P-doped conjugated polymer electrolyte and an organic electronic device using the same
US-9214255-B2 · Dec 15, 2015 · US
US9929343B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9929343-B2 |
| Application number | US-201414894187-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 30, 2014 |
| Priority date | May 30, 2013 |
| Publication date | Mar 27, 2018 |
| Grant date | Mar 27, 2018 |
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The present invention relates to the doping of organic semiconductors and processes for producing layers of p-doped organic semiconductors. Disclosed is a process for p-doping organic semiconductors comprising treating the organic semiconductor with an oxidized salt of the organic semiconductor. A process for producing a layer of a p-doped organic semiconductor comprising producing a p-doped organic semiconductor by treating the organic semiconductor with an oxidized salt of the organic semiconductor; disposing a composition comprising a solvent and the p-doped organic semiconductor on a substrate; and removing the solvent is also described. Also disclosed is a process for producing a layer of a p-doped organic semiconductor comprising: disposing a composition comprising a solvent, the organic semiconductor and a protic ionic liquid on a substrate; and removing the solvent. A process for producing a semiconductor device comprising a process for doping an organic semiconductor according to the invention is also described. Finally, a high purity p-dopant composition is described.
Opening claim text (preview).
The invention claimed is: 1. A process for producing a p-doped organic semiconductor comprising treating an organic semiconductor with a protic ionic liquid, wherein the organic semiconductor comprises a compound of formula (Vb) and wherein each R 1 is the same or different and is a group selected from hydrogen, C 1-8 alkyl, C 2-8 alkenyl, C 2-8 alkynyl, C 1-8 alkoxy, hydroxyl, mono-C 1-8 alkylamino, di-C 1-8 alkylamino, amino, halide, cyano, nitro, and thiol; and wherein the protic ionic liquid is not 1-ethyl-3-methylimidazolium-TFSI or 1-butyl-3-methylimidazolium-TFSI. 2. The process according to claim 1 wherein the protic ionic liquid is a compound of formula PA wherein P is a cation selected from H + , H 3 O + , an ammonium cation, an imidazolium cation, a pyridinium cation, a pyrrolidonium cation or an indolium cation; and wherein A is ClO 4 − , NO 3 − or an anion of formula (i), (ii), (iii) or (iv) wherein each X is the same or different and is an electron withdrawing group, optionally wherein X is CF 3 or CF 2 CF 3 , or wherein A is bis(trifluoromethanesulfonyl)imide, bis(pentafluoroethanesulfonyl)imide, bis(perfluoropropanesulfonyl)imide, trifluoroacetate, or trifluoromethanesulfonate. 3. The process according to claim 2 wherein P is a cation selected from H + , H 3 O + , NR 4 + , NHR 3 + , NH 2 R 2 + , NH 3 R + or NH 4 + , wherein R is independently selected from C 1-8 alkyl, C 2-8 alkenyl or aryl; and wherein R a , R b , and R c are independently selected from H, C 1-8 -alkyl, C 2-8 -alkenyl or aryl, and at least one of R a , R b , and R c is H. 4. The process according to claim 1 wherein the protic ionic liquid is selected from H-TFSI, 1-alkyl-3-methylimidazolium-TFSI, H-BETI, 1-alkyl-3-methylimidazolium-BETI, 1-methyl-3-methylimidazolium-TFSI, and 1-propyl-3-methylimidazolium-TFSI. 5. The process according to claim 1 wherein the amount of the protic ionic liquid is from 0.01 to 50 mol % relative to the amount of the organic semiconductor. 6. A process according to claim 1 wherein the amount of the protic ionic liquid is from 5 to 30 mol % relative to the amount of the organic semiconductor. 7. A process for producing a layer of a p-doped organic semiconductor comprising disposing on a substrate an organic semiconductor and a protic ionic liquid, wherein the organic semiconductor comprises a compound of formula (Vb) and wherein each R 1 is the same or different and is a group selected from hydrogen, C 1-8 alkyl, C 2-8 alkenyl, C 2-8 alkynyl, C 1-8 alkoxy, hydroxyl, mono-C 1-8 alkylamino, di-C 1-8 alkylamino, amino, halide, cyano, nitro, and thiol; and wherein the protic ionic liquid is not 1-ethyl-3-methylimidazolium-TFSI or 1-butyl-3-methylimidazolium-TFSI. 8. The process according to claim 7 wherein the process comprises (a) disposing on a substrate a solvent, an organic semiconductor and a protic ionic liquid; and (b) removing the solvent. 9. The process according to claim 8 wherein the process comprises (a) disposing on a substrate a composition comprising a solvent, an organic semiconductor and a protic ionic liquid; and (b) removing the solvent. 10. The process according to claim 7 wherein the organic semiconductor comprises 2,2′,7,7′-tetrakis(N,N-di-p-methoxyphenyl-amine)-9,9′-Spirobifluorene (Spiro-OMeTAD). 11. The process according to claim 7 wherein the protic ionic liquid is selected from H-TFSI, 1-alkyl-3-methylimidazolium-TFSI, H-BETI, 1-alkyl-3-methylimidazolium-BETI, 1-methyl-3-methylimidazolium-TFSI, and 1-propyl-3-methylimidazolium-TFSI 12. The process according to claim 9 wherein the process further comprises producing the composition comprising the solvent, the organic semiconductor and the protic ionic liquid by treating a composition comprising the organic semiconductor and a first solvent with a composition comprising the protic ionic liquid and a second solvent. 13. The process according to claim 12 wherein the first solvent is chlorobenzene and the second solvent is acetonitrile. 14. The process according to claim 9 wherein the composition disposed on the substrate further comprises LiTFSI and/or tert-butyl pyridine. 15. The process according to claim 14 wherein the composition comprises from 1 to 40 mol % LiTFSI and from 50 to 150 mol % tert-butyl pyridine relative to the amount of the organic semiconductor. 16. The process according to claim 8 wherein the solvent comprises acetonitrile and/or chlorobenzene. 17. The process according to claim 7 wherein the substrate comprises an electrode material or a semiconductor material or a mesoporous layer of a semiconductor material or a mesoporous layer of a dielectric material. 18. The layer of a p-doped organic semiconductor produced according to the process of claim 7 . 19. A layer of a p-doped organic semiconductor, wherein the layer comprises an organic semiconductor and a protic ionic liquid, and the organic semiconductor comprises a compound of formula (Vb) and wherein each R 1 is the same or different and is a group selected from hydrogen, C 1-8 alkyl, C 2-8 alkenyl, C 2-8 alkynyl, C 1-8 alkoxy, hydroxyl, mono-C 1-8 alkylamino, di-C 1-8 alkylamino, amino, halide, cyano, nitro, and thiol; and wherein the protic ionic liquid is not 1-ethyl-3-methylimidazolium-TFSI or 1-butyl-3-methylimidazolium-TFSI. 20. The layer according to claim 19 wherein the organic semiconductor comprises 2,2′,7,7′-tetrakis(N,N-di-p-methoxyphenyl-amine)-9,9′-Spirobifluorene (Spiro-OMeTAD) and/or wherein the protic ionic liquid is selected from H-TFSI, 1-alkyl-3-methylimidazolium-TFSI, H-BETI, and 1-alkyl-3-methylimidazolium-BETI, 1-methyl-3-methylimidazolium-TFSI, and 1-propyl-3-methylimidazolium-TFSI 21. A process for producing a semiconductor device comprising a step of producing a p-doped organic semiconductor by a process comprising treating an organic semiconductor with a protic ionic liquid; or a step of producing a layer of a p-doped organic semiconductor by a process comprising disposing on a substrate an organic semiconductor and a protic ionic liquid, wherein the organic semiconductor comprises a compound of formula (Vb) and wherein each R 1 is the same or different and is a group selected from hydrogen, C 1-8 alkyl, C 2-8 alkenyl, C 2-8 alkynyl, C 1-8 alkoxy, hydroxyl, mono-C 1-8 alkylamino, di-C 1-8 alkylamino, amino, halide, cyano, nitro, and thiol; and wherein the protic ionic liquid is not 1-ethyl-3-methylimidazolium-TFSI or 1-butyl-3-methylimidazolium-TFSI. 22. The process according to claim 21 wherein the process further
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