Methods for providing spaced lithography features on a substrate by self-assembly of block copolymers
US-2015380299-A1 · Dec 31, 2015 · US
Physics
Physics · Cooperative Patent Classification (CPC)
Computing, optics, measurement, and control technologies.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | G03F7/2002 |
| Official title | — |
| Display label | Physics (mapped technology topic) |
| Total patents | 1,184 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is declining.
| Year | Patents |
|---|---|
| 2015 | 125 |
| 2016 | 116 |
| 2017 | 122 |
| 2018 | 142 |
| 2019 | 185 |
| 2020 | 140 |
| 2021 | 115 |
| 2022 | 82 |
| 2023 | 63 |
| 2024 | 42 |
| 2025 | 49 |
| 2026 | 3 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Monomer, hardmask composition comprising monomer, and pattern forming method using hardmask composition
US-2015362837-A1 · Dec 17, 2015 · US
Reflective original, exposure method, and device manufacturing method
US-9213231-B2 · Dec 15, 2015 · US
Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and pattern forming method
US-2015355541-A1 · Dec 10, 2015 · US
Plate surface protecting liquid composition for lithographic printing plate using same
US-9195141-B2 · Nov 24, 2015 · US
Resist composition and method of forming resist pattern
US-9188863-B2 · Nov 17, 2015 · US
Substrates And Methods Of Forming A Pattern On A Substrate
US-2015321447-A1 · Nov 12, 2015 · US
Mask and method of fabricating spacers
US-2015316797-A1 · Nov 5, 2015 · US
Phase shift mask and method of forming patterns using the same
US-2015293438-A1 · Oct 15, 2015 · US
Apparatuses and methods utilizing etch stop layers
US-2015266233-A1 · Sep 24, 2015 · US
Positive resist composition and patterning process
US-2015268555-A1 · Sep 24, 2015 · US
Chemically-amplified negative resist composition and resist patterning process using the same
US-2015268556-A1 · Sep 24, 2015 · US
Illumination and displacement device for a projection exposure apparatus
US-9134613-B2 · Sep 15, 2015 · US
System and method for return beam metrology with optical switch
US-9127981-B2 · Sep 8, 2015 · US
Method of using an euv mask during euv photolithography processes
US-2015248059-A1 · Sep 3, 2015 · US
Conductive pattern fabrication method
US-2015248058-A1 · Sep 3, 2015 · US
Method of making thermal insulation film and thermal insulation film product
US-2015248060-A1 · Sep 3, 2015 · US
Methods and Techniques to use with Photosensitized Chemically Amplified Resist Chemicals and Processes
US-2015241783-A1 · Aug 27, 2015 · US
Method for Lithography Patterning
US-2015241776-A1 · Aug 27, 2015 · US
Mitigation of euv shot noise replicating into acid shot noise in photo-sensitized chemically-amplified resist (ps-car)
US-2015241781-A1 · Aug 27, 2015 · US
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Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC G03F7/2002?
- CPC G03F7/2002 is the Cooperative Patent Classification code for “Physics.”
- How many patents are filed under CPC G03F7/2002 (Physics)?
- Our database includes 1,184 publications tagged with this CPC code.
- Is patent activity under CPC G03F7/2002 growing?
- Publication counts under this code: 42 in 2024 vs 49 in 2025 (latest complete years).