Epitaxial diamond layer and method for the production thereof

Patent metadata

Field	Value
Publication number	US-9988737-B2
Application number	US-201614996835-A
Country	US
Kind code	B2
Filing date	Jan 15, 2016
Priority date	Jan 19, 2015
Publication date	Jun 5, 2018
Grant date	Jun 5, 2018

Abstract

An epitaxial diamond layer and a method for the production thereof can be provided that comprises the following steps: providing a substrate; depositing a metal layer on at least a subarea of the substrate, wherein the metal layer contains, or consists of, at least one period 4, 5 or 6 metal having a melting point of greater than or equal to 1200 K; and depositing a diamond layer on at least a subarea of the metal layer; wherein at least one intermediate layer is deposited between the metal layer and the diamond layer and has a higher lattice constant than undoped crystalline diamond and a lower hardness than undoped crystalline diamond.

First claim

We claim:

1. A method for producing epitaxial diamond layers, comprising the following steps:
providing a substrate;
depositing a metal layer on at least a subarea of the substrate, wherein the metal layer comprises at least one period 4, 5 or 6 metal having a melting point of greater than or equal to 1200 K; and
depositing a diamond layer on at least a subarea of the metal layer, wherein at least one intermediate layer is deposited on the metal layer and the diamond layer, wherein the at least one intermediate layer has a higher lattice constant than undoped crystalline diamond and a lower hardness than undoped crystalline diamond, and the at least one intermediate layer comprises a diamond doped at least with boron.

2. The method according to claim 1 , wherein the substrate comprises at least one of diamond, silicon, MgO 2 , or SrTiO 3 .

3. The method according to claim 1 , wherein the period 4, 5 or 6 metal is selected from at least one of platinum, iridium, rhenium, or molybdenum.

4. The method according to claim 1 , wherein between about 2·10 21 cm −3 and about 5·10 22 cm −3 or between about 5·10 21 cm −3 and about 1·10 22 cm −3 or between about 5·10 21 cm −3 and about 9·10 21 cm −3 boron atoms are introduced into the intermediate layer.

5. The method according to claim 1 , wherein the number of boron atoms decreases with the thickness of the intermediate layer or that the intermediate layer changes in graded fashion into the diamond layer.

6. The method according to claim 1 , wherein the lattice constant of the intermediate layer is higher by an amount δa than the lattice constant of the diamond layer, wherein the ratio δa/a is selected between about 5·10 −4 and about 4·10 −3 or between about 1·10 −3 and about 3·10 −3 .

7. An epitaxial layer comprising:
a diamond layer on a substrate, wherein a metal layer is present at least on a subarea of the substrate and the metal layer comprises at least one period 4, 5 or 6 metal having a melting point of greater than or equal to 1200 K, and
at least one intermediate layer is arranged between the metal layer and the diamond layer, said intermediate layer having a higher lattice constant than undoped crystalline diamond and a lower hardness than undoped crystalline diamond, and the intermediate layer comprises diamond doped at least with boron.

8. The epitaxial layer according to claim 7 , wherein the period 4, 5 or 6 metal is selected from at least one of platinum, iridium, rhenium, or molybdenum.

9. The epitaxial diamond layer according to claim 7 , wherein the substrate comprises at least one of diamond, silicon, MgO 2 , or SrTiO 3 .

10. The epitaxial layer according to claim 7 , wherein the number of boron atoms in the intermediate layer is between about 2·10 21 cm −3 and about 5·10 22 cm −3 or between about 5·10 21 cm −3 and about 1·10 22 cm −3 or between about 5·10 21 cm −3 and about 9·10 21 cm −3 .

11. The epitaxial layer according to claim 7 , wherein the number of boron atoms decreases with the thickness of the intermediate layer or that the intermediate layer changes in graded fashion into the diamond layer.

12. The epitaxial layer according to claim 11 , wherein the lattice constant of the intermediate layer is higher by an amount δa/a than the lattice constant of the diamond layer, wherein the ratio δa/a is selected between about 5·10 −4 and about 4·10 −3 or between about 1·10 −3 and about 3·10 −3 .

Assignees

• Fraunhofer Ges Forschung

Inventors

• Nebel Christoph E
• Widmann Claudia

Classifications

• A41D2500/20

  Woven · CPC title

• A41D19/001

  Linings · CPC title

• A41D2400/80

  Friction or grip reinforcement · CPC title

• C30B29/04

  Diamond · CPC title

• C30B25/183 Primary

  being provided with a buffer layer, e.g. a lattice matching layer · CPC title