Laminate, barrier film and method for manufacturing these

Patent metadata

Field	Value
Publication number	US-9957613-B2
Application number	US-201514866407-A
Country	US
Kind code	B2
Filing date	Sep 25, 2015
Priority date	Mar 27, 2013
Publication date	May 1, 2018
Grant date	May 1, 2018

Abstract

A laminate includes: a base material having a top surface; an under coat layer formed on at least a part of the top surface of the base material, having a membranous shape or a film shape and containing an organic polymer having an OH group; and an atomic layer deposition film formed in a membranous shape to cover an exposed surface of the under coat layer, the atomic layer deposition film being formed by a precursor as a material thereof. At least a part of the precursor is coupled to the OH group of the organic polymer.

First claim

What is claimed is:

1. A laminate comprising:
a base material having a top surface;
an under coat layer formed on at least a part of the top surface of the base material, having a membranous shape or a film shape and containing an organic polymer having an OH group; and
an atomic layer deposition film formed in a membranous shape to cover an exposed surface of the under coat layer, the atomic layer deposition film being formed by a precursor as a material thereof, wherein
at least a part of the precursor is coupled to the OH group of the organic polymer.

2. The laminate of claim 1 ,
wherein the organic polymer is a copolymer of poly (methacrylic acid-2-hydroxyethyl) and polymethylmethacrylate.

3. The laminate of claim 2 ,
wherein the poly (methacrylic acid-2-hydroxyethyl) of the copolymer is contained in the copolymer in a ratio of 15 mol % to 50% mol.

4. The laminate of claim 2 ,
wherein a part of the OH group contained in the poly (methacrylic acid-2-hydroxyethyl) is cross-linked to form a three-dimensional mesh structure.

5. A laminate comprising:
a polymer base material having a top surface;
an under coat layer formed on at least a part of the top surface of the polymer base material, having a membranous shape or a film shape and containing an organic polymer;
an adhesive layer formed to cover a top surface of the under coat layer, containing a functional group having nucleophilicity, wherein at least an element ratio O/C which is a ratio between an oxygen O and an carbon C, or an element ratio N/C which is a ratio between a nitrogen N and a carbon C is higher than that of the under coat layer; and
an atomic layer deposition layer formed using a precursor as a material thereof to cover a top surface of the adhesive layer,
wherein at least a part of the precursor is coupled to the functional group having nucleophilicity.

6. The laminate of claim 5 ,
wherein the under coat layer includes an element or a functional group which contain a non-covalent electron pair.

7. The laminate of claim 5 ,
wherein a film thickness of the adhesive layer is in a range from 0.1 nm to 100 nm.

8. The laminate of claim 5 ,
wherein a film thickness of the under coat layer is in a range from 100 nm to 100 μm.

9. The laminate of claim 5 ,
wherein a film thickness of the atomic layer deposition film is in a range from 2 nm to 50 nm.

10. The laminate of claim 5 ,
wherein the atomic layer deposition film contains at least either Al or Si.

11. The laminate of claim 5 ,
wherein the atomic layer deposition film contains Ti on a top surface that contacts the adhesive layer.

12. A gas barrier film provided with the laminate formed in a film shape according to claim 1 .

13. A method of manufacturing laminate comprising steps of:
preparing a base material;
forming an under coat layer on at least a part of a top surface of the base material, having a membranous shape or a film shape and containing an organic polymer having a functional group;
surface-treating a part of an exposed surface of the under coat layer and densifying the functional group of the organic polymer;
supplying a precursor material on the exposed surface such that a precursor that becomes an atomic layer deposition film is coupled to an OH group and a densified functional group of the organic polymer contained in the under coat layer; and
removing, from the precursor material, excess precursor material which is not coupled to the under coat layer and saturating a coupling amount of the precursor which is coupled to the OH group of the organic polymer and the densified functional group of the organic polymer, thereby forming the atomic layer deposition film.

14. A method of manufacturing laminate comprising steps of:
preparing a base material;
forming an under coat layer on at least a part of a top surface of the base material, having a membranous shape or a film shape and containing an organic polymer having a functional group;
surface-treating at least a part of an exposed surface of the under coat layer, thereby forming an adhesive layer having a functional group having nucleophilicity;
supplying a precursor material on a top surface of the adhesive layer such that a precursor that becomes an atomic layer deposition film is coupled to the functional group of the under coat layer or the functional group having nucleophilicity of the adhesive layer; and
removing, from the precursor material, excess precursor material which is not coupled to the under coat layer and the adhesive layer and saturating a coupling amount of the precursor which is coupled to the functional group of under coat layer or the functional group having nucleophilicity of the adhesive layer, thereby forming the atomic layer deposition film.

15. A method of manufacturing a gas barrier film, wherein
the laminate manufactured by the method of manufacturing the laminate according to claim 13 is formed in a film shape.

16. A method of manufacturing a gas barrier film, wherein
the laminate manufactured by the method of manufacturing the laminate according to claim 14 is formed in a film shape.

Assignees

• Toppan Printing Co Ltd

Inventors

• Koyama Hiroshi
• Sato Jin
• Kano Mitsuru

Classifications

• C23C16/04

  Coating on selected surface areas, e.g. using masks · CPC title

• C23C16/403

  of aluminium, magnesium or beryllium · CPC title

• C23C16/401

  containing silicon · CPC title

• B32B27/308

  comprising acrylic (co)polymers · CPC title

• C23C16/45525 Primary

  Atomic layer deposition [ALD] · CPC title