Depositing method of deposition material using laser beams as mask

US9935268B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9935268-B2
Application numberUS-201615270762-A
CountryUS
Kind codeB2
Filing dateSep 20, 2016
Priority dateDec 21, 2012
Publication dateApr 3, 2018
Grant dateApr 3, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A deposition apparatus includes a vacuum chamber, a substrate disposed in the vacuum chamber, a deposition source disposed in the vacuum chamber and facing the substrate to provide a deposition material onto the substrate, a laser oscillator generating a first laser beam, and an optical unit connected to a first side of the vacuum chamber and splitting the first laser beam to generate a plurality of mask laser beams. The mask laser beams are irradiated into the vacuum chamber to be disposed between the substrate and the deposition source. The deposition material making contact with the mask laser beams is oxidized, and the deposition material passing through the mask laser beams is deposited on the substrate.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of depositing a deposition material onto a substrate, comprising: disposing the substrate in a vacuum chamber, the substrate including a plurality of opening portions arranged in columns; generating a first laser beam using a laser oscillator; splitting the first laser beam using an optical unit connected to the vacuum chamber to generate a plurality of mask laser beams; providing the deposition material from a deposition source to the substrate; and irradiating, from a first side of the vacuum chamber, the plurality of mask laser beams into the vacuum chamber onto the deposition material, wherein the plurality of mask laser beams are spaced apart from one another, wherein a space between pairs of mask laser beams corresponds with one of the plurality of opening portions on the substrate, wherein the deposition material makes contact with the mask laser beams and is oxidized such that the oxidized deposition material is not deposited on the substrate, and the deposition material passing through the space between a pair of the mask laser beams is deposited on the substrate, wherein the mask laser beams are used as a mask for performing the depositing of the deposition material. 2. The method of claim 1 , wherein the mask laser beams are irradiated horizontally with respect to a surface of the substrate having the opening portions and are spaced apart from the substrate. 3. The method of claim 1 , wherein each pair of the mask laser beams is spaced apart from the substrate by a distance of about 0.1 mm to about 1.0 mm. 4. The method of claim 1 , wherein each pair of the mask laser beams is spaced apart from each other at a regular interval. 5. The method of claim 1 , wherein the optical unit comprises: a beam expander configured to expand the first laser beam; a beam splitter configured to split the expanded first laser beam to generate a plurality of second laser beams; and a beam controller configured to control a width of each second laser beam of the second laser beams and a distance between said each beam of the second laser beams to generate the mask laser beams. 6. The method of claim 5 , wherein the beam expander comprises: a concave lens configured to expand the first laser beam; and a convex lens configured to provide the expanded first laser beam to the beam splitter. 7. The method of claim 5 , wherein the beam splitter comprises a plurality of first lens units configured to split the expanded first laser beam and generate the second laser beams. 8. The method of claim 7 , wherein the beam controller comprises a plurality of collimating lens units respectively corresponding to the first lens units, and each of the collimating lens units is configured to control the width of said each second laser beam provided from a first lens unit of the first lens units and the distance between said each beam of the second laser beams to generate the mask laser beams. 9. The method of claim 1 , wherein the deposition source comprises: a crucible configured to heat the deposition material filled therein to evaporate the deposition material; and a plurality of nozzles configured to spray the evaporated deposition material onto the substrate. 10. The method of claim 1 , further comprising an optical cable to connect the laser oscillator to the optical unit and to provide the first laser beam to the optical unit. 11. The method of claim 1 , further comprising a light receiver disposed at a second side of the vacuum chamber, which is opposite to the first side, to receive the mask laser beams. 12. The method of claim 1 , wherein providing the deposition material comprises: heating the deposition material to evaporate the deposition material; and spraying the evaporated deposition material onto the substrate.

Assignees

Inventors

Classifications

  • Vacuum evaporation · CPC title

  • using irradiation by energy or particles · CPC title

  • Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates · CPC title

  • Coating on selected surface areas, e.g. using masks · CPC title

  • by exposure to radiation (B05D3/02 takes precedence {; plasma treatment B05D3/141}) · CPC title

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What does patent US9935268B2 cover?
A deposition apparatus includes a vacuum chamber, a substrate disposed in the vacuum chamber, a deposition source disposed in the vacuum chamber and facing the substrate to provide a deposition material onto the substrate, a laser oscillator generating a first laser beam, and an optical unit connected to a first side of the vacuum chamber and splitting the first laser beam to generate a plurali…
Who is the assignee on this patent?
Samsung Display Co Ltd
What technology area does this patent fall under?
Primary CPC classification C23C14/042. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Apr 03 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).