Gas laser

US9948055B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9948055-B2
Application numberUS-201715493106-A
CountryUS
Kind codeB2
Filing dateApr 20, 2017
Priority dateNov 6, 2015
Publication dateApr 17, 2018
Grant dateApr 17, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A gas laser, including: a semiconductor laser, an optical beam-shaping system, a pair of electrodes, a discharge tube, a rear mirror, and an output mirror. The pair of electrodes includes two electrodes. The electrodes are symmetrically disposed at an outer layer of the discharge tube in parallel. The electrodes are connected to a radio-frequency power supply via a matching network, and the electrodes operate to modify working gas in the discharge tube through radio-frequency discharge. The rear mirror and the output mirror are disposed at two end surfaces of the discharge tube, respectively. The rear mirror, taken together with the output mirror and the discharge tube, form a resonant cavity. The output mirror is configured to output a laser beam.

First claim

Opening claim text (preview).

The invention claimed is: 1. A gas laser, comprising: a semiconductor laser; an optical beam-shaping system; a pair of electrodes comprising two electrodes; a discharge tube; a rear mirror; and an output mirror; wherein: the two electrodes are symmetrically disposed in parallel at an outer layer of the discharge tube; the two electrodes are connected to a radio-frequency power supply via a matching network, and are configured to perform radio-frequency discharge on working gas in the discharge tube; the rear mirror and the output mirror are disposed at two end surfaces of the discharge tube, respectively; the rear mirror, the output mirror, and the discharge tube form a resonant cavity; the output mirror is configured to output a laser beam; an outer wall of the discharge tube in the vicinity of the optical beam-shaping system is coated with a transmission film; the transmission film is conformity to pump light in size and shape; the rest of the outer wall is coated with a reflection film, and an inner wall of the discharge tube is uncoated, or coated with another transmission film; the discharge tube is filled with the working gas; and the working gas is rare gas, or a mixture of rare gas and assistant gas; the semiconductor laser is configured to produce pump light the optical beam-shaping system is configured to concentrate the pump light to form a narrow strip facula; the facula is allowed to pass through the transmission film on the outer wall of the discharge tube and is injected in the discharge tube; and a central wavelength of the pump light matches with an absorption line of gas particles produced by the radio-frequency discharge of the working gas in the discharge tube; and the working gas in the discharge tube is a mixture of argon and helium, and a pressure thereof is between 0.5 and 2.0 atmosphere; a volume ratio of the argon to the helium is between 1:50 to 1:4. 2. The laser of claim 1 , wherein the pair of electrodes is aluminum or copper; and contact surfaces of the pair of electrodes and the discharge tube are flat surfaces, or curved surfaces which match with the outer wall of the discharge tube. 3. The laser of claim 1 , wherein a water-cooling channel is disposed in the pair of electrodes. 4. The laser of claim 1 , wherein a shielding chamber is disposed at an outer side of the pair of electrodes; the shielding chamber is made of metal materials; the shielding chamber is filled with gas with ionization potential, or the shielding chamber is vacuumed; and the shielding chamber is provided with a shielding chamber window at a position relative to the semiconductor laser, and the shielding chamber window allows the pump light to transmit. 5. The laser of claim 1 , wherein a gas inlet and a gas outlet are disposed in the discharge tube; and an external pipeline between the gas inlet and the gas outlet is connected to a fan and a heat exchanger in series. 6. The laser of claim 4 , wherein a gas inlet and a gas outlet are disposed in the discharge tube; and an external pipeline between the gas inlet and the gas outlet is connected to a fan and a heat exchanger in series. 7. The laser of claim 4 , wherein a plurality of the discharge tubes is connected in series in the shielding chamber; and pairs of the electrodes on the outer wall of adjacent discharge tubes are mutually perpendicular. 8. The laser of claim 1 , wherein the discharge tube is cylindrical. 9. A gas laser, comprising: a semiconductor laser; an optical beam-shaping system; a pair of electrodes comprising two electrodes; a discharge tube; a rear mirror; and an output mirror; wherein: the two electrodes are symmetrically disposed in parallel at an outer layer of the discharge tube; the two electrodes are connected to a radio-frequency power supply via a matching network, and are configured to perform radio-frequency discharge on working gas in the discharge tube; the rear mirror and the output mirror are disposed at two end surfaces of the discharge tube, respectively; the rear mirror, the output mirror, and the discharge tube form a resonant cavity; the output mirror is configured to output a laser beam; an outer wall of the discharge tube in the vicinity of the optical beam-shaping system is coated with a transmission film; the transmission film is conformity to pump light in size and shape; the rest of the outer wall is coated with a reflection film, and an inner wall of the discharge tube is uncoated, or coated with another transmission film; the discharge tube is filled with the working gas; and the working gas is rare gas, or a mixture of rare gas and assistant gas; the semiconductor laser is configured to produce pump light the optical beam-shaping system is configured to concentrate the pump light to form a narrow strip facula; the facula is allowed to pass through the transmission film on the outer wall of the discharge tube and is injected in the discharge tube; and a central wavelength of the pump light matches with an absorption line of gas particles produced by the radio-frequency discharge of the working gas in the discharge tube; and a water-cooling channel is disposed in the pair of electrodes. 10. A gas laser, comprising: a semiconductor laser; an optical beam-shaping system; a pair of electrodes comprising two electrodes; a discharge tube; a rear mirror; and an output mirror; wherein the two electrodes are symmetrically disposed in parallel at an outer layer of the discharge tube; the two electrodes are connected to a radio-frequency power supply via a matching network, and are configured to perform radio-frequency discharge on working gas in the discharge tube; the rear mirror and the output mirror are disposed at two end surfaces of the discharge tube, respectively; the rear mirror, the output mirror, and the discharge tube form a resonant cavity; the output mirror is configured to output a laser beam; an outer wall of the discharge tube in the vicinity of the optical beam-shaping system is coated with a transmission film; the transmission film is conformity to pump light in size and shape; the rest of the outer wall is coated with a reflection film, and an inner wall of the discharge tube is uncoated, or coated with another transmission film; the discharge tube is filled with the working gas; and the working gas is rare gas, or a mixture of rare gas and assistant gas; the semiconductor laser is configured to produce pump light the optical beam-shaping system is configured to concentrate the pump light to form a narrow strip facula; the facula is allowed to pass through the transmission film on the outer wall of the discharge tube and is injected in the discharge tube; and a central wavelength of the pump light matches with an absorption line of gas particles produced by the radio-frequency discharge of the working gas in the discharge tube; and a shielding chamber is disposed at an outer side of the pair of electrodes; the shielding chamber is made of metal materials; the shielding chamber is filled with gas with ionization potential, or the shielding chamber is vacuumed; and the shielding chamber is provided with a shielding chamber window at a position relative to the semiconductor laser, and the shielding chamber window allows the pump light to transmit. 11. The laser of claim 10 , wherein a gas inlet and a gas outlet are disposed in the discharge tube; and an external pipeline between the gas inlet and the gas outlet is connected to a fan and a heat exchanger in series. 12. The laser of claim 10 , wherein a plurality of the discharge tubes is connected in series in the shielding chamber; and pairs of the electrodes

Assignees

Inventors

Classifications

  • Liquid cooling, e.g. by water · CPC title

  • Conductive cooling, e.g. by heat sinks or thermo-electric elements · CPC title

  • Optical devices within, or forming part of, the tube, e.g. windows, mirrors (reflectors having variable properties or positions for initial adjustment of the resonator H01S3/086) · CPC title

  • the pumping beam being parallel to the lasing mode of the pumped medium, e.g. end-pumping · CPC title

  • Noble gas ions, e.g. Ar+>, Kr+> · CPC title

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What does patent US9948055B2 cover?
A gas laser, including: a semiconductor laser, an optical beam-shaping system, a pair of electrodes, a discharge tube, a rear mirror, and an output mirror. The pair of electrodes includes two electrodes. The electrodes are symmetrically disposed at an outer layer of the discharge tube in parallel. The electrodes are connected to a radio-frequency power supply via a matching network, and the ele…
Who is the assignee on this patent?
Univ Huazhong Science Tech
What technology area does this patent fall under?
Primary CPC classification H01S3/0323. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Apr 17 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).