Copper foil composite, formed product and method of producing the same

US9955574B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9955574-B2
Application numberUS-201214369909-A
CountryUS
Kind codeB2
Filing dateJan 13, 2012
Priority dateJan 13, 2012
Publication dateApr 24, 2018
Grant dateApr 24, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A copper foil composite comprising a copper foil and a resin layer laminated thereon, satisfying an equation 1: (f 3 ×t 3 )/(f 2 ×t 2 )=>1 wherein t 2 (mm) is a thickness of the copper foil, f 2 (MPa) is a stress of the copper foil under tensile strain of 4%, t 3 (mm) is a thickness of the resin layer, f 3 (MPa) is a stress of the resin layer under tensile strain of 4%, and an equation 2: 1<=33f 1 /(F×T) wherein f 1 (N/mm) is 180° peeling strength between the copper foil and the resin layer, F(MPa) is strength of the copper foil composite under tensile strain of 30%, and T (mm) is a thickness of the copper foil composite, wherein a Cr oxide layer is formed at an coating amount of 5 to 100 μg/dm 2 . is formed on a surface of the copper foil on which the resin layer is not laminated.

First claim

Opening claim text (preview).

What is claimed is: 1. A copper foil composite comprising a copper foil and a resin layer laminated thereon, satisfying an equation 1: (f 3 ×t 3 )/(f 2 ×t 2 )≥1 wherein t 2 is a thickness of the copper foil measured in mm, f 2 is a stress of the copper foil measured in MPa under tensile strain of 4%, t 3 is a thickness of the resin layer measured in mm, f 3 is a stress of the resin layer measured in MPa under tensile strain of 4% measure and an equation 2: 1≤33f 1 /(F×T) wherein f 1 is 180° peeling strength between the copper foil and the resin layer measured in N/mm, F is strength of the copper foil composite measured in MPa under tensile strain of 30%, and T is a thickness of the copper foil composite measured in mm, wherein a Cr oxide layer is formed at a coating amount of 5 to 100 μg/dm 2 on a surface of the copper foil on which the resin layer is not laminated, and further wherein the 180° peeling strength is measured by conducting a 180° peel test as the surface of the copper foil in a composite test specimen is fixed on a SUS plate and the resin layer is peeled in a direction at an angle of 180° in accordance with JIS-05016. 2. The copper foil composite according to claim 1 , wherein a Ni layer or a Ni alloy layer having a thickness of 0.001 to 5.0 μm is formed between the Cr oxide layer and the copper foil. 3. The copper foil composite according to claim 2 , wherein the thickness of the Ni layer or the Ni alloy layer is 0.001 to 0.10 μm. 4. The copper foil composite according to claim 3 , wherein the equations 1 and 2 are true at the temperature lower than the glass transition temperature of the resin layer. 5. The copper foil composite according to claim 3 , wherein a ratio I/L of fracture strain I of the copper foil composite to fracture strain L of the resin layer alone is 0.7 to 1. 6. A formed product obtained by working the copper foil composite according to claim 3 . 7. A method of producing a formed product comprising working the copper foil composite according to claim 3 . 8. The copper foil composite according to claim 2 , wherein the equations 1 and 2 are true at the temperature lower than the glass transition temperature of the resin layer. 9. The copper foil composite according to claim 2 , wherein a ratio I/L of fracture strain I of the copper foil composite to fracture strain L of the resin layer alone is 0.7 to 1. 10. A formed product obtained by working the copper foil composite according to claim 2 . 11. A method of producing a formed product comprising working the copper foil composite according to claim 2 . 12. The copper foil composite according to claim 1 , wherein the equations 1 and 2 are true at the temperature lower than the glass transition temperature of the resin layer. 13. The copper foil composite according to claim 12 , wherein a ratio I/L of fracture strain I of the copper foil composite to fracture strain L of the resin layer alone is 0.7 to 1. 14. A formed product obtained by working the copper foil composite according to claim 12 . 15. A method of producing a formed product comprising working the copper foil composite according to claim 12 . 16. The copper foil composite according to claim 1 , wherein a ratio I/L of fracture strain I of the copper foil composite to fracture strain L of the resin layer alone is 0.7 to 1. 17. A formed product obtained by working the copper foil composite according to claim 16 . 18. A method of producing a formed product comprising working the copper foil composite according to claim 16 . 19. A formed product obtained by working the copper foil composite according to claim 1 . 20. A method of producing a formed product comprising working the copper foil composite according to claim 1 .

Assignees

Inventors

Classifications

  • PCBs, i.e. printed circuit boards · CPC title

  • Use of materials for the {conductive, e.g. } metallic pattern · CPC title

  • Resin coated copper [RCC] · CPC title

  • of synthetic resin · CPC title

  • Weather resistant · CPC title

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What does patent US9955574B2 cover?
A copper foil composite comprising a copper foil and a resin layer laminated thereon, satisfying an equation 1: (f 3 ×t 3 )/(f 2 ×t 2 )=>1 wherein t 2 (mm) is a thickness of the copper foil, f 2 (MPa) is a stress of the copper foil under tensile strain of 4%, t 3 (mm) is a thickness of the resin layer, f 3 (MPa) is a stress of the resin layer under tensile strain of 4%, and an equation 2: 1…
Who is the assignee on this patent?
Tanaka Koichiro, Kammuri Kazuki, Jx Nippon Mining & Metals Corp
What technology area does this patent fall under?
Primary CPC classification H05K1/0393. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Apr 24 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).