Multi-layer body and method for the production thereof

Patent metadata

Field	Value
Publication number	US-9956807-B2
Application number	US-201415038874-A
Country	US
Kind code	B2
Filing date	Nov 28, 2014
Priority date	Nov 29, 2013
Publication date	May 1, 2018
Grant date	May 1, 2018

Abstract

The invention relates to a method for producing a multi-layer body, in particular a security element, in which a partial first layer or partial first layer system is produced on a substrate, wherein the partial first layer or partial first layer system is present in a first partial area and not in a second partial area. Subsequently, a partial second layer or partial second layer system is produced, wherein the partial second layer or partial second layer system is present in a third partial area and not in a fourth partial area, and wherein the third partial area overlaps with the first and second partial areas. Finally, the partial first layer or partial first layer system is structured as a mask using the partial second layer or partial second layer system.

First claim

The invention claimed is:

1. A method for producing a multi-layer body comprising the following steps:
a) producing a partial first layer or partial first layer system on a substrate, wherein the partial first layer or partial first layer system is present in a first partial area and not in a second partial area;
b) producing a partial second layer or partial second layer system, wherein the partial second layer or partial second layer system is present in a third partial area and not in a fourth partial area, and wherein the third partial area overlaps with the first and second partial areas; and
c) structuring the partial first layer or partial first layer system using the partial second layer or partial second layer system as a mask.

2. The method according to claim 1 , wherein the structuring of the partial first layer or partial first layer system in step c) takes place by etching.

3. The method according to claim 2 , wherein the partial second layer or partial second layer system is an etch resist, or at least comprises an etch resist.

4. The method according to claim 3 , wherein the etch resist is a lacquer that comprises binders, colored or non-colored pigments and/or special-effect pigments, thin-film systems, cholesteric liquid crystals, dyes and/or metallic or non-metallic nanoparticles.

5. The method according to claim 1 , wherein the structuring of the partial first layer or partial first layer system in step c) takes place by lift-off.

6. The method according to claim 5 , wherein the partial second layer or partial second layer system is a washcoat that is soluble in water, or at least comprises such a washcoat.

7. The method according to claim 6 , wherein the washcoat is a lacquer that comprises binders and fillers.

8. The method according to claim 1 , wherein the structuring of the partial first layer or partial first layer system in step c) takes place by mask exposure.

9. The method according to claim 8 , wherein the partial second layer or partial second layer system is a protective lacquer or at least comprises a protective lacquer.

10. The method according to claim 8 , wherein the partial first layer or partial first layer system is a photoresist or at least comprises a photoresist, wherein the protective lacquer is a washcoat that is soluble in water.

11. The method according to claim 9 , wherein the protective lacquer and/or photoresist is a lacquer that comprises binders, colored or non-colored pigments and/or special-effect pigments, thin-film systems, cholesteric liquid crystals, dyes and/or metallic or non-metallic nanoparticles.

12. The method according to claim 1 , wherein, in steps a) and/or b) the partial first layer or partial first layer system and/or the partial second layer or partial second layer system is first produced over the entire surface or at least in large areas of the surface and is then structured.

13. The method according to claim 12 , wherein the structuring of the partial first layer or partial first layer system and/or of the partial second layer or partial second layer system in steps a) or b) takes place by etching, lift-off or mask exposure.

14. The method according to claim 13 , wherein, during the structuring of the partial second layer or partial second layer system in step b), the structuring of the partial first layer or partial first layer system according to step c) takes place simultaneously.

15. The method according to claim 1 , wherein, in step a) and/or b), the partial first layer or partial first layer system and/or the partial second layer or partial second layer system is produced in structured form.

16. The method according to claim 15 , wherein the partial first layer or partial first layer system and/or the partial second layer or partial second layer system are produced by intaglio printing, flexographic printing, offset printing, screen printing, digital printing, or ink-jet printing.

17. The method according to claim 1 , wherein the partial first layer comprises a reflective layer of a metal.

18. The method according to claim 1 , wherein the partial second layer comprises at least one single-colored lacquer layer.

19. The method according to claim 1 , wherein the partial first layer is applied in the form of at least one motif, pattern, symbol, image, logo or alphanumeric characters, numbers and/or letters.

20. The method according to claim 1 , wherein the partial first layer or partial first layer system and/or the partial second layer or partial second layer system is applied in the form of a one- or two-dimensional line and/or dot grid.

21. The method according to claim 20 , wherein the line and/or dot grid has a grid spacing of less than 300 μm, and of more than 25 μm.

22. The method according to claim 1 , wherein the substrate comprises a carrier layer comprising polyester or PET (polyethylene terephthalate) and/or a release layer.

23. The method according to claim 1 , wherein the substrate comprises a replication layer with a diffractive surface relief or the substrate itself is designed as a replication layer.

24. The method according to claim 23 , wherein the surface relief introduced into the replication layer forms an optically variable element, a hologram, a sinusoidal diffraction grating, an asymmetrical relief structure, a blazed grating, an isotropic or anisotropic matt structure, or a light-diffracting and/or light-refracting and/or light-focusing micro- or nanostructure, a binary or continuous Fresnel lens, a microprism structure or a combination structure thereof.

25. The method according to claim 1 , wherein, in a further step d), a third layer or a third layer system is applied, which is or comprises an HRI layer and/or an adhesive layer.

Assignees

• Leonhard Kurz Stiftung & Co Kg
• Ovd Kinegram Ag

Inventors

• Staub Rene
• Brehm Ludwig
• Kramer Patrick
• Spiess Rouven
• Forster Karin

Classifications

• B42D25/324

  Reliefs · CPC title

• B42D25/29

  Securities; Bank notes · CPC title

• B42D25/43

  by removal of material · CPC title

• B42D25/445 Primary

  using chemical means, e.g. etching · CPC title

• B42D25/378

  Special inks · CPC title