Receptacle device, device and method for handling substrate stacks
US-9666470-B2 · May 30, 2017 · US
US9941149B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9941149-B2 |
| Application number | US-201715496042-A |
| Country | US |
| Kind code | B2 |
| Filing date | Apr 25, 2017 |
| Priority date | Mar 27, 2013 |
| Publication date | Apr 10, 2018 |
| Grant date | Apr 10, 2018 |
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The invention relates to a retaining system for handling substrate stacks, including a retaining surface for retaining a first substrate, and one or more recesses provided relative to the retaining surface, for retaining first magnetic bodies for securing the first substrate relative to a second substrate that is aligned with the first substrate. Second magnetic bodies are applied on a holding side of the second substrate.
Opening claim text (preview).
Having described the invention, the following is claimed: 1. A retaining system for handling a first substrate that is to be bonded with a second substrate, the system comprising: a retaining surface configured to retain the first substrate; and one or more recessed regions that are recessed relative to the retaining surface, wherein the recessed regions are configured to retain a magnetically acting attachment means, wherein the magnetically acting attachment means is configured to secure the first substrate relative to the second substrate, wherein the second substrate is aligned with the first substrate, wherein each of the recessed regions is defined by a shelf recessed from the retaining surface and arranged on a periphery of the retaining surface, wherein the shelf is defined by a seating section having a first area and a second area, wherein the first area is configured to seat the magnetically acting attachment means, and wherein the second area is directed towards a center of the retaining surface for installation of the magnetically acting attachment means. 2. The retaining system according to claim 1 , wherein the seating section is inclined relative to the retaining surface by an angle less than 60°. 3. The retaining system according to claim 1 , wherein the recessed regions are uniformly distributed on the periphery of the retaining surface. 4. A substrate stack handling device for handling a substrate stack, the substrate stack having a first substrate and a second substrate aligned relative to the first substrate, the device comprising: magnetically acting attachment means configured to secure the first substrate relative to the second substrate in an aligned immobilized position, wherein the magnetically acting attachment means has two or more pairs of magnetic elements, wherein each pair of magnetic elements is formed from a first magnetically active magnetic body and a second magnetically active magnetic body that is magnetically attracted by the first magnetically active magnetic body, and wherein at least one of the first and second magnetic bodies is designed in a shape of a sphere. 5. The substrate stack handling device according to claim 4 , wherein at least one of the first and second magnetic bodies is attached to the substrate stack in the aligned immobilized position by a magnetic force produced by the pair of magnetic elements.
characterised by a plurality of separate clamping members, e.g. clamping fingers · CPC title
characterised by edge clamping, e.g. clamping ring · CPC title
Apparatus for mechanical treatment or grinding or cutting · CPC title
characterised by the mechanical construction of the susceptor, stage or support · CPC title
with magnetic holding means · CPC title
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