Method for manufacturing patterned object, patterned object, and light irradiation apparatus

Patent metadata

Field	Value
Publication number	US-9939727-B2
Application number	US-201515306967-A
Country	US
Kind code	B2
Filing date	Oct 6, 2015
Priority date	Oct 8, 2014
Publication date	Apr 10, 2018
Grant date	Apr 10, 2018

Abstract

Disclosed herein is a method for manufacturing a patterned object and a light irradiation apparatus that make it possible to form a pattern that accurately follows a mask pattern with higher accuracy in a patterning process of irradiating a pattern forming substrate with vacuum ultra violet light. The light irradiation apparatus includes a mask stage arranged apart from the pattern forming substrate and configured to hold a mask on which a prescribed pattern is formed, and a vacuum ultra violet light source unit configured to irradiate the pattern forming substrate with vacuum ultra violet light through the mask. A space between the mask and the pattern forming substrate is set to be an atmosphere containing oxygen. The vacuum ultra violet light source unit irradiates light, as the vacuum ultra violet light, having a continuous spectrum in a range where a wavelength ranges from 180 nm to 200 nm.

First claim

What is claimed is:

1. A method for manufacturing a patterned object, comprising:
irradiating a pattern forming substrate with light containing vacuum ultra violet light in an atmosphere containing oxygen via a mask on which a prescribed pattern is formed; and
manufacturing a patterned object in which a pattern is formed including a modified portion and non-modified portion on a light irradiation surface of the pattern forming substrate,
the vacuum ultra violet light being light having a continuous spectrum in a range where a wavelength ranges from 180 nm to 200 nm, and
the vacuum ultra violet light has one or more peaks in the continuous spectrum,
wherein an illuminance of the vacuum ultra violet light in the range where the wavelength ranges from 180 nm to 200 nm is equal to or greater than an illuminance in a range where the wavelength ranges from 160 nm to 180 nm.

2. The method for manufacturing a patterned object according to claim 1 , wherein the pattern forming substrate is a substrate composed of an aliphatic compound polymer.

3. The method for manufacturing a patterned object according to claim 2 , wherein the pattern forming substrate is a substrate composed of cyclic olefin polymer (COP) or a cyclic olefin copolymer (COC) that is a copolymer of the COP.

4. The method for manufacturing a patterned object according to claim 1 , wherein the pattern forming substrate is a substrate in which a self-assembled monolayers (SAM) is formed on a surface of the pattern forming substrate, and
the patterned object is manufactured by irradiating the SAM on this pattern forming substrate with the vacuum ultra violet light and removing a portion of the SAM in a patterned shape.

5. The method for manufacturing a patterned object according to claim 1 , wherein an inorganic layer containing carbon is formed on the pattern forming substrate.

6. The method for manufacturing a patterned object according to claim 1 , wherein the pattern forming substrate is a substrate having a layer made of an organic-inorganic hybrid material provided on a surface of the substrate.

7. A patterned object manufactured by the method for manufacturing a patterned object according to claim 1 .

8. A light irradiation apparatus, comprising:
a mask stage arranged apart from the pattern forming substrate and configured to hold a mask on which a prescribed pattern is formed;
a vacuum ultra violet light source unit configured to irradiate the pattern forming substrate with vacuum ultra violet light via the mask; and
an atmosphere controlling unit configured to set a space between the mask and the pattern forming substrate to be an atmosphere containing oxygen,
the vacuum ultra violet light source unit irradiating light, as the vacuum ultra violet light, having a continuous spectrum in a range where a wavelength ranges from 180 nm to 200 nm and having one or more peaks in the continuous spectrum,
wherein an illuminance of the vacuum ultra violet light in the range where the wavelength ranges from 180 nm to 200 nm is equal to or greater than an illuminance in a range where the wavelength ranges from 160 nm to 180 nm.

Assignees

• Ushio Electric Inc

Inventors

• Yamada Go

Classifications

• H10P76/2041

  Photolithographic processes · CPC title

• G03F7/2002 Primary

  with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image · CPC title

• C07F9/3808

  Acyclic saturated acids which can have further substituents on alkyl · CPC title

• G03F7/2039 Primary

  X-ray radiation · CPC title

• G03F7/165

  Monolayers, e.g. Langmuir-Blodgett · CPC title