Vertical nand device with shared word line steps
US-2015279852-A1 · Oct 1, 2015 · US
US9978756B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9978756-B2 |
| Application number | US-201715412689-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 23, 2017 |
| Priority date | May 16, 2016 |
| Publication date | May 22, 2018 |
| Grant date | May 22, 2018 |
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Semiconductor chips are provided. A semiconductor chip includes a peripheral circuit region on a substrate. The semiconductor chip includes a semiconductor layer on the peripheral circuit region. The semiconductor chip includes a cell region on the semiconductor layer. Moreover, the semiconductor chip includes a layer/connector that is adjacent the semiconductor layer. Methods of manufacturing semiconductor chips are also provided.
Opening claim text (preview).
What is claimed is: 1. A semiconductor chip comprising: a peripheral circuit region on a surface of a substrate; a semiconductor layer on the peripheral circuit region; a layer that is electrically connected to, and extends laterally in a first direction adjacent a side of, the semiconductor layer, wherein the first direction and a second direction are perpendicular to each other and are parallel to the surface of the substrate, and wherein, in a plan view, the layer extends shorter distances in the first direction and the second direction, respectively, than the semiconductor layer; and a cell region on the semiconductor layer. 2. The semiconductor chip of claim 1 , wherein the layer that is electrically connected to the semiconductor layer is at a same layer level as the semiconductor layer. 3. The semiconductor chip of claim 1 , wherein the semiconductor layer and the layer that is electrically connected to the semiconductor layer comprise a same material. 4. The semiconductor chip of claim 3 , wherein the semiconductor layer and the layer that is electrically connected to the semiconductor layer comprise respective polysilicon layers. 5. The semiconductor chip of claim 3 , wherein the semiconductor layer and the layer that is electrically connected to the semiconductor layer comprise respective single crystalline silicon layers. 6. The semiconductor chip of claim 1 , wherein the layer that is electrically connected to the semiconductor layer comprises a conductive layer. 7. The semiconductor chip of claim 1 , further comprising a pad region at a side of the cell region. 8. The semiconductor chip of claim 7 , wherein the pad region overlaps the layer that is electrically connected to the semiconductor layer in a third direction perpendicular to the surface of the substrate. 9. The semiconductor chip of claim 7 , wherein the pad region overlaps the semiconductor layer in a third direction perpendicular to the surface of the substrate. 10. A semiconductor chip comprising: a peripheral circuit on a substrate; a semiconductor layer on the peripheral circuit; a layer at a same layer level as the semiconductor layer and electrically connected to a portion of the semiconductor layer, wherein the layer laterally protrudes from the semiconductor layer and is narrower, in a plan view, than the peripheral circuit; and a cell region on the semiconductor layer and comprising a transistor of a memory cell. 11. The semiconductor chip of claim 10 , wherein the layer that is at the same layer level as the semiconductor layer and is electrically connected to the portion of the semiconductor layer is at a boundary region of the semiconductor layer and comprises a polysilicon layer or a single crystalline silicon layer. 12. The semiconductor chip of claim 10 , wherein the memory cell overlaps the peripheral circuit on the substrate. 13. The semiconductor chip of claim 10 , wherein the peripheral circuit comprises a page buffer, a latch circuit, a cache circuit, a row decoder, a column decoder, a sense amplifier, or a data in/out circuit. 14. The semiconductor chip of claim 10 , further comprising a peripheral circuit wiring structure in the cell region and electrically connected to the peripheral circuit. 15. A semiconductor chip comprising: a substrate; a memory cell region on the substrate; a peripheral circuit region between the memory cell region and the substrate, wherein the peripheral circuit region comprises circuitry configured to process data input into and/or output from the memory cell region; a semiconductor layer between the memory cell region and the peripheral circuit region; and a connector that extends laterally from a perimeter portion of the semiconductor layer, wherein an outermost portion of the connector comprises a cut portion of the semiconductor chip, and wherein, in a plan view, the outermost portion of the connector is narrower, in a cut direction of the connector, than the semiconductor layer. 16. The semiconductor chip of claim 15 , wherein the connector comprises a conductive material or a same material as the semiconductor layer. 17. The semiconductor chip of claim 16 , wherein the connector comprises a first connector on a first side of the semiconductor layer, and wherein the semiconductor chip further comprises a second connector on a second side of the semiconductor layer. 18. The semiconductor chip of claim 15 , wherein the connector defines a portion of an outermost edge of the semiconductor chip. 19. The semiconductor chip of claim 15 , wherein the semiconductor layer comprises a well region, and wherein the connector is adjacent the well region of the semiconductor layer. 20. The semiconductor chip of claim 15 , wherein the cut direction of the connector comprises a first direction that is perpendicular to a second direction in which the connector extends laterally from the perimeter portion of the semiconductor layer.
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