Curved post scan electrode

Patent metadata

Field	Value
Publication number	US-9905396-B1
Application number	US-201615296242-A
Country	US
Kind code	B1
Filing date	Oct 18, 2016
Priority date	Oct 18, 2016
Publication date	Feb 27, 2018
Grant date	Feb 27, 2018

Abstract

An apparatus an ion beam generator to provide an ion beam. A scanning system may receive the ion beam and provide a scanned beam. An electrode may receive the scanned beam. At least a portion of the electrode is normal to a propagation direction of the scanned beam. The portion of the electrode that is normal to the propagation direction the scan beam may have a curved shape.

First claim

We claim:

1. An apparatus, comprising:
an ion beam generator to provide an ion beam;
a scanning system to receive the ion beam, the scanning system including first and second scan plates positioned on opposite sides of the ion beam, the first and second scan plates to generate a scanned beam from the ion beam, the scanned beam having a scan origin and an apparent scan origin; and
an electrode to receive the scanned beam, at least a portion of the electrode has a curved shape to substantially maintain a position of the apparent scan origin.

2. The apparatus according to claim 1 , wherein the electrode is downstream of the scanning system and is positioned directly adjacent to the first and second scan plates of the scanning system.

3. The apparatus according to claim 1 , wherein the electrode is downstream of the scanning system.

4. The apparatus according to claim 1 , wherein the first and second scan plates comprise parallel portions and diverging portions downstream of the parallel portions.

5. The apparatus according to claim 1 , further comprising a prescan electrode positioned upstream of the electrode.

6. The apparatus according to claim 1 , wherein the scanned beam has a fan-shaped beam envelope, the fan-shaped beam envelope beginning at the scan origin and received by the electrode, and wherein the apparent scan origin overlaps the scan origin.

7. A method, comprising:
generating an ion beam;
receiving the ion beam and providing a scanned beam from the ion beam, the scanned beam having a scan origin and an apparent scan origin; and
receiving the scanned beam by a curved electrode, a position of the apparent scan origin of the scanned beam substantially maintained as the scanned beam passes through the curved electrode.

8. The method according to claim 7 , wherein a scanning system comprising first and second scan plates positioned on opposite sides of the ion beam receives the ion beam and provides the scanned beam from the ion beam.

9. The method according to claim 8 , wherein the first and second scan plates comprise parallel portions and diverging portions downstream of the parallel portions.

10. The method according to claim 8 , wherein the scan origin and the apparent scan origin of the scanned beam are positioned between the first and second scan plates.

11. The method according to claim 8 , wherein the scanned beam has a fan-shaped beam envelope, the fan-shaped beam envelope beginning at the scan origin and wherein the apparent scan origin overlaps the scan origin.

12. An apparatus, comprising:
an ion beam generator to provide an ion beam;
a scanning system to receive the ion beam, the scanning system including:
first and second scan plates positioned on opposite sides of the ion beam, the first and second scan plates to generate a scanned beam from the ion beam, the scanned beam having a scan origin and an apparent scan origin,
a deceleration lens disposed upstream of the first and second scan plate, the deceleration lens to decelerate the ion beam; and

an electrode to receive the scanned beam, at least a portion of the electrode has a curved shape to substantially maintain a position of the apparent scan origin.

13. The apparatus according to claim 12 , wherein the electrode is downstream of the scanning system and is positioned directly adjacent to the first and second scan plates of the scanning system.

14. The apparatus according to claim 12 , wherein the electrode is downstream of the scanning system.

15. The apparatus according to claim 12 , wherein the first and second scan plates comprise parallel portions and diverging portions downstream of the parallel portions.

16. The apparatus according to claim 12 , further comprising a prescan electrode disposed upstream of the electrode.

17. The apparatus according to claim 12 , wherein the scanned beam has a fan-shaped beam envelope, the fan-shaped beam envelope beginning at the scan origin and received by the electrode, and wherein the apparent scan origin overlaps the scan origin.

Assignees

• Varian Semiconductor Equipment Ass Inc

Inventors

• Sinclair Frank
• Tieger Daniel
• Bell Edward W
• Lindberg Robert

Classifications

• H01J37/3171 Primary

  for ion implantation · CPC title

• H01J37/045 Primary

  Beam blanking or chopping, i.e. arrangements for momentarily interrupting exposure to the discharge · CPC title

• H01J2237/0475

  decelerating · CPC title

• H01J37/08

  Ion sources; Ion guns · CPC title

• H01J2237/057

  Energy or mass filtering · CPC title