Cleaning composition and cleaning method

US9920287B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9920287-B2
Application numberUS-201514714526-A
CountryUS
Kind codeB2
Filing dateMay 18, 2015
Priority dateMay 20, 2014
Publication dateMar 20, 2018
Grant dateMar 20, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A cleaning composition includes (A) at least one compound selected from the group consisting of a fatty acid that includes a hydrocarbon group having 8 to 20 carbon atoms, a phosphonic acid that includes a hydrocarbon group having 3 to 20 carbon atoms, a sulfuric acid ester that includes a hydrocarbon group having 3 to 20 carbon atoms, an alkenylsuccinic acid that includes a hydrocarbon group having 3 to 20 carbon atoms, and salts thereof, (B) an organic acid, (C) a water-soluble amine, (D) a water-soluble polymer, and an aqueous medium, the cleaning composition having a pH of 9 or more.

First claim

Opening claim text (preview).

What is claimed is: 1. A cleaning composition comprising: (A) at least one compound selected from the group consisting of a fatty acid that includes a hydrocarbon group having 8 to 20 carbon atoms, an alkenylsuccinic acid that includes a hydrocarbon group having 3 to 20 carbon atoms, and salts thereof; (B) an organic acid; (C) a water-soluble amine; (D) a water-soluble polymer; and an aqueous medium, the cleaning composition having a pH of 9.2 or more, wherein a content of component (A) in the cleaning composition is 0.0001 to 0.1 mass %, based on a total mass of the cleaning composition, wherein a content of component (B) in the cleaning composition is 0.0001 to 0.1 mass %, based on a total mass of the cleaning composition, wherein a content of component (C) in the cleaning composition is 0.0001 to 0.1 mass %, based on a total mass of the cleaning composition, wherein a content of component (D) in the cleaning composition is 0.0001 to 1 mass %, based on a total mass of the cleaning composition, and wherein the cleaning composition is suitable for cleaning a wiring board. 2. The cleaning composition according to claim 1 , wherein the component (B) is an amino acid. 3. The cleaning composition according to claim 2 , wherein the amino acid is at least one amino acid selected from the group consisting of tryptophan, phenylalanine, arginine, and histidine. 4. The cleaning composition according to claim 1 , wherein the component (C) is an alkanolamine. 5. The cleaning composition according to claim 1 , wherein the component (D) is at least one water-soluble polymer selected from the group consisting of poly(meth)acrylic acid and a polyalkylene glycol. 6. The cleaning composition according to claim 1 , wherein a cleaning target surface of the wiring board includes a wiring material and a barrier metal material, the wiring material being copper or tungsten, and the barrier metal material being at least one material selected from the group consisting of tantalum, titanium, cobalt, ruthenium, manganese, and compounds thereof. 7. The cleaning composition according to claim 6 , wherein the cleaning target surface includes a part in which the wiring material and the barrier metal material come in contact with each other. 8. The cleaning composition according to claim 1 , wherein an absolute value of a difference in corrosion potential between copper and cobalt when immersed in the cleaning composition is 0.1 V or less. 9. A cleaning method comprising contacting a wiring board with the cleaning composition according to claim 1 , the wiring board including a wiring material and a barrier metal material, the wiring material being copper or tungsten, and the barrier metal material being at least one material selected from the group consisting of tantalum, titanium, cobalt, ruthenium, manganese, and compounds thereof. 10. The cleaning composition according to claim 1 , wherein the component (A) comprises a fatty acid that includes a hydrocarbon group haying 8 to 20 carbon atoms, or a salt thereof. 11. The cleaning composition according to claim 1 , wherein the component (A) comprises an alkenylsuccinic acid that includes a hydrocarbon group haying 3 to 20 carbon atoms, or a salt thereof. 12. The cleaning composition according to claim 2 , wherein the amino acid comprises tryptophan. 13. The cleaning composition according to claim 2 , wherein the amino acid comprises phenylalanine. 14. The cleaning composition according to claim 2 , wherein the amino acid comprises arginine. 15. The cleaning composition according to claim 2 , wherein the amino acid comprises histidine. 16. The cleaning composition according to claim 1 , wherein the component (D) comprises poly(meth)acrylic acid. 17. The cleaning composition according to claim 1 , wherein the component (D) comprises a polyalkylene glycol.

Assignees

Inventors

Classifications

  • C11D1/37Primary

    Mixtures of compounds all of which are anionic · CPC title

  • Amines or imines with one to four nitrogen atoms; Quaternized amines · CPC title

  • (Co)polymerised carboxylic acids, -anhydrides, -esters in solid and liquid compositions · CPC title

  • Polyethers, e.g. polyalkyleneoxides · CPC title

  • Phosphonates, phosphinates or phosphonites · CPC title

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What does patent US9920287B2 cover?
A cleaning composition includes (A) at least one compound selected from the group consisting of a fatty acid that includes a hydrocarbon group having 8 to 20 carbon atoms, a phosphonic acid that includes a hydrocarbon group having 3 to 20 carbon atoms, a sulfuric acid ester that includes a hydrocarbon group having 3 to 20 carbon atoms, an alkenylsuccinic acid that includes a hydrocarbon group h…
Who is the assignee on this patent?
Jsr Corp
What technology area does this patent fall under?
Primary CPC classification C11D1/37. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Mar 20 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).