Method and system for forming absorber layer on metal coated glass for photovoltaic devices

US9929304B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9929304-B2
Application numberUS-201514685667-A
CountryUS
Kind codeB2
Filing dateApr 14, 2015
Priority dateJan 4, 2013
Publication dateMar 27, 2018
Grant dateMar 27, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An apparatus for forming a solar cell includes a housing defining a vacuum chamber, a rotatable substrate support, at least one inner heater and at least one outer heater. The substrate support is inside the vacuum chamber configured to hold a substrate. The at least one inner heater is between a center of the vacuum chamber and the substrate support, and is configured to heat a back surface of a substrate on the substrate support. The at least one outer heater is between an outer surface of the vacuum chamber and the substrate support, and is configured to heat a front surface of a substrate on the substrate support.

First claim

Opening claim text (preview).

What is claimed is: 1. A method for forming a solar cell, comprising: securing a substrate on a rotatable substrate support inside a vacuum chamber, wherein the substrate has a front surface and a back surface, the front surface is disposed facing an interior surface of the vacuum chamber, and the rotatable substrate support defines at least one opening; rotating the substrate support; heating the substrate simultaneously using at least one inner heater and at least one outer heater, the inner heater facing a back surface of the substrate, and the at least one outer heater heating a front surface of the substrate during rotation, and heating the substrate using one or more additional heaters in the rotatable substrate support, wherein the one or more additional heaters rotate with the substrate support. 2. The method of claim 1 , wherein the heating the substrate simultaneously using the at least one inner heater and the at least one outer heater is performed according to a predetermined temperature profile for minimizing temperature difference between the substrate and a plurality of posts or a frame in the rotatable substrate support. 3. The method of claim 1 , wherein the one or more additional heaters are lamp heaters configured to emit infra-red radiation, resistive heaters, or combinations thereof. 4. The method of claim 1 , further comprising: forming an absorber layer over the front surface of the substrate, including: depositing a respective first ingredient for an absorber layer over the front surface of the substrate from at least one sputtering source; and depositing a second ingredient of the absorber layer over the front surface of the substrate from at least one evaporation source disposed in the vacuum chamber. 5. The method of claim 4 , wherein at least one isolation pump is disposed between each of the at least one sputtering source and an adjacent one of the at least one the evaporation source, and is used to prevent materials from the at least one evaporation source from contaminating the at least one sputtering source. 6. The method of claim 4 , wherein the substrate comprises a glass layer in the back surface and a metal layer deposited over the glass layer on the front surface; the depositing a respective first ingredient for an absorber layer comprises: depositing copper and gallium from a first sputtering source; and depositing indium from a second sputtering source; and the depositing the second ingredient of the absorber layer comprises depositing selenium from the evaporation source. 7. The method of claim 4 , further comprising: cooling the substrate and the vacuum chamber with an inert conductive gas after forming an absorber layer. 8. The method of claim 1 , wherein the substrate is secured on the rotatable substrate support by holding the entire length of the respective substrate through the at least one opening of the rotatable substrate support. 9. The method of claim 1 , wherein the substrate is attached with a respective frame contacting along a portion of the length of the respective substrate, and each substrate edge is retained by a respective fixture at selected points on the respective frame. 10. A method for forming a solar cell, comprising: securing a substrate on a rotatable substrate support inside a vacuum chamber, wherein the substrate has a front surface and a back surface, the front surface is disposed facing an interior surface of the vacuum chamber; rotating the substrate support; heating the substrate using at least one inner heater and at least one outer heater, the inner heater facing a back surface of the substrate, and the at least one outer heater configured to heat a front surface of the substrate during rotation; and heating the substrate using one or more additional heaters coupled to the rotatable substrate support, wherein the one or more additional heaters rotate with the substrate support. 11. The method of claim 10 , wherein the substrate comprises a glass layer in the back surface and a metal layer deposited over the glass layer on the front surface. 12. The method of claim 10 , wherein the steps of heating the substrate using the at least one inner heater, the at least one outer heater and the one or more additional heaters are performed according to a predetermined temperature profile for minimizing temperature difference between the substrates and the rotatable substrate support. 13. The method of claim 10 , further comprising: forming an absorber layer over the front surface of the substrate. 14. The method of claim 10 , wherein the one or more additional heaters are lamp heaters configured to emit infra-red radiation. 15. A method for forming a solar cell, comprising: securing a substrate on a rotatable substrate support inside a vacuum chamber, wherein the substrate has a front surface and a back surface, the front surface is disposed facing an interior surface of the vacuum chamber; rotating the substrate support; heating the substrate simultaneously using at least one inner heater and at least one outer heater according to a predetermined temperature profile, the inner heater facing a back surface of the substrate, and the at least one outer heater heating a front surface of the substrate during rotation; simultaneously heating the substrate using one or more additional heaters coupled to a plurality of metal frames or metal posts in the rotatable substrate support, wherein the one or more additional heaters rotate with the substrate support; and forming an absorber layer over the front surface of the substrate. 16. The method of claim 15 , wherein the step of forming the absorber layer comprises depositing a respective first ingredient for an absorber layer over the front surface of the substrate from at least one sputtering source; and depositing a second ingredient of the absorber layer over the front surface of the substrate from an evaporation source disposed in the vacuum chamber. 17. The method of claim 15 , wherein the depositing a respective first ingredient for an absorber layer comprises: depositing copper and gallium from a first sputtering source; and depositing indium from a second sputtering source; and the depositing the second ingredient of the absorber layer comprises depositing selenium from the evaporation source. 18. The method of claim 15 , further comprising: cooling the substrate and the vacuum chamber with an inert gas after forming an absorber layer.

Assignees

Inventors

Classifications

  • characterised by supporting two or more semiconductor substrates · CPC title

  • characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating carrousel · CPC title

  • mainly by convection · CPC title

  • CuInSe2 material PV cells · CPC title

  • Thermal treatment · CPC title

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What does patent US9929304B2 cover?
An apparatus for forming a solar cell includes a housing defining a vacuum chamber, a rotatable substrate support, at least one inner heater and at least one outer heater. The substrate support is inside the vacuum chamber configured to hold a substrate. The at least one inner heater is between a center of the vacuum chamber and the substrate support, and is configured to heat a back surface of…
Who is the assignee on this patent?
Tsmc Solar Ltd, Taiwan Semiconductor Mfg Co Ltd
What technology area does this patent fall under?
Primary CPC classification H01L31/1864. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Mar 27 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).