Apparatus for treating substrate

Patent metadata

Field	Value
Publication number	US-9922850-B2
Application number	US-201514744563-A
Country	US
Kind code	B2
Filing date	Jun 19, 2015
Priority date	Jun 30, 2014
Publication date	Mar 20, 2018
Grant date	Mar 20, 2018

Abstract

Disclosed is a substrate treating apparatus which includes a treating container having a treating space therein and including a plurality of collecting vessels surrounding the treating space and provided such that inlets for inputting a fluid in the treating space are vertically stacked on each other, a support unit supporting a substrate in the treating space, a solution supply unit supplying a treating solution to the substrate supported by the support unit, and elevation units respectively joined with the collecting vessels and lifting up and down the collecting vessels. Each of the elevation units includes a base having a ring shape and joined with a corresponding collecting vessel, an elevation load joined with the base, and a driver lifting up and down the elevation load.

First claim

What is claimed is:

1. A substrate treating apparatus comprising:
a treating container having a treating space therein and including a first collecting vessel and a second collecting vessel, the first and second collecting vessels surrounding the treating space and provided such that inlets for inputting fluid into the first and second collecting vessels are vertically stacked relative to each other;
a support unit for supporting a substrate in the treating space;
a solution supply unit for supplying treating solution to the substrate supported by the support unit;
a first elevation unit operably coupled to the first collecting vessel; and
a second elevation unit operably coupled to the second collecting vessel,
wherein each of the first and second elevation units comprises:
a base having a ring shape;
an elevation load joined with the base; and
a driver lifting up and down the elevation load,

wherein the second elevation unit is movably supported by the first elevation unit.

2. The substrate treating apparatus of claim 1 ,
wherein the base of the second elevation unit is fixedly joined with an outer wall of the second collecting vessel,
wherein the elevation load of each of the first and second elevation units comprises:
a vertical load of which a length direction is provided in an up-and-down direction; and
a flange extending from the vertical load in a direction away from the support unit, and

wherein the driver of the second elevation unit is installed on the flange of the elevation load of the first elevation unit.

3. The substrate treating apparatus of claim 2 , wherein the elevation load of the second elevation unit is positioned above the first elevation unit.

4. The substrate treating apparatus of claim 3 , wherein:
the base of the first elevation unit is fixed to an outer wall of the first collecting vessel,
the base of the second elevation unit is fixed to the outer wall of the second collecting vessel,
the vertical load of the elevation load of the first elevation unit is joined with the base of the first elevation unit, a length direction of the vertical load of the elevation load of the first elevation unit being provided in an up-and-down direction, and
the vertical load of the elevation load of the second elevation unit is joined with the base of the second elevation unit and provided in a direction away from the vertical load of the elevation load of the first elevation unit, a length direction of the vertical load of the elevation load of the second elevation unit being provided in an up-and-down direction.

5. The substrate treating apparatus of claim 4 , further comprising:
a third collecting vessel surrounding the second collecting vessel; and
a third elevation unit comprising:
a base fixed to an outer wall of the third collecting vessel;
a vertical load joined with the base of the third elevation unit and provided in a direction away from the support unit, a length direction of the vertical load of the third elevation unit being provided in an up-and-down direction; and
a flange extending from the vertical load of the third elevation unit in a direction away from the support unit and disposed above the flange of the elevation load of the first elevation unit.

6. The substrate treating apparatus of claim 4 , wherein the driver of the first elevation unit is joined with a bottom surface of the vertical load of the first elevation unit, and configured to move the first collecting vessel upward and downward, and
wherein the driver of the second elevation unit is joined with a bottom surface of the vertical load of the second elevation unit, fixedly joined with an upper portion of the flange of the elevation load of the first elevation unit, and configured to move the second collecting vessel upward and downward.

7. The substrate treating apparatus of claim 6 , further comprising:
a third collecting vessel surrounding the second collecting vessel; and
a third elevation unit comprising:
a base fixed to an outer wall of the third collecting vessel;
a vertical load joined with the base of the third elevation unit and provided in a direction away from the vertical load of the second elevation unit, a length direction of the vertical load of the third elevation unit being provided in an up-and-down direction;
a flange extending from the vertical load of the third elevation unit in a direction away from the support unit and disposed above the flange of the elevation load of the first elevation unit; and
a driver joined with a bottom surface of the vertical load of the third elevation unit, fixedly joined with a top end portion of the flange of the elevation load of the second elevation unit, and configured to move the third collecting vessel upward and downward.

8. The substrate treating apparatus of claim 5 , wherein the base of the first elevation unit comprises:
an inside wall joined in a length direction with a bottom end portion of the outer wall of the first collecting vessel;
an outside wall spaced apart from the inside wall of the base of the first elevation unit in a direction away from the support unit and parallel with the inside wall of the base of the first elevation unit; and
a bottom wall connected with a bottom surface of the inside wall of the base of the first elevation unit and a bottom surface of the outside wall of the base of the first elevation unit and provided horizontally,
wherein the base of the second elevation unit comprises:
an inside wall joined in a length direction with a bottom end portion of the outer wall of the second collecting vessel;
an outside wall spaced apart from the inside wall of the base of the second elevation unit in a direction away from the support unit and parallel with the inside wall of the base of the second elevation unit; and
a bottom wall connected with a bottom surface of the inside wall of the base of the second elevation unit and a bottom surface of the outside wall of the base of the second elevation unit and provided horizontally, and
wherein the base of the third elevation unit comprises:
an inside wall joined in a length direction with a bottom end portion of the outer wall of the third collecting vessel;
an outside wall spaced apart from the inside wall of the base of the third elevation unit in a direction away from the support unit and parallel with the inside wall of the base of the third elevation unit; and
a bottom wall connected with a bottom surface of the inside wall of the base of the third elevation unit and a bottom surface of the outside wall of the base of the third elevation unit and provided horizontally.

9. The substrate treating apparatus of claim 8 , wherein the base of the first elevation unit has a space of which a top end is opened and which is surrounded by the inside, outside, and bottom walls of the base of the first elevation unit,
wherein the base of the second elevation unit has a space of which a top end is opened and which is surrounded by the inside, outside, and bottom walls of the base of the second elevation unit,
wherein the base of the third elevation unit has a space of which a top end is opened and which is surrounded by the inside, outside, and bottom walls of the base of the third elevation unit, and
wherein the base of the second elevation unit is placed in the space of the first elevation unit and the base of the third elevation unit is placed in the space of the second elevation unit.

10. The substrate treating apparatus of claim 1 , wherein the treating container further comprises:
a base vessel surrounding the first and second collecting vessels.

11. The substrate treating apparatus of claim 10 , wherein the

Assignees

• Semes Co Ltd

Inventors

• Kwon Oh Jin
• Kim Seong-Soo

Classifications

• H10P72/0414 Primary

  using mainly spraying means, e.g. nozzles · CPC title

• H10P95/00 Primary

  Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass · CPC title

• H10P72/0404 Primary

  for general liquid treatment, e.g. etching followed by cleaning · CPC title

• H01L21/67051 Primary

  Electricity · mapped topic