Gas optimization in a gas discharge light source
US-2019190229-A1 · Jun 20, 2019 · US
US9985408B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9985408-B2 |
| Application number | US-201715414934-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 25, 2017 |
| Priority date | Aug 1, 2014 |
| Publication date | May 29, 2018 |
| Grant date | May 29, 2018 |
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A gas laser excitation system with an integrated impedance matching circuit, comprises a gas laser electrode, a high-frequency connection line connectable to the gas laser electrode and configured for transmission of high-frequency power to the gas laser electrode, and a shield configured to shield the high-frequency power to be transmitted. The shield is arranged between the high-frequency connection line and the gas laser electrode. The high-frequency connection line interacts with the gas laser electrode and/or the shield in such a way that the resulting impedance changes at least across a section of the high-frequency connection line.
Opening claim text (preview).
What is claimed is: 1. A gas laser excitation system having an integrated impedance matching circuit, the system comprising: a gas laser electrode; a high-frequency connecting line connected to the gas laser electrode and configured to transfer high-frequency power to the gas laser electrode; and a shield arranged between the high-frequency connecting line and the gas laser electrode and configured to shield the high-frequency power to be transferred, wherein the high-frequency connecting line is configured to interact with at least one of the gas laser electrode or the shield such that an impedance over at least a portion of the high-frequency connecting line changes. 2. The gas laser excitation system of claim 1 , wherein the high-frequency connecting line is adapted to at least one of a geometry of the gas laser electrode or a geometry of the shield. 3. The gas laser excitation system of claim 1 , wherein at least one portion of the high-frequency connecting line is arranged at a defined distance with the gas laser electrode. 4. The gas laser excitation system of claim 3 , wherein the at least one portion of the high-frequency connecting line is in parallel with the gas laser electrode. 5. The gas laser excitation system of claim 3 , wherein the defined distance is no more than a percentage of a length of the at least one portion of the high-frequency connecting line, and wherein the percentage is 50%, 20%, or 10%. 6. The gas laser excitation system of claim 3 , wherein the defined distance is determined such that a high-frequency electric field is created between the high-frequency connecting line and the gas laser electrode when the high-frequency power is conducted by the high-frequency connecting line. 7. The gas laser excitation system of claim 1 , wherein at least a part of the gas laser electrode is part of the impedance matching circuit. 8. The gas laser excitation system of claim 1 , wherein at least a part of the gas laser electrode is part of the high-frequency connecting line. 9. The gas laser excitation system of claim 1 , wherein the impedance matching circuit comprises at least a part of the high-frequency connecting line and at least a part of the shield. 10. The gas laser excitation system of claim 1 , wherein at least one region of an entire surface of the high-frequency connecting line is co-planar or concentric with respect to one of a region of a surface of the gas laser electrode and a region of a surface of the shield. 11. The gas laser excitation system of claim 10 , wherein the at least one region is more than 50% of the entire surface of the high-frequency connecting line. 12. The gas laser excitation system of claim 1 , wherein at least one region of the high-frequency connecting line is in parallel with the gas laser electrode or the shield, and wherein a diameter or width of the high-frequency connecting line changes in the at least one region. 13. The gas laser excitation system of claim 12 , wherein the diameter or width of the high-frequency connecting line becomes smaller approaching the gas laser electrode. 14. The gas laser excitation system of claim 1 , wherein the gas laser electrode comprises a hollow-cylindrical gas laser electrode, and at least one portion of the high-frequency connecting line is arranged in the hollow-cylindrical gas laser electrode. 15. The gas laser excitation system of claim 1 , wherein the high-frequency connecting line comprises an outer conductor configured to be the gas laser electrode. 16. The gas laser excitation system of claim 1 , wherein the high-frequency connecting line comprises an outer conductor formed as the shield. 17. The gas laser excitation system of claim 1 , wherein the shield is connected to earth. 18. The gas laser excitation system of claim 1 , wherein the shield comprises a recess through which the high-frequency connecting line is connected to the gas laser electrode at a supply location. 19. The gas laser excitation system of claim 18 , wherein a width of the high-frequency connecting line becomes smaller approaching the supply location. 20. The gas laser excitation system of claim 18 , wherein, on a left side of the supply location, a first portion of the shield is provided between the high-frequency connecting line and a first part of the gas laser electrode, and wherein, on a right side of the supply location, a second portion of the shield and a second part of the gas laser electrode are provided, with no high-frequency connecting line between the second portion of the shield and the second part of the gas laser electrode.
transversely excited (H01S3/0975 takes precedence) · CPC title
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