Integrated circuit implementing standard cells with metal layer segments extending out of cell boundary

US9977854B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9977854-B2
Application numberUS-201615207691-A
CountryUS
Kind codeB2
Filing dateJul 12, 2016
Priority dateJul 12, 2016
Publication dateMay 22, 2018
Grant dateMay 22, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A computer-implemented method of fabricating an integrated circuit structure includes selecting a first cell from a standard cell library, the first cell having a cell boundary and comprising a metal segment at a first metal track at a metal layer, the metal segment extending along a direction and terminating a specified distance beyond a first edge of the cell boundary. The method further includes placing the first cell at a first location of a physical layout for the integrated circuit structure. The method also includes selecting a second cell from the standard cell library and placing the second cell at a second location of the physical layout such that a second edge of a cell boundary of the second cell abuts the first edge of the cell boundary of the first cell, and wherein the metal segment extends into a metal track at the metal layer of the second cell.

First claim

Opening claim text (preview).

What is claimed is: 1. An integrated circuit structure comprising: a first cell extending along orthogonal first and second directions of a semiconductor substrate and having a cell boundary, the first cell comprising: a first metal segment at a first metal track of an M 1 metal layer, the first metal segment extending along the first direction and terminating a specified first distance beyond a first edge of the cell boundary; and a pin extending outside of the cell boundary of the first cell and coupled to the first metal segment. 2. The integrated circuit structure of claim 1 , wherein the first cell further comprises: a second metal segment at a second metal track at the M 1 metal layer, the second metal segment extending along the first direction and terminating at least a specified second distance before the first edge. 3. The integrated circuit structure of claim 2 , wherein the first distance and the second distance are substantially equal. 4. The integrated circuit structure of claim 2 , wherein: the first metal segment terminates at least the second distance before a second edge of the cell boundary, the second edge opposite the first edge. 5. The integrated circuit structure of claim 4 , wherein: the second metal segment terminates at least the specified second distance before the second edge of the cell boundary. 6. The integrated circuit structure of claim 5 , wherein the first distance and the second distance are substantially equal. 7. The integrated circuit structure of claim 1 , further comprising: a second cell extending along the first and second directions and having a cell boundary with a second edge adjacent to the first edge of the cell boundary of the first cell; and wherein the first metal segment extends into a first metal track of the second cell at the M 1 metal layer. 8. The integrated circuit structure of claim 7 , wherein the second cell further comprises: a second metal segment at a second metal track at the M 1 metal layer, the second metal segment extending along the first direction and terminating the specified first distance beyond the second edge; and wherein the second metal segment extends into a second metal track of the first cell at the M 1 metal layer. 9. The integrated circuit structure of claim 7 , wherein: a remaining portion of the first metal track of the first cell is devoid of metal at the metal layer. 10. The integrated circuit structure of claim 7 , wherein: a remaining portion of the first metal track of the second cell comprises stub routing at the M 1 metal layer. 11. A non-transitory computer readable medium embodying a set of executable instructions for fabricating an integrated circuit structure, the set of executable instructions to: build an integrated circuit structure by extending a cell boundary of a first cell along orthogonal first and second directions and forming a first metal segment at a first metal track at a first metal layer, the first metal segment extending along a first direction and terminating a specified first distance beyond a first edge of the cell boundary; and coupling a pin of the first metal layer outside of the cell boundary of the first cell to the first metal segment. 12. The non-transitory computer readable medium of claim 11 , the set of executable instructions further to: form a second metal segment at a second metal track at the first metal layer, the second metal segment extending along the first direction and terminating a specified second distance before the first edge. 13. The non-transitory computer readable medium of claim 12 , wherein: the first metal segment terminates the second distance before a second edge of the cell boundary, the second edge opposite the first edge. 14. The non-transitory computer readable medium of claim 13 , wherein: the second metal segment terminates the specified second distance before the second edge of the cell boundary. 15. The non-transitory computer readable medium of claim 14 , wherein the first distance and the second distance are substantially equal. 16. The non-transitory computer readable medium of claim 11 , the set of executable instructions further to: abut a second edge of a cell boundary of a second cell with the first edge of the cell boundary of the first cell; and wherein the first metal segment extends into a first metal track of a second cell at the first metal layer. 17. The non-transitory computer readable medium of claim 16 , wherein: the second cell comprises a second metal segment at a second metal track at the first metal layer, the second metal segment extending along the first direction and terminating the specified first distance beyond the second edge; and the second metal segment extends into a second metal track of the first cell at the first metal layer. 18. The non-transitory computer readable medium of claim 16 , the set of executable instructions further to: route a stub at the first metal layer using a remaining portion of the first metal track.

Assignees

Inventors

Classifications

  • Floor-planning or layout, e.g. partitioning or placement · CPC title

  • Configuration CAD, e.g. designing by assembling or positioning modules selected from libraries of predesigned modules · CPC title

  • Routing (G06F30/396 takes precedence) · CPC title

  • Physics · mapped topic

  • Electricity · mapped topic

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Frequently asked questions

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What does patent US9977854B2 cover?
A computer-implemented method of fabricating an integrated circuit structure includes selecting a first cell from a standard cell library, the first cell having a cell boundary and comprising a metal segment at a first metal track at a metal layer, the metal segment extending along a direction and terminating a specified distance beyond a first edge of the cell boundary. The method further incl…
Who is the assignee on this patent?
Ati Technologies Ulc, Advanced Micro Devices Inc
What technology area does this patent fall under?
Primary CPC classification G06F17/5072. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue May 22 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).