Imprint template and methods thereof

Patent metadata

Field	Value
Publication number	US-9905259-B2
Application number	US-201514699412-A
Country	US
Kind code	B2
Filing date	Apr 29, 2015
Priority date	Apr 29, 2011
Publication date	Feb 27, 2018
Grant date	Feb 27, 2018

Abstract

Provided herein is a method, including forming a first template including a first pattern, wherein forming the first template includes self-assembly of diblock copolymers guided by an initial pattern; forming a second template including a second pattern, wherein the second pattern corresponds to a servo pattern; and forming a master template from the first template, wherein the master template includes one or more portions of the first pattern combined with the second pattern.

First claim

What is claimed is:

1. A method, comprising:
forming an initial template comprising an initial pattern;
forming a first template from the initial template, wherein
forming the first template includes self-assembly of diblock copolymers guided by the initial pattern, and
the first template comprises a first pattern having a uniform symmetry of dots in a pillar structure and a greater pattern density of the dots than the initial pattern;

forming a second template comprising a second pattern corresponding to a servo pattern for a recording medium; and
forming a master template from the first template, wherein
forming the master template includes
spinning resist onto the dots of the first pattern of the first template,
imprinting the resist with the second template to form thin resist and thick resist over the pillar structure,
curing the thin resist and the thick resist, and
etching the thin resist and the thick resist and the pillar structure to remove the pillar structure under the thin resist to form portions of the first pattern combined with the second pattern.

2. The method of claim 1 ,
wherein forming the initial template comprises spinning resist onto a first substrate and subsequently writing the initial pattern with an electron-beam writer.

3. The method of claim 2 ,
wherein the initial pattern comprises a pattern density of 250 Gdpsi.

4. The method of claim 1 ,
wherein the first pattern comprises a pattern density of 1 Tdpsi.

5. The method of claim 1 ,
wherein forming the second template comprises spinning resist onto a second substrate and subsequently writing the second pattern with an electron-beam writer.

6. The method of claim 5 ,
wherein the second pattern comprises a mirror image of the servo pattern for the master template.

7. A method, comprising:
forming a first template from an initial template,
wherein the first template comprises a first pattern at about a 1-Tdpsi pattern density with a uniform symmetry of pillar structured dots;

forming a second template,
wherein the second template comprises a second pattern corresponding to a servo pattern for a recording device; and

forming a master template from the first template, wherein
forming the master template includes
spinning resist onto the pillar structured dots,
imprinting the resist with the second template to form thin resist and thick resist over the pillar structured dots,
curing the thin resist and the thick resist, and
etching the thin resist and the thick resist and the pillar structured dots to remove the pillar structured dots under the thin resist to form portions of the first pattern combined with the second pattern.

8. The method of claim 7 , further comprising,
forming the initial template,
wherein forming the initial template comprises spinning resist onto a first substrate and subsequently electron-beam writing an initial pattern at a 250-Gdpsi pattern density.

9. The method of claim 7 ,
wherein forming the first template comprises self-assembly of diblock copolymers guided by the initial pattern.

10. The method of claim 9 ,
wherein forming the second template comprises spinning resist onto a second substrate and subsequently writing the second pattern with an electron-beam writer.

11. The method of claim 10 ,
wherein the second pattern comprises a mirror image of the servo pattern for the master template.

12. A method, comprising:
forming a first template comprising a first pattern of pillar structures with a uniform symmetry,
wherein forming the first template comprises self-assembly of diblock copolymers guided by an initial pattern;

forming a second template comprising a second pattern,
wherein the second pattern corresponds to a servo pattern; and

forming a master template from the first template, wherein
forming the master template includes
spinning resist onto the pillar structures,
imprinting the resist with the second template to form thin resist and thick resist over the pillar structures, and
etching the thin resist and the thick resist and the pillar structures to remove the pillar structures under the thin resist to form portions of the first pattern combined with the second pattern.

13. The method of claim 12 , further comprising,
forming the initial pattern,
wherein forming the initial pattern comprises spinning resist onto a first substrate and subsequently electron-beam writing the initial pattern at a 250-Gdpsi pattern density.

14. The method of claim 13 ,
wherein the first pattern comprises a pattern density of 1 Tdpsi.

15. The method of claim 14 ,
wherein forming the second template comprises spinning resist onto a second substrate and subsequently writing the second pattern with an electron-beam writer.

16. The method of claim 15 ,
wherein the first pattern combined with the second pattern comprises hexagonally patterned pillars in a servo pattern for bit-patterned media.

Assignees

• Seagate Technology Llc

Inventors

• Chauhan Sundeep
• Kantorov Alexander
• Lee Kim Yang
• Kuo David
• Marinus Van De Veerdonk Rene Johannes
• Vikaramaditya Barmeshwar

Classifications

• G11B11/03

  using recording by deforming with non-mechanical means, e.g. laser, beam of particles {(G11B11/002 takes precedence; see proviosional also G11B3/68 - G11B3/72)} · CPC title

• G11B5/59638

  Servo formatting apparatuses, e.g. servo-writers · CPC title

• G11B5/746

  Bit Patterned record carriers, wherein each magnetic isolated data island corresponds to a bit · CPC title

• G03F7/0041

  providing an etching agent upon exposure (G03F7/075 takes precedence; photolytic halogen compounds G03F7/0295) · CPC title

• G11B5/865 Primary

  by contact "printing" · CPC title