Substrate treatment system, substrate transfer method and computer storage medium

Patent metadata

Field	Value
Publication number	US-9984905-B2
Application number	US-201615252422-A
Country	US
Kind code	B2
Filing date	Aug 31, 2016
Priority date	Nov 4, 2011
Publication date	May 29, 2018
Grant date	May 29, 2018

Abstract

An interface station of a coating and developing treatment system has: a cleaning unit cleaning at least a rear surface of a wafer before the wafer is transferred into an exposure apparatus; an inspection unit inspecting the rear surface of the cleaned wafer whether the wafer is exposable, before it is transferred into the exposure apparatus; wafer transfer mechanisms including arms transferring the wafer between the units and a wafer transfer control part controlling operations of the wafer transfer mechanisms. When it is determined that a state of the wafer becomes an exposable state by re-cleaning in the cleaning unit as a result of the inspection, the wafer transfer control part controls the wafer transfer mechanisms to transfer the wafer again to the cleaning unit.

First claim

What is claimed is:

1. A substrate transfer method in a substrate treatment system comprising a treatment station in which a plurality of treatment units each treating a substrate, and an interface station in a casing which is located between said treatment station and an exposure apparatus, the interface station delivering the substrate between the treatment station and an exposure apparatus provided outside the casing,
the interface station comprising:
a cleaning unit cleaning at least a rear surface of the substrate;
an inspection unit inspecting at least the rear surface of the cleaned substrate;
a substrate transfer mechanism including an arm transferring the substrate between the cleaning unit and the inspection unit; and
a substrate transfer control part, the substrate transfer control part is configured for
controlling the cleaning unit to clear at least the rear surface of the substrate,
controlling the substrate transfer mechanism to transfer the substrate from said cleaning unit into said inspection unit;
controlling the inspection unit to inspect at least the rear surface of the cleaned substrate transferred from the cleaning unit, to determine from a result of the inspection by the inspection unit whether the substrate is in an exposable state that allows exposure in the exposure apparatus, and when it is determined that the substrate is not in the exposable state determining from the result of the inspection whether the substrate becomes the exposable state by re-cleaning;
when it is determined from the result of the inspection that the state of the substrate is in the exposable state, controlling said substrate transfer mechanism to transfer the substrate to the exposure apparatus,
when it is determined from the result of the inspection that the state of the substrate becomes the exposable state by re-cleaning, controlling said substrate transfer mechanism to transfer the substrate again to the cleaning unit and controlling the cleaning unit to re-clean at least the rear surface of the substrate;
when it is determined from the result of the inspection that the state of the substrate does not become the exposable state by re-cleaning, stopping the treatments on the substrate and controlling the substrate transfer mechanism to facilitate collecting the substrate.

2. The substrate transfer method as set forth in claim 1 ,
the substrate which has been transferred again to the cleaning unit and cleaned therein is transferred again to the inspection unit.

3. The substrate transfer method as set forth in claim 1 ,
wherein in the interface station, a buffer housing part temporarily housing the substrate which has been inspected in the inspection unit is provided.

4. The substrate transfer method as set forth in claim 3 ,
wherein the substrate transfer mechanism includes a first transfer arm transferring the substrate transferred into the interface station to the cleaning unit, and a second transfer arm transferring the substrate which has been cleaned in the cleaning unit to the inspection unit and transferring the substrate which has been inspected in the inspection unit to the buffer housing part.

5. The substrate transfer method as set forth in claim 3 ,
wherein the substrate transfer mechanism includes a first transfer arm transferring the substrate transferred into the interface station to the cleaning unit, a second transfer arm transferring the substrate which has been cleaned in the cleaning unit to the inspection unit, and a third transfer arm transferring the substrate which has been inspected in the inspection unit to the buffer housing part.

6. The substrate transfer method as set forth in claim 3 ,
wherein the inspected substrate is housed in the buffer housing part until an inspection result in the inspection unit is available.

7. The substrate transfer method as set forth in claim 1 ,
wherein in the interface station, a dehydration unit removing moisture adhering to the substrate which has been cleaned in the cleaning unit is provided.

8. The substrate transfer method as set forth in claim 7 ,
wherein the substrate transfer mechanism is provided to be movable along an up and down direction,
wherein the cleaning unit is provided on either a front side or a back side in the interface station,
wherein the inspection unit is provided on a side across the substrate transfer mechanism from the cleaning unit, and
wherein the dehydration unit is provided at multiple tiers for the cleaning unit or the inspection unit on either a side of the cleaning unit or a side of the inspection unit.

9. The substrate transfer method as set forth in claim 7 ,
wherein the substrate transfer mechanism is provided to be movable along an up and down direction,
wherein each of the cleaning unit and the inspection unit is provided at multiple tiers in the up and down direction on either a front side or a back side in the interface station, and
wherein the dehydration unit is provided on a side across the substrate transfer mechanism from the cleaning units and the inspection units.

10. The substrate transfer method as set forth in claim 1 ,
wherein an arm cleaning mechanism cleaning the arm of the substrate transfer mechanism is provided on a side where the cleaning unit is disposed in the interface station.

11. The substrate transfer method as set forth in claim 10 ,
wherein the cleaning unit also serves as the arm cleaning mechanism.

12. The substrate transfer method as set forth in claim 1 ,
wherein a temperature of the substrate which has been inspected in the inspection unit and will be transferred into the exposure apparatus is regulated to a predetermined temperature.

13. The substrate transfer method as set forth in claim 12 ,
wherein the temperature regulation of the substrate is performed in the inspection unit.

14. The substrate transfer method as set forth in claim 1 , wherein the interface station further comprises
a buffer housing part that temporarily houses the substrate which has been inspected in said inspection unit;
wherein the substrate transfer control part is further configured for
controlling the substrate transfer mechanism to transfer the substrate which is inspected to the buffer housing part before transferring the substrate based on the result of the inspection by the inspection unit.

15. The substrate transfer method as set forth in claim 1 , wherein the interface station further comprises
a buffer housing part that temporarily houses the substrate which has been inspected in said inspection unit;
wherein the substrate transfer control part is further configured for
controlling the substrate transfer mechanism to transfer the substrate which is inspected to the buffer housing part before transferring the substrate based on the result of the inspection by the inspection unit,

wherein the cleaning unit, the inspection unit, and the buffer housing part are arranged in the same casing which is located between the treatment stations and the exposure apparatus,
wherein each of said cleaning unit and said inspection unit is provided at multiple tiers in an up and down direction on either a front side or a back side in said interface station, and
wherein said substrate transfer mechanism is provided in a region adjacent to said cleaning units and said inspection units provided at multiple tiers in the up and down direction.

16. A non-transitory computer-readable storage medium storing a program running on a computer of a control unit controlling a substrate treatment system to cause the substrate treatment system to execu

Assignees

• Tokyo Electron Ltd

Inventors

• Nakaharada Masahiro
• Sakata Yoji
• Miyata Akira
• Hayashi Shinichi
• Enokida Suguru
• Nakashima Tsunenaga

Classifications

• H10P74/23

  characterised by multiple measurements, corrections, marking or sorting processes · CPC title

• H10P72/7614

  characterised by a plurality of individual support members, e.g. support posts or protrusions · CPC title

• H10P72/3306

  Horizontal transfer of a single workpiece · CPC title

• H10P72/3202

  Mechanical details, e.g. rollers or belts · CPC title

• H10P72/0604

  Process monitoring, e.g. flow or thickness monitoring · CPC title