Main pole layer with at least two sacrificial layers and a gap layer

Patent metadata

Field	Value
Publication number	US-9922671-B2
Application number	US-201514949638-A
Country	US
Kind code	B2
Filing date	Nov 23, 2015
Priority date	Mar 12, 2013
Publication date	Mar 20, 2018
Grant date	Mar 20, 2018

Abstract

A write head having a main pole, a gap layer, and at least two sacrificial layers. In accordance with one embodiment, a method includes depositing a non-magnetic gap layer of material above a main pole layer of magnetic material; depositing a sacrificial layer of material above the non-magnetic gap layer of material; etching a portion of the sacrificial layer of material while not entirely removing the sacrificial layer of material; and depositing additional sacrificial material to the etched sacrificial layer.

First claim

What is claimed is:

1. A method of forming a uniform gap between two magnetic materials, the method comprising:
depositing a non-magnetic gap layer comprising a first material above a main pole layer of magnetic material;
depositing a sacrificial layer of a second material above the non-magnetic gap layer;
etching a portion of the sacrificial layer of the second material while not entirely removing the sacrificial layer of second material and not etching the non-magnetic gap layer;
depositing additional second material to the etched sacrificial layer to form a restored sacrificial layer.

2. The method as claimed in claim 1 and further comprising:
depositing a front shield layer on top of the restored sacrificial layer.

3. The method as claimed in claim 2 and further comprising:
forming a substantially uniform gap between the main pole layer and the front shield layer.

4. The method as claimed in claim 1 wherein the non-magnetic gap layer comprises Al 2 O 3 .

5. The method as claimed in claim 1 wherein the non-magnetic gap layer comprises Ruthenium.

6. The method as claimed in claim 1 wherein the second material comprises Ruthenium.

7. The method as claimed in claim 1 wherein the second material comprises NiRu.

8. The method as claimed in claim 1 wherein the second material comprises Cr.

9. The method as claimed in claim 1 wherein the second material comprises a magnetic moment of about the same magnetic moment of the main pole material.

10. The method as claimed in claim 1 wherein the restored sacrificial layer is a non-magnetic seed for a second magnetic layer, the second magnetic layer deposited on the restored sacrificial layer.

11. A method of forming a write head, the method comprising:
providing a magnetic main pole having a bevel edge;
depositing first non-magnetic gap layer on the main pole including on the bevel edge;
depositing a second non-magnetic gap layer on the first non-magnetic gap layer;
depositing a first sacrificial layer on the second non-magnetic gap layer;
etching a portion of the first sacrificial layer; and
depositing a second sacrificial layer on the etched sacrificial layer, the first sacrificial layer and the second sacrificial layer comprising the same material, to form a restored sacrificial layer.

12. The method as claimed in claim 11 and further comprising:
depositing a front shield layer on top of the restored sacrificial layer.

13. The method as claimed in claim 11 wherein the second non-magnetic gap layer comprises Al 2 O 3 .

14. The method as claimed in claim 11 wherein the first non-magnetic gap layer comprises Ruthenium.

15. The method as claimed in claim 11 wherein the first sacrificial layer and the second sacrificial layer comprise Ruthenium.

16. The method as claimed in claim 11 wherein the first sacrificial layer and the second sacrificial layer comprise NiRu.

17. The method as claimed in claim 11 wherein the first sacrificial layer and the second sacrificial layer comprise Cr.

18. The method as claimed in claim 11 and further comprising:
depositing a second magnetic layer on top of the restored sacrificial layer.

19. The method as claimed in claim 18 wherein the restored sacrificial layer is a non-magnetic seed material for the second magnetic layer.

20. The method as claims in claim 11 , wherein etching a portion of the first sacrificial layer comprises etching a portion of the first sacrificial layer and not etching the second non-magnetic gap layer.

Assignees

• Seagate Technology Llc

Inventors

• Tian Wei
• Inturi Venkateswara Rao
• Lin Dong
• Yin Huaqing
• Qiu Jiaoming

Classifications

• G11B5/187

  Structure or manufacture of the surface of the head in physical contact with, or immediately adjacent to the recording medium; Pole pieces; Gap features (G11B5/265, {G11B5/29} , G11B5/31 take precedence) · CPC title

• G11B5/3176 Primary

  Structure of heads comprising at least in the transducing gap regions two magnetic thin films disposed respectively at both sides of the gaps (G11B5/2455, G11B5/265 take precedence) · CPC title

• B81C1/00611

  Processes for the planarisation of structures (planarising depositions C23C, H10) · CPC title

• G11B5/3163

  Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers · CPC title

• C09K13/00

  Etching, surface-brightening or pickling compositions (for glass C03C15/00, {C03C25/66; for mortars, concrete, artificial or natural stone or ceramics C04B41/5338}; for metallic material C23F, C23G1/00, C25F1/00; {for semi-conductors H10P52/40}) · CPC title