the NIR QE enhancement structure is configured to modify the incident light at the illuminated surface of the semiconductor material by at least one of diffraction, deflection and reflection, to redistribute the incident light within the photodiode to improve an optical sensitivity, including near-infrared light sensitivity, of the image sensor.

First claim

Opening claim text (preview).

What is claimed is: 1. An image sensor, comprising: a semiconductor material having an illuminated surface and a non-illuminated surface; a photodiode formed in the semiconductor material extending from the illuminated surface to receive an incident light through the illuminated surface, wherein the received incident light generates charges in the photodiode; a transfer gate electrically coupled to the photodiode to transfer the generated charges from the photodiode in response to a transfer signal; a floating diffusion electrically coupled to the transfer gate to receive the transferred charges from the photodiode; a near infrared (NIR) quantum efficiency (QE) enhancement structure comprising at least two NIR QE enhancement elements within a photosensitive region of the photodiode, wherein the NIR QE enhancement structure is configured to modify the incident light at the illuminated surface of the semiconductor material by at least one of diffraction, deflection and reflection, to redistribute the incident light within the photodiode to improve an optical sensitivity, including near-infrared light sensitivity, of the image sensor. 2. The image sensor of claim 1 , wherein each NIR QE enhancement element of the NIR QE enhancement structure comprises a dielectric material having a refractive index smaller than a refractive index of the semiconductor material. 3. The image sensor of claim 1 , wherein the at least two NIR QE enhancement elements have a uniform size and shape, and are disposed in a periodic pattern. 4. The image sensor of claim 1 , wherein each NIR QE enhancement element of the NIR QE enhancement structure comprises a shape of one of a parallelepiped, a polygon, a cylinder, an ellipsoids, a hemispheroid, and a hemisphere. 5. The image sensor of claim 1 , wherein the illuminated surface of the semiconductor material is one of a front side surface and a back side surface of the semiconductor material. 6. The image sensor of claim 1 , wherein each NIR QE enhancement element of the NIR QE enhancement structure extends from the illuminated surface of the semiconductor material in the photodiode. 7. The image sensor of claim 1 , wherein each NIR QE enhancement element of the NIR QE enhancement structure is disposed at least partially on the illuminated surface of the semiconductor material. 8. The image sensor of claim 1 , wherein an isolation region surrounds, at least partially, the photodiode, and isolates the photodiode electrically and optically. 9. The image sensor of claim 1 , further comprising a reset transistor electrically coupled to the floating diffusion to reset the charges received in the floating diffusion. 10. The image sensor of claim 1 , further comprising an amplifier transistor electrically coupled to the floating diffusion to amplify the charges received in the floating diffusion. 11. An imaging system, comprising: a semiconductor material having an illuminated surface and a non-illuminated surface; a plurality of photodiodes formed in the semiconductor material extending from the illuminated surface to receive an incident light through the illuminated surface, wherein the received incident light generates charges in the photodiodes; a plurality of isolation structures, wherein each of the plurality of isolation structures is disposed between two adjacent photodiodes of the plurality of photodiodes; a plurality of transfer gates electrically coupled to the plurality of photodiodes to transfer the generated charges from the plurality of photodiodes to one or more floating diffusions; A plurality of near infrared (NIR) quantum efficiency (QE) enhancement structures, wherein each of NIR QE enhancement structures comprises at least two NIR QE enhancement elements within the a photosensitive region of individual photodiode of the plurality of photodiodes, wherein the NIR QE enhancement structures are configured to modify incident light at the illuminated surface of the semiconductor material by at least one of diffraction, deflection and reflection, to redistribute the incident light within the photodiode to improve an optical sensitivity, including near infrared light sensitivity, of the image system. 12. The imaging system of claim 11 , further comprising a plurality of reset transistors, wherein each of the plurality of reset transistors electrically coupled to the one or more floating diffusions to reset the charges received in the one or more floating diffusions. 13. The imaging system of claim 11 , further comprising a plurality of amplifier transistors, wherein each of the plurality of amplifier transistors electrically coupled to the one or more floating diffusions to amplify the charges received in the one or more floating diffusions. 14. The imaging system of claim 11 , further comprising a control circuitry and a readout circuitry, wherein the control circuitry controls operation of the plurality of photodiodes, and the readout circuitry reads out image data from the plurality of photodiodes. 15. The imaging system of claim 11 , wherein each NIR QE enhancement element of the NIR QE enhancement structures comprises a dielectric material having a refractive index smaller than a refractive index of the semiconductor material. 16. The imaging system of claim 11 , wherein at least two NIR QE enhancement elements of the NIR QE enhancement structures have a uniform size and shape, and are disposed in a periodic pattern. 17. The imaging system of claim 11 , wherein each NIR QE enhancement element of the NIR QE enhancement structures comprises a shape of one of a parallelepiped, a polygon, a cylinder, an ellipsoids, a hemispheroid, and a hemisphere. 18. The imaging system of claim 11 , wherein each NIR QE enhancement element of the NIR QE enhancement structures extends from the illuminated surface of the semiconductor material in the photodiode. 19. The imaging system of claim 11 , wherein each NIR QE enhancement element of the NIR QE enhancement structures is disposed at least partially on the illuminated surface of the semiconductor material. 20. The imaging system of claim 11 , wherein the illuminated surface of the semiconductor material is one of a front side surface and a back side surface of the semiconductor material.

Assignees

Inventors

Classifications

  • Pixel circuitry, e.g. memories, A/D converters, pixel amplifiers, shared circuits or shared components · CPC title

  • Circuitry of solid-state image sensors [SSIS]; Control thereof · CPC title

  • Electricity · mapped topic

  • Electricity · mapped topic

  • Electricity · mapped topic

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US9991309B1 cover?
An image sensor comprises a semiconductor material having an illuminated surface and a non-illuminated surface; a photodiode formed in the semiconductor material extending from the illuminated surface to receive an incident light through the illuminated surface, wherein the received incident light generates charges in the photodiode; a transfer gate electrically coupled to the photodiode to tra…
Who is the assignee on this patent?
Omnivision Tech Inc
What technology area does this patent fall under?
Primary CPC classification H01L27/14649. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jun 05 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 5 related publications on this page (citations in our corpus or others sharing the same primary CPC).