Apparatus and method for correlating images of a photolithographic mask

Patent metadata

Field	Value
Publication number	US-9990737-B2
Application number	US-201414568681-A
Country	US
Kind code	B2
Filing date	Dec 12, 2014
Priority date	Dec 13, 2013
Publication date	Jun 5, 2018
Grant date	Jun 5, 2018

Abstract

An apparatus for correlating at least two images of a photolithographic mask that at least partially overlap, in which the apparatus includes a correlation unit that is provided to use at least one random variation, which is present in the at least two images, of at least one structural element of the photolithographic mask for the correlation of the at least two images.

First claim

What is claimed is:

1. An apparatus for correlating at least two images of a photolithographic mask that at least partially overlap, the apparatus comprising:
a correlation unit that is provided to use at least one random variation, which is present in the at least two images, of at least one structural element of the photolithographic mask for the correlation of the at least two images, in which the correlation unit is configured to use information about the at least one random variation of the at least one structural element in a first of the at least two images and information about the at least one random variation of the at least one structural element in a second of the at least two images to correlate the at least two images, wherein the at least one random variation of the at least one structural element forms a marker that is always present on the photolithographic mask, and thus avoiding applying a marker being visible in the at least two images for correlating the at least two images, wherein the correlation unit is provided to generate from at least a first of the at least two images a simulation of a second of the at least two images, and wherein the simulated image is used for the correlation of the first and the second image.

2. The apparatus according to claim 1 , wherein at least one image of the at least two images is recorded by a particle microscope.

3. The apparatus according to claim 2 , wherein the particle microscope uses at least one of electrons, ions, or photons for the imaging of the photo-lithographic mask.

4. The apparatus according to claim 1 , wherein at least one image of the at least two images is recorded by a scanning probe microscope.

5. The apparatus according to claim 4 , wherein the scanning probe microscope comprises at least one of an atomic force microscope, a scanning tunneling microscope, a magnetic force microscope, a near-field scanning optical microscope, a near-field scanning acoustic microscope, or a scanning capacitance microscope.

6. The apparatus according to claim 1 , wherein the correlation unit is provided to correlate at least two images that have been recorded temporally shifted by the same particle microscope or scanning probe microscope.

7. The apparatus according to claim 1 , wherein the at least partial over-lap of the at least two images comprises at least an overlap region equal to or greater than 20% of the area of the smallest image.

8. The apparatus according to claim 1 , wherein the at least partial over-lap of the at least two images comprises at least an overlap region equal to or greater than 40% of the area of the smallest image.

9. The apparatus according to claim 1 , wherein the at least partial over-lap of the at least two images comprises at least an overlap region equal to or greater than 60% of the area of the smallest image.

10. The apparatus according to claim 1 , wherein the at least partial over-lap of the at least two images comprises at least an overlap region equal to or greater than 80% of the area of the smallest image.

11. The apparatus according to claim 1 , wherein the at least one random variation of the at least one structural element comprises a random deviation of at least one periodic structural element.

12. The apparatus according to claim 1 , wherein the at least one random variation comprises a surface roughness of the at least one structural element.

13. The apparatus according to claim 12 , wherein the surface roughness comprises an edge roughness of the at least one structural element.

14. The apparatus according to claim 1 , wherein the at least one random variation comprises a granular structure of the at least one structural element.

15. The apparatus according to claim 1 , wherein the correlation unit is provided to determine a transformation which transforms the at least two images into each other.

16. The apparatus according to claim 15 , wherein the correlation unit is provided to determine the transformation in a two-stage process: in a first step by using the at least one random variation of the at least one structural element, and in a second step on a pixel-by-pixel basis.

17. The apparatus according to claim 1 , wherein the correlation unit is further provided to determine a quality factor of the performed correlation.

18. The apparatus according to claim 1 , wherein the correlation unit is provided to determine, from at least one image having been recorded by a scanning probe microscope, at least one simulated image of a particle microscope.

19. The apparatus according to claim 18 , wherein the correlation unit is provided for correlating at least one simulated image of the particle microscope and at least one image recorded by the particle microscope.

20. The apparatus according to claim 1 , wherein the correlation unit is provided to determine, from at least one image having been recorded by a particle microscope, at least one simulated image of a scanning probe microscope.

21. The apparatus according to claim 20 , wherein the correlation unit is provided for correlating at least one simulated image of the scanning probe microscope and at least one image recorded with the scanning probe microscope.

22. The apparatus according to claim 1 , further comprising: means for correcting at least one defect of the photolithographic mask that is present in at least one of the at least two images.

23. A method for correlating at least two images of a photolithographic mask that at least partially overlap, the method comprising:
correlating the at least two images using at least one random variation, which is present in the at least two images, of at least one structural element of the photolithographic mask, including using information about the at least one random variation of the at least one structural element in a first of the at least two images and information about the at least one random variation of the structural element in a second of the at least two images to correlate the at least two images, wherein the at least one random variation of the at least one structural element forms a marker which is always present on the photolithographic mask, and thus avoiding applying a marker being visible in the at least two images for correlating the at least two images;
wherein the correlating comprises generating from at least a first of the at least two images a simulation of a second of the at least two images, and using the simulated image for the correlation of the first and the second image.

24. The method according to claim 23 , wherein the method further makes use of an apparatus.

25. The method according to claim 23 , further comprising correcting at least one defect of the photolithographic mask that is present in at least one of the at least two images.

26. A non-transitory computer readable medium storing a computer program comprising instructions that when executed by a computer, cause the computer to:
correlate at least two images of a photolithographic mask that at least partially overlap, including correlating the at least two images using at least one random variation, which is present in the at least two images, of at least one structural element of the photolithographic mask, including using information about the at least one random variation of the at least one structural element in a first of the at least two images and information about the at least one random variation of the at least on

Assignees

• Zeiss Carl Smt Gmbh

Inventors

• Weber Dieter
• Waiblinger Markus

Classifications

• H01J37/26 Primary

  Electron or ion microscopes; Electron or ion diffraction tubes · CPC title

• G06T7/40 Primary

  Analysis of texture (depth or shape recovery from texture G06T7/529) · CPC title

• G06V10/467

  Encoded features or binary features, e.g. local binary patterns [LBP] · CPC title

• H01J2237/31744

  introducing gas in vicinity of workpiece · CPC title

• G06T11/60

  Creating or editing images; Combining images with text · CPC title