PROCESS FOR NiFe FLUXGATE DEVICE
US-2016155935-A1 · Jun 2, 2016 · US
US9893141B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9893141-B2 |
| Application number | US-201514632519-A |
| Country | US |
| Kind code | B2 |
| Filing date | Feb 26, 2015 |
| Priority date | Feb 26, 2015 |
| Publication date | Feb 13, 2018 |
| Grant date | Feb 13, 2018 |
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Official abstract text for this publication.
A magnetic core includes a center section having a substantially uniform thickness, and an edge section connected to and surrounding the center section. The edge section includes a bottom portion and a top portion disposed on the bottom portion, in which the bottom portion has a gradual side surface since the top portion has a steep side surface. The profile of the magnetic core can be more rectangular thereby providing better inductor performance.
Opening claim text (preview).
What is claimed is: 1. A semiconductor device, comprising: a semiconductor substrate; and a magnetic core over the semiconductor substrate, the magnetic core comprising: a center section having a substantially uniform thickness; and an edge section connected to and surrounding the center section, the edge section comprising a bottom portion and a top portion disposed on the bottom portion, wherein the bottom portion has an inclined side surface, and the top portion has a curve side surface. 2. The semiconductor device of claim 1 , wherein a sum of a thickness of the bottom portion and a thickness of the top portion is substantially equal to the thickness of the center section. 3. The semiconductor device of claim 2 , wherein a ratio of the thickness of the bottom portion to the thickness of the top portion is in a range from about 2/3 to about 3/2. 4. The semiconductor device of claim 1 , wherein a width of the bottom portion extended from the center section is greater than a width of the top portion. 5. The semiconductor device of claim 1 , further comprising a middle portion disposed between the bottom portion and the top portion, wherein the middle portion has a steep side surface. 6. The semiconductor device of claim 5 , wherein the middle portion has a curve side surface. 7. A semiconductor device, comprising: a substrate; a bottom conductive layer disposed on the substrate; a bottom dielectric layer formed on the bottom conductive layer; a magnetic core formed on the bottom dielectric layer, the magnetic core comprising: a center section having a substantially uniform thickness; and an edge section connected to and surrounding the center section, the edge section comprising a bottom portion and a top portion disposed on the bottom portion, wherein the bottom portion is between the top portion and the substrate and is wider than the top portion; a top dielectric layer formed on the magnetic core; and a top conductive layer formed on the top dielectric layer. 8. The semiconductor device of claim 7 , wherein the bottom conductive layer and the top conductive layer form a winding wire wound on the magnetic core. 9. The semiconductor device of claim 7 , wherein the bottom portion has an inclined side surface, and the top portion has a curve side surface. 10. The semiconductor device of claim 7 , further comprising a middle portion disposed between the bottom portion and the top portion, wherein a side surface of the middle portion is steeper than a side surface of the bottom portion. 11. The semiconductor device of claim 7 , wherein the magnetic core is made of cobalt zirconium tantalum (CZT), nickel iron (NiFe), or iron nitride (FeN). 12. The semiconductor device of claim 10 , wherein the bottom portion has an inclined side surface, the middle portion has a curve surface, and the top portion has a curve surface. 13. The semiconductor device of claim 7 , wherein the bottom conductive layer and the top conductive layer are made of W, Co, Al, or Cu. 14. The semiconductor device of claim 7 , wherein the bottom dielectric layer and the top dielectric layer are made of silicon nitride, silicon carbide, nitrogen-doped silicon carbide, silicon oxynitride, oxygen-doped silicon carbide, or silicon oxide. 15. The semiconductor device of claim 7 , wherein the edge section comprises an anisotropic etched surface. 16. The semiconductor device of claim 7 , wherein a sum of a thickness of the bottom portion and a thickness of the top portion is substantially equal to the thickness of the center section. 17. The semiconductor device of claim 7 , wherein the magnetic core is not in a shape of triangle. 18. The semiconductor device of claim 7 , wherein the bottom portion is wider than the top portion. 19. A semiconductor device, comprising: a semiconductor substrate; and a magnetic core over the semiconductor substrate, the magnetic core comprising: a center section having a substantially uniform thickness; and an edge section connected to and surrounding the center section, wherein a side surface of the edge section has at least two different slopes. 20. The semiconductor device of claim 19 , wherein the center section and the edge section comprise a magnetic material.
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