Apparatus for heat treating an optical ceramic material, method for heat treating an optical ceramic material, method for heat treating synthetic silica glass, method for producing an optical system, and method for producing an exposure apparatus

Patent metadata

Field	Value
Publication number	US-9896370-B2
Application number	US-201314016568-A
Country	US
Kind code	B2
Filing date	Sep 3, 2013
Priority date	Mar 2, 2011
Publication date	Feb 20, 2018
Grant date	Feb 20, 2018

Abstract

An optical ceramic material heat treatment apparatus, comprising: a furnace body that is capable to contain an optical ceramic material to be heat treated in the inside thereof; a temperature drop control heater that generates heat during dropping a temperature of the optical ceramic material; a refrigerant intake unit that introduces a refrigerant into the inside of the furnace body to flow the refrigerant therein; and a control unit that controls the temperature drop rate, wherein the temperature drop control heater is arranged in the inside of the furnace body and/or in the refrigerant intake unit, the control unit controls at least one of an amount of heat generation of the temperature drop control heater, and a flow rate of the refrigerant in the inside of the furnace body to control a temperature drop rate at the optical ceramic material or in the vicinity thereof to be kept in a predetermined profile.

First claim

What is claimed is:

1. An optical ceramic material heat treatment apparatus, comprising:
a furnace body configured to contain an optical ceramic material to be heat treated in the inside thereof;
a wall portion configured to partition the inside of the furnace body into an inner space and an outer space;
a temperature drop control heater configured to generate heat to control a temperature drop rate during dropping a temperature of the optical ceramic material to be heat treated;
a refrigerant intake unit configured to introduce a refrigerant into the outer space of the furnace body to flow the refrigerant therein; and
a control unit configured to control the temperature drop rate,
wherein the temperature drop control heater is arranged in the inside of the furnace body,
the control unit is configured to control at least one of an amount of heat generation of the temperature drop control heater, and a flow rate of the refrigerant in the inside of the furnace body to control a temperature drop rate at the optical ceramic material to be heat treated or in the vicinity thereof to be kept in a predetermined profile that is based on the optical ceramic material,
the optical ceramic material to be heat treated is arranged in the inner space,
the furnace body comprises a first furnace body and a second furnace body that are arranged in contact with each other in a vertical direction or in a horizontal direction,
the temperature drop control heater is provided in the inside of the second furnace body,
the refrigerant intake unit is installed to the second furnace body, and
in the inside of the first furnace body, a heater configured to raise the temperature of the optical ceramic material to be heat treated is provided.

2. The optical ceramic material heat treatment apparatus according to claim 1 , wherein the control unit is configured to control both the amount of heat generation of the temperature drop control heater and the flow rate of the refrigerant in the inside of the furnace body.

3. The optical ceramic material heat treatment apparatus according to claim 1 , further comprising a flow rate control unit configured to control the flow rate of the refrigerant that flows in the inside of the furnace body.

4. The optical ceramic material heat treatment apparatus according to claim 1 , wherein the temperature drop control heater is also configured to be a temperature rise heater during raising the temperature of the optical ceramic material to be heat treated.

5. The optical ceramic material heat treatment apparatus according to claim 1 , wherein the temperature drop control heater is arranged in the inner space.

6. The optical ceramic material heat treatment apparatus according to claim 1 , wherein the wall portion extends in a substantially vertical direction.

7. The optical ceramic material heat treatment apparatus according to claim 1 , wherein the refrigerant is at least one of air, nitrogen gas, inert gas, and mixtures thereof.

8. The optical ceramic material heat treatment apparatus according to claim 1 , wherein the refrigerant is a liquid.

9. The optical ceramic material heat treatment apparatus according to claim 1 , wherein the refrigerant intake unit is arranged on the lower part of the furnace body.

10. An optical ceramic material heat treatment method using the optical ceramic material heat treatment apparatus according to claim 1 , the method comprising:
heating an optical ceramic material to be heat treated to a predetermined temperature in a first temperature range and holding at the first temperature range for a predetermined time; and
performing heat treatment by cooling the heated optical ceramic material at a temperature drop rate larger than a predetermined temperature drop rate.

11. An optical ceramic material heat treatment method using the optical ceramic material heat treatment apparatus according to claim 1 , the method comprising:
heating an optical ceramic material to be heat treated to a predetermined temperature between 1000° C. and 1200° C. and holding the optical ceramic material at the predetermined temperature for a predetermined time, and
performing heat treatment by cooling the heated optical ceramic material at a temperature drop rate larger than 70° C./hour.

12. The heat treatment method for heat treating a synthetic silica glass according to claim 11 , wherein the heat treated synthetic silica glass has a maximum value of birefringence of 5 nm/cm or more.

13. A production method for producing an optical system, the method comprising:
providing a synthetic silica glass having a maximum value of birefringence of 5 nm/cm or more by the heat treatment method for heat treating the synthetic silica glass according to claim 12 ;
processing the heat treated synthetic silica glass to obtain an optical component; and
constituting an optical system including a plurality of optical components that include the obtained optical component.

14. A production method for producing an exposure apparatus, the method comprising:
producing an illumination optical system and/or a projection optical system by the production method for producing an optical system according to claim 13 ; and
incorporating the produced illumination optical system and/or the produced projection optical system to constitute the exposure apparatus.

Assignees

• Nikon Corp

Inventors

• Hara Yuta

Classifications

• C04B35/64

  Burning or sintering processes (C04B33/32 takes precedence {; powder metallurgy B22F}) · CPC title

• C03B32/02

  Thermal crystallisation, e.g. for crystallising glass bodies into glass-ceramic articles {(C03B27/012 takes precedence)} · CPC title

• C03B29/02

  in a discontinuous way · CPC title

• C03B25/02 Primary

  in a discontinuous way · CPC title

• G02B1/02

  made of crystals, e.g. rock-salt, semi-conductors (G02B1/08 takes precedence) · CPC title