Substrate support structure, vacuum drying device and vacuum drying method

Patent metadata

Field	Value
Publication number	US-9903650-B2
Application number	US-201615147321-A
Country	US
Kind code	B2
Filing date	May 5, 2016
Priority date	Aug 21, 2015
Publication date	Feb 27, 2018
Grant date	Feb 27, 2018

Abstract

The present disclosure provides a substrate support structure, a vacuum drying device and a vacuum drying method. The substrate support structure includes a support platform and a plurality of pins in the support platform. The plurality of pins is divided into at least two groups, and the at least two groups of pins are in the support platform in such a manner as to be liftable in the support platform, so that a substrate is supported by the at least two groups of pins alternately.

First claim

What is claimed is:

1. A substrate support structure, comprising: a support platform and a plurality of pins in the support platform;
wherein the plurality of pins is divided into at least two groups, and the at least two groups of pins are in the support platform in such a manner as to be liftable in the support platform, so that a substrate is supported by the at least two groups of pins alternately.

2. The substrate support structure according to claim 1 , wherein a region of the support platform exactly facing the substrate is equally divided into a plurality of sub-regions arranged in a matrix form, and each group of pins comprises at least one pin at each sub-region.

3. The substrate support structure according to claim 2 , wherein one of the pins is arranged at a center of each sub-region, and one group of the at least two groups of pins comprises the pin arranged at the center of each sub-region.

4. The substrate support structure according to claim 3 , wherein at least one of the pins is arranged at a border between each sub-region and an adjacent sub-region, and the other group of the at least two groups of pins comprises the pin arranged at the border between each sub-region and the adjacent sub-region.

5. The substrate support structure according to claim 4 , wherein each sub-region is of a rectangular shape, one of the pins is arranged at at least one corner of each sub-region, and the other group of the at least two groups of pins comprises the pin arranged at at least one corner of each sub-region.

6. The substrate support structure according to claim 5 , wherein one of the pins is arranged at each corner of each sub-region, and the other group of the at least two groups of pins comprises the pin arranged at each corner of each sub-region.

7. The substrate support structure according to claim 4 , wherein each sub-region is of a rectangular shape, one of the pins is arranged at a center of each side of each sub-region, and the other group of the at least two groups of pins comprises the pin arranged at the center of each side of each sub-region.

8. The substrate support structure according to claim 2 , wherein at least one pin is arranged at a border between each sub-region and an adjacent sub-region, and one group of the at least two groups of pins comprises the pin arranged at the border between each sub-region and the adjacent sub-region.

9. The substrate support structure according to claim 8 , wherein each sub-region is of a rectangular shape, one of the pins is arranged at at least one corner of each sub-region, and one group of the at least two groups of pins comprises the pin arranged at at least one corner of each sub-region.

10. The substrate support structure according to claim 9 , wherein one of the pins is arranged at each corner of each sub-region, and one group of the at least two groups of pins comprises the pin arranged at each corner of each sub-region.

11. The substrate support structure according to claim 2 , wherein each sub-region is of a rectangular shape, one of the pins is arranged at at least one corner of each sub-region, one of the pins is arranged at a center of each side of each sub-region, one group of the at least two groups of pins comprises the pin arranged at at least one corner of each sub-region, and the other group of the at least two groups of pins comprises the pin arranged at the center of each side of each sub-region.

12. A vacuum drying device, comprising a substrate support structure and a control mechanism;
wherein the substrate support structure comprises a support platform and a plurality of pins in the support platform, the plurality of pins is divided into at least two groups, and the at least two groups of pins are in the support platform in such a manner as to be liftable on the support platform, and
the control mechanism is configured to enable at least two groups of pins in the substrate support structure to be lifted alternately so that a substrate is supported by the at least two groups of pins alternately.

13. The vacuum drying device according to claim 12 , wherein the control mechanism comprises:
a first control module configured to enable the at least two groups of pins to be lifted alternately at a first frequency within a first time period; and
a second control module configured to enable the at least two groups of pins to be lifted alternately at a second frequency less than the first frequency within a second time period subsequent to the first time period.

14. The vacuum drying device according to claim 12 , wherein a region of the support platform exactly facing the substrate is equally divided into a plurality of sub-regions arranged in a matrix form, and each group of pins comprises at least one pin at each sub-region.

15. The vacuum drying device according to claim 14 , wherein one of the pins is arranged at a center of each sub-region, and one group of the at least two groups of pins comprises the pin arranged at the center of each sub-region.

16. The vacuum drying device according to claim 15 , wherein at least one of the pins is arranged at a border between each sub-region and an adjacent sub-region, and the other group of the at least two groups of pins comprises the pin arranged at the border between each sub-region and the adjacent sub-region.

17. The vacuum drying device according to claim 16 , wherein each sub-region is of a rectangular shape, one of the pins is arranged at at least one corner of each sub-region, and the other group of the at least two groups of pins comprises the pin arranged at at least one corner of each sub-region.

18. The vacuum drying device according to claim 14 , wherein each sub-region is of a rectangular shape, one of the pins is arranged at at least one corner of each sub-region, one of the pins is arranged at a center of each side of each sub-region, one group of the at least two groups of pins comprises the pin arranged at at least one corner of each sub-region, and the other group of the at least two groups of pins comprises the pin arranged at the center of each side of each sub-region.

19. A method for vacuum drying a substrate using the vacuum drying device according to claim 12 , comprising steps of:
placing the substrate on at least two groups of pins; and
during a vacuum drying procedure, enabling the at least two groups of pins to be lifted alternately, so as to support the substrate alternately.

20. The vacuum drying method according to claim 19 , wherein the step of enabling the at least two groups of pins to be lifted alternately comprises:
enabling the at least two groups of pins to be lifted alternately at a first frequency within a first time period; and
enabling the at least two groups of pins to be lifted alternately at a second frequency less than the first frequency within a second time period subsequent to the first time period.

Assignees

• Boe Technology Group Co Ltd

Inventors

• Zhao Dejiang

Classifications

• H10P72/7614

  characterised by a plurality of individual support members, e.g. support posts or protrusions · CPC title

• H10P72/7612

  characterised by lifting arrangements, e.g. lift pins · CPC title

• H10P72/0408

  for drying · CPC title

• F26B5/06

  the process involving freezing · CPC title

• F26B5/12

  by suction · CPC title