Method for producing siliceous film and polysilazane coating treatment liquid used therefor

Patent metadata

Field	Value
Publication number	US-9896764-B2
Application number	US-201013391923-A
Country	US
Kind code	B2
Filing date	Sep 2, 2010
Priority date	Sep 4, 2009
Publication date	Feb 20, 2018
Grant date	Feb 20, 2018

Abstract

The present invention provides a method for forming a siliceous film. According to the method, a siliceous film having a hydrophilic surface can be formed from a polysilazane compound at a low temperature. In the method, a composition containing a polysilazane compound and a silica-conversion reaction accelerator is applied on a substrate surface to form a polysilazane film, and then a polysilazane film-treatment solution is applied thereon so that the polysilazane compound can be converted into a siliceous film at 300° C. or less. The polysilazane film-treatment solution contains a solvent, hydrogen peroxide and an alcohol.

First claim

The invention claimed is:

1. A siliceous film formation method comprising
a polysilazane-film formation step, in which a composition comprising a polysilazane compound and a silica-conversion reaction accelerator is applied, by spin coating, on a substrate surface to form a polysilazane film;
a promoter application step, in which a polysilazane film-treatment solution is applied by casting on said polysilazane film; and
a hardening step, in which said polysilazane compound is converted into a siliceous film at a temperature of 300° C. or less;
wherein
said polysilazane film-treatment solution comprises a solvent, 0.5 to 10 wt% of hydrogen peroxide and 25 to 98 wt% of an alcohol, based on the total weight thereof.

2. The siliceous film formation method according to claim 1 , wherein said polysilazane compound is a perhydropolysilazane compound.

3. The siliceous film formation method according to claim 1 , wherein said silica-conversion reaction accelerator is selected from a metal carboxylate, a N-heterocyclic compound and an amine compound.

4. The siliceous film formation method according to claim 1 , wherein said alcohol is selected from the group consisting of monools, diols and oxyethers.

5. The siliceous film formation method according to claim 1 , wherein said solvent is water.

6. The siliceous film formation method according to claim 1 , wherein said hardening step is carried out at room temperature.

7. A polysilazane film-treatment solution
which is applied on a polysilazane film formed by applying, by spin coating, a composition containing a polysilazane compound and a silica-conversion reaction accelerator, so as to promote conversion of the polysilazane compound into silica;
characterized by comprising a solvent, 0.5 to 10 wt% of hydrogen peroxide and 25 to 98 wt% of an alcohol, based on the total weight thereof.

8. The method of claim 1 , where the alcohol can have 1 to 8 carbon atoms.

9. The composition of claim 7 , where the alcohol is selected from the group consisting of monools, diols and oxyethers.

10. The composition of claim 7 , where the alcohol can have 1 to 8 carbon atoms.

11. The composition of claim 7 , where the solvent is water.

12. The composition of claim 7 , where the alcohol is selected from methanol, ethanol, n-propanol, iso-propanol, butanol, hexanol octanol, ethylene glycol, propylene glycol, 1-methoxy-2-propanol, 2-ethoxyethanol and mixtures thereof.

13. The method of claim 1 , where the alcohol is selected from methanol, ethanol, n-propanol, iso-propanol, butanol, hexanol octanol, ethylene glycol, propylene glycol, 1-methoxy-2-propanol, 2-ethoxyethanol and mixtures thereof.

Assignees

• Ozaki Yuki
• Hayashi Masanobu
• Merck Patent Gmbh

Inventors

• Ozaki Yuki
• Hayashi Masanobu

Classifications

• H10P14/6522

  introduced into a nitride material, e.g. changing SiN to SiON · CPC title

• H10P14/69215

  the material being a silicon oxide, e.g. SiO2 · CPC title

• H10P14/6689 Primary

  the compound being a silazane · CPC title

• H10P14/6342

  Liquid deposition, e.g. spin-coating, sol-gel techniques or spray coating · CPC title

• C23C18/1208 Primary

  Oxides, e.g. ceramics · CPC title