Ag alloy film for reflecting electrode or wiring electrode, reflecting electrode or wiring electrode, and Ag alloy sputtering target

US9947429B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9947429-B2
Application numberUS-201414889334-A
CountryUS
Kind codeB2
Filing dateJun 11, 2014
Priority dateJun 26, 2013
Publication dateApr 17, 2018
Grant dateApr 17, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An Ag alloy film used for a reflecting electrode or an interconnection electrode, the Ag alloy film exhibiting low electrical resistivity and high reflectivity and having exceptional oxidation resistance under cleaning treatments such as an O 2 plasma treatment or UV irradiation, wherein the Ag alloy film contains either In in an amount of larger than 2.0 atomic % to 2.7 atomic % or smaller; or Zn in an amount of larger than 2.0 atomic % to 3.5 atomic % or smaller; or both. The Ag alloy film may further contain Bi in an amount of 0.01 to 1.0 atomic %.

First claim

Opening claim text (preview).

The invention claimed is: 1. A reflecting electrode or an interconnection electrode, comprising: an Ag alloy film, and a transparent conductive film of 5 nm or larger and smaller than 25 nm in thickness formed directly on, or directly on and directly beneath, the Ag alloy film, wherein the Ag alloy film consists of In in an amount of larger than 2.0 atomic % and smaller than or equal to 2.7 atomic %, Bi in an amount of larger than or equal to 0.01 atomic % and smaller than or equal to 1.0 atomic %, and the balance being Ag and inevitable impurities. 2. The reflecting electrode or the interconnection electrode according to claim 1 , wherein the transparent conductive film is either ITO or IZO. 3. A display device, comprising: the reflecting electrode according to claim 1 . 4. A display device, comprising: the reflecting electrode according to claim 2 . 5. A touch panel, comprising: the interconnection electrode according to claim 1 . 6. A touch panel, comprising: the interconnection electrode according to claim 2 . 7. A lighting device, comprising: the reflecting electrode according to claim 1 . 8. A lighting device, comprising: the reflecting electrode according to claim 2 .

Assignees

Inventors

Classifications

  • Noble-metal alloys · CPC title

  • Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy · CPC title

  • Electricity · mapped topic

  • Plural materials · CPC title

  • by cathodic sputtering · CPC title

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What does patent US9947429B2 cover?
An Ag alloy film used for a reflecting electrode or an interconnection electrode, the Ag alloy film exhibiting low electrical resistivity and high reflectivity and having exceptional oxidation resistance under cleaning treatments such as an O 2 plasma treatment or UV irradiation, wherein the Ag alloy film contains either In in an amount of larger than 2.0 atomic % to 2.7 atomic % or smaller; o…
Who is the assignee on this patent?
Kobe Steel Ltd
What technology area does this patent fall under?
Primary CPC classification H01B1/02. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Apr 17 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).