Wiring substrate and semiconductor device

US9899304B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9899304-B2
Application numberUS-201615381916-A
CountryUS
Kind codeB2
Filing dateDec 16, 2016
Priority dateDec 25, 2015
Publication dateFeb 20, 2018
Grant dateFeb 20, 2018

How to read this patent

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  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A wiring substrate includes a first wiring layer that is an uppermost wiring layer, a protective insulation layer that covers the first wiring layer, and a first through hole that extends through the protective insulation layer in a thickness-wise direction to partially expose an upper surface of the first wiring layer. The first through hole includes a recess defined in an upper surface of the protective insulation layer by a curved wall surface and an opening that extends from the upper surface of the first wiring layer to a bottom of the recess and is in communication with the recess. The opening is smaller than the recess in a plan view.

First claim

Opening claim text (preview).

The invention claimed is: 1. A wiring substrate comprising: a first wiring layer that is an uppermost wiring layer; a protective insulation layer that covers the first wiring layer; a first through hole that extends through the protective insulation layer in a thickness-wise direction to partially expose an upper surface of the first wiring layer, the first through hole including: a recess defined in an upper surface of the protective insulation layer by a curved wall surface, and an opening that extends from the upper surface of the first wiring layer to a bottom of the recess and is in communication with the recess, wherein the opening is smaller than the recess in a plan view; a surface finish layer formed on the upper surface of the first wiring layer exposed by the opening; and a solder bump bonded to the surface finish layer, wherein an upper surface of the surface finish layer is located at a lower position than a corner that connects a lower end of the wall surface of the recess and an upper end of a wall surface of the opening, and wherein an upper surface of the solder bump is located at a position that is higher than the corner and lower than the upper surface of the protective insulation layer. 2. The wiring substrate according to claim 1 , wherein the first through hole has the form of a stemmed bowl. 3. A semiconductor device comprising: the wiring substrate according to claim 1 ; and a semiconductor chip including a connection terminal bonded to the solder bump, wherein the semiconductor chip is flip-chip-mounted on the wiring substrate. 4. A wiring substrate comprising: a first wiring layer that is an uppermost wiring layer; a second wiring layer that is an uppermost wiring layer, wherein the first wiring layer and the second wiring layer are separated from each other on the same plane; a protective insulation layer that covers the first wiring layer and the second wiring layer; a first through hole that extends through the protective insulation layer in a thickness-wise direction to partially expose an upper surface of the first wiring layer; and a second through hole that extends through the protective insulation layer in the thickness-wise direction to partially expose an upper surface of the second wiring layer, wherein the first through hole includes a recess defined in an upper surface of the protective insulation layer by a curved wall surface, and an opening that extends from the upper surface of the first wiring layer to a bottom of the recess and is in communication with the recess, wherein the opening is smaller than the recess in a plan view, the first through hole is defined by a wall surface that includes a step at an intermediate position in the thickness-wise direction, wherein the step defines the recess and the opening, the second through hole is larger than the recess in a plan view, and the second through hole is defined by a wall surface that is free of a step at an intermediate position in the thickness-wise direction. 5. The wiring substrate according to claim 4 , further comprising a surface finish layer formed on the upper surface of the first wiring layer exposed by the opening, wherein an upper surface of the surface finish layer is located at a lower position than a corner that connects a lower end of the wall surface of the recess and an upper end of a wall surface of the opening. 6. The wiring substrate according to claim 5 , further comprising a solder bump bonded to the surface finish layer. 7. The wiring substrate according to claim 4 , further comprising a surface finish layer located on the upper surface of the first wiring layer exposed by the opening, wherein an upper surface of the surface finish layer is located at a higher position than a corner that connects a lower end of the wall surface of the recess and an upper end of a wall surface of the opening. 8. The wiring substrate according to claim 7 , wherein the surface finish layer includes a base portion with which the opening is filled, and a distal portion located in a bottom of the recess, wherein the distal portion is larger than the base portion in a plan view. 9. The wiring substrate according to claim 7 , further comprising a solder bump bonded to the surface finish layer. 10. The wiring substrate according to claim 4 , wherein the first through hole has the form of a stemmed bowl. 11. A semiconductor device comprising: the wiring substrate according to claim 6 ; and a semiconductor chip including a connection terminal bonded to the solder bump, wherein the semiconductor chip is flip-chip-mounted on the wiring substrate. 12. A semiconductor device comprising: the wiring substrate according to claim 9 ; and a semiconductor chip including a connection terminal bonded to the solder bump, wherein the semiconductor chip is flip-chip-mounted on the wiring substrate.

Assignees

Inventors

Classifications

  • Insulating materials thereof · CPC title

  • Through-vias · CPC title

  • Connecting or disconnecting other interconnections thereto or therefrom, e.g. connecting bond wires or bumps · CPC title

  • H10W90/701Primary

    characterised by the relative positions of pads or connectors relative to package parts · CPC title

  • between a chip and a stacked insulating package substrate, interposer or RDL · CPC title

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Frequently asked questions

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What does patent US9899304B2 cover?
A wiring substrate includes a first wiring layer that is an uppermost wiring layer, a protective insulation layer that covers the first wiring layer, and a first through hole that extends through the protective insulation layer in a thickness-wise direction to partially expose an upper surface of the first wiring layer. The first through hole includes a recess defined in an upper surface of the…
Who is the assignee on this patent?
Shinko Electric Ind Co
What technology area does this patent fall under?
Primary CPC classification H10W90/701. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Feb 20 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).