Growing graphene on substrates

US9905418B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9905418-B2
Application numberUS-201715427367-A
CountryUS
Kind codeB2
Filing dateFeb 8, 2017
Priority dateOct 25, 2012
Publication dateFeb 27, 2018
Grant dateFeb 27, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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Abstract

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Embodiments described herein provide methods and apparatus for forming graphitic carbon such as graphene on a substrate. The method includes providing a precursor comprising a linear conjugated hydrocarbon, depositing a hydrocarbon layer from the precursor on the substrate, and forming graphene from the hydrocarbon layer by applying energy to the substrate. The precursor may include template molecules such as polynuclear aromatics, and may be deposited on the substrate by spinning on, by spraying, by flowing, by dipping, or by condensing. The energy may be applied as radiant energy, thermal energy, or plasma energy.

First claim

Opening claim text (preview).

The invention claimed is: 1. An uncatalyzed method of growing graphitic carbon on a substrate, comprising: depositing a hydrocarbon layer directly on a silicon containing substrate from a precursor comprising a linear conjugated hydrocarbon and a solvent; evaporating the solvent before applying energy to the hydrocarbon layer; and forming a graphitic layer from the hydrocarbon layer by applying energy to the hydrocarbon layer. 2. The method of claim 1 , wherein the solvent is an aprotic solvent. 3. The method of claim 1 , wherein the aprotic solvent is benzene. 4. The method of claim 1 , wherein evaporating the solvent is performed under an inert atmosphere comprising nitrogen, argon, hydrogen, or a combination thereof. 5. The method of claim 1 , further comprises removing evaporated solvent with a drying agent or filter from a deposition chamber. 6. The method of claim 1 , wherein the precursor further comprises a polynuclear aromatic compound. 7. The method of claim 6 , wherein the precursor has a viscosity less than about 3.0 cP at room temperature. 8. The method of claim 1 , wherein depositing the hydrocarbon layer on the substrate comprises adhering molecules from the precursor to a surface of the substrate. 9. The method of claim 1 , wherein the energy is selected from the group consisting of UV energy, plasma energy, thermal energy, and combinations thereof. 10. The method of claim 1 , wherein the precursor has a viscosity less than about 3.0 cP at room temperature. 11. The method of claim 1 , wherein the precursor further comprises an oxygen-containing solvent. 12. The method of claim 1 , wherein the linear conjugated hydrocarbon is butadiene. 13. The method of claim 12 , wherein the precursor further comprises a polynuclear aromatic compound. 14. The method of claim 1 , wherein the graphitic carbon layer is at least about 80% graphene. 15. The method of claim 1 , wherein depositing comprises spin coating the precursor onto the substrate. 16. An uncatalyzed method of forming graphene on a substrate, comprising: providing a precursor comprising a linear unsaturated hydrocarbon, an aromatic hydrocarbon, and benzene; directly depositing molecules from the precursor on the silicon containing substrate; and reacting the molecules to form graphene by applying energy to the molecules. 17. The method of claim 16 , wherein the precursor further comprises an oxygen-containing solvent. 18. An uncatalyzed method of forming graphene on a substrate, comprising: depositing a hydrocarbon layer on a silicon containing substrate from a precursor comprising a linear conjugated hydrocarbon and a solvent; evaporating the solvent before applying energy to the hydrocarbon layer; and forming a graphene layer from the hydrocarbon layer by applying energy to the hydrocarbon layer using a staged UV exposure, wherein the staged UV exposure comprises: exposing the hydrocarbon layer to UV energy in a first exposure operation; and exposing the hydrocarbon layer to the UV energy in a second exposure operation after the first exposure operation. 19. The method of claim 18 , wherein the staged UV exposure further comprises: a rest period between the first exposure operation and the second exposure operation. 20. The method of claim 18 , wherein the first exposure operation utilizes UV energy having a first power density selected to convert the hydrocarbon layer to graphene and the second exposure operation utilizes UV energy having a second power density selected to increase a grain size of the graphene formed during the first exposure operation.

Assignees

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Classifications

  • by exposure to radiation, e.g. visible light · CPC title

  • by exposure to a plasma · CPC title

  • of treatments performed after formation of the materials · CPC title

  • Carbon, e.g. diamond-like carbon · CPC title

  • Materials · CPC title

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What does patent US9905418B2 cover?
Embodiments described herein provide methods and apparatus for forming graphitic carbon such as graphene on a substrate. The method includes providing a precursor comprising a linear conjugated hydrocarbon, depositing a hydrocarbon layer from the precursor on the substrate, and forming graphene from the hydrocarbon layer by applying energy to the substrate. The precursor may include template mo…
Who is the assignee on this patent?
Applied Materials Inc
What technology area does this patent fall under?
Primary CPC classification H10P14/3406. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Feb 27 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).