Micro-electro-mechanical pressure device and methods of forming same

Patent metadata

Field	Value
Publication number	US-9975756-B2
Application number	US-201615276613-A
Country	US
Kind code	B2
Filing date	Sep 26, 2016
Priority date	Feb 25, 2016
Publication date	May 22, 2018
Grant date	May 22, 2018

Abstract

A micro-electro-mechanical pressure sensor device, formed by a cap region and by a sensor region of semiconductor material. An air gap extends between the sensor region and the cap region; a buried cavity extends underneath the air gap, in the sensor region, and delimits a membrane at the bottom. A through trench extends within the sensor region and laterally delimits a sensitive portion housing the membrane, a supporting portion, and a spring portion, the spring portion connecting the sensitive portion to the supporting portion. A channel extends within the spring portion and connects the buried cavity to a face of the second region. The first air gap is fluidically connected to the outside of the device, and the buried cavity is isolated from the outside via a sealing region arranged between the sensor region and the cap region.

First claim

The invention claimed is:

1. A micro-electro-mechanical pressure sensor device, comprising:
a first region;
a second region of semiconductor material having a first face and a second face, the first region facing and fixed to the first face of the second region;
a first air gap between the first face of the second region and the first region;
a buried cavity in the second region;
a membrane within the second region between the buried cavity and the first face of the second region;
a through trench in the second region, the through trench laterally delimiting a supporting portion, a spring portion, and a sensitive portion housing the membrane, the spring portion coupling the sensitive portion to the supporting portion; and
a channel in the spring portion, the channel fluidically coupling the buried cavity to a first portion of the first face of the second region, the first portion of the first face being fluidically isolated from a second portion of the first face of the second region, the second portion of the first face forming a surface of the membrane, the first portion of the first face being in fluid communication with an external environment.

2. The device according to claim 1 , comprising a sealing region that fluidically isolates the first portion of the first face of the second region from the second portion of the first face of the second region.

3. The device according to claim 2 , wherein the channel extends at distance from the first face of the second region, and an opening extends in the first portion of the first face of the second region and between the first face and the channel, the sealing region having a closed shape surrounding a chamber between the first and second regions and fluidically coupled to the opening.

4. The device according to claim 3 , wherein the first region has an outer face and an inner face, the inner face facing the second region, and wherein at least one through hole extends between the inner face and the outer face of the first region outside the chamber and connects the first air gap with the outer face of the first region.

5. The device according to claim 3 , further comprising a third region facing the second face of the second region and a second air gap between the second face of the second region and the third region, wherein the third region has an outer face and an inner face, the inner face facing the second region, and wherein at least one through hole extends from the inner face to the outer face of the third region and ends at the second air gap and connecting the second air gap with the outer face of the second region.

6. The device according to claim 3 , wherein the first region has an outer face and an inner face, the inner face facing the second region, and wherein a through hole extends between the outer face and the inner face of the first region, inside the sealing region, the first air gap being fluidically isolated from the through hole by the sealing region.

7. The device according to claim 2 , wherein the first region and the second region are bonded together through a bonding structure including the sealing region and delimiting the first air gap.

8. The device according to claim 1 , further comprising:
a third region facing a second face of the second region and a second air gap between the second face of the second region and the third region,
wherein the third region and the second region are bonded together via a bonding layer delimiting the second air gap.

9. The device according to claim 1 , further comprising a third region of semiconductor material and monolithic with the second region, and a second air gap between the second region and the third region.

10. The device according to claim 1 , comprising a getter region on the first region facing one of the first and second portions of the first face that is not in fluid communication with the external environment.

11. A process for manufacturing a micro-electro-mechanical pressure sensor device, the process comprising:
forming a buried cavity in a first body of a semiconductor material, the buried cavity delimiting a membrane at a first face of the first body, wherein forming the buried cavity includes forming an open channel in the first body;
forming, within the first body, a trench, the trench delimiting a sensitive portion including the buried cavity, a supporting portion, and a spring portion, wherein the spring portion couples the sensitive portion to the supporting portion, the spring portion including a channel that fluidically couples the buried cavity to a first portion of the first face of the first body, wherein the open channel is formed simultaneously with the channel of the spring portion; and
bonding a second body to the first face of the first body to form a first air gap over the membrane, wherein bonding the second body to the first face of the first body comprises forming a sealing structure that fluidically isolates the first portion of the first face of the first body from a second portion of the first face of the first body.

12. The process according to claim 11 , wherein forming the sealing structure comprises forming a sealing region between the first face of the first body and the second body.

13. The process according to claim 11 , comprising forming a fluidic path comprises forming at least one through hole in the second body outside the sealing region and in fluidic communication with the first air gap.

14. The process according to claim 11 , wherein forming the sealing structure comprises simultaneously forming a bonding region delimiting the first air gap.

15. The process according to claim 11 , comprising bonding a third body to a second face of the first body and forming a second air gap between the second face of the first body and a face of the third body, wherein bonding the third body comprises forming a bonding layer delimiting the second air gap.

16. A process for manufacturing a micro-electro-mechanical pressure sensor device, the process comprising:
forming a buried cavity in a first body of a semiconductor material, the buried cavity delimiting a membrane at a first face of the first body;
forming, within the first body, a trench, the trench delimiting a sensitive portion including the buried cavity, a supporting portion, and a spring portion, wherein the spring portion couples the sensitive portion to the supporting portion, the spring portion including a channel that fluidically couples the buried cavity to a first portion of the first face of the first body;
bonding a second body to the first face of the first body to form a first air gap over the membrane, wherein bonding the second body to the first face of the first body comprises forming a sealing structure that fluidically isolates the first portion of the first face of the first body from a second portion of the first face of the first body, wherein forming the sealing structure comprises forming a sealing region between the first face of the first body and the second body; and
forming at least one opening in the first body from the first face to the channel of the spring portion, the sealing region having a closed shape surrounding the at least one opening.

17. The process according to claim 16 , wherein forming the buried cavity includes forming an open channel in the first body, wherein forming the open channel includes forming the channel of the spring portion simultaneously.

18. The process according to claim 16 , wherein the at least one opening is inside the sealing region and in fluidic connection with the channel and t

Assignees

• St Microelectronics Srl

Inventors

• Duqi Enri
• Conti Sebastiano
• Baldo Lorenzo
• Villa Flavio Francesco

Classifications

• B81C1/00373

  Selective deposition, e.g. printing or microcontact printing · CPC title

• B81B2201/0264

  Pressure sensors · CPC title

• B81B3/0086

  Electrical characteristics, e.g. reducing driving voltage, improving resistance to peak voltage · CPC title

• B81C2201/00

  Manufacture or treatment of microstructural devices or systems · CPC title

• B81B7/0038 Primary

  using materials for controlling the level of pressure, contaminants or moisture inside of the package, e.g. getters · CPC title