Method of manufacturing semiconductor apparatus
US-9412785-B2 · Aug 9, 2016 · US
US9893110B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9893110-B2 |
| Application number | US-201615078128-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 23, 2016 |
| Priority date | Apr 6, 2015 |
| Publication date | Feb 13, 2018 |
| Grant date | Feb 13, 2018 |
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A method of manufacturing a solid-state image sensor is provided. The method comprises preparing a structure which is covered by a protective film, depositing a first material by using a first color filter material on the protective film, forming a first color filter from the first material, depositing a second material by using a second color filter material after the forming the first color filter and forming a second color filter from the second material. An upper surface of the protective film has a concave portion. A part of the first material enters the concave portion in the depositing the first material, the first material is patterned so as to form a member in the concave portion from the first material in the forming the first color filter and the second material covers the member in the depositing the second material.
Opening claim text (preview).
What is claimed is: 1. A method of manufacturing a solid-state image sensor, the method comprising: preparing a structure which includes a first region where photoelectric conversion is performed and a second region where a peripheral circuit is arranged, and in which a wiring layer and a protective film covering the wiring layer are arranged; depositing, over the structure, a first material film by using a color filter material of a first type; forming a color filter of the first type positioned in the first region from the first material film by patterning the first material film; depositing, over the structure, a second material film by using a color filter material of a second type different from the color filter material of the first type after the forming the color filter of the first type; and forming a color filter of the second type positioned in the first region from the second material film by patterning the second material film, wherein the structure has a concave portion of an upper surface of the protective film in the second region, a ratio of a width and a length of the concave portion being not less than three in a planar view with respect to the upper surface of the protective film, a part of the first material film enters the concave portion in the depositing the first material film, the first material film is patterned so as to form a member including the part of the first material film from the first material film in the forming the color filter of the first type, and the second material film covers the member in the depositing the second material film. 2. The method according to claim 1 , wherein the second material film is patterned such that a part of the second material film remains on the member in the forming the color filter of the second type. 3. The method according to claim 1 , further comprising depositing, over the structure, a third material film by using a color filter material of a third type different from the color filter material of the second type after the forming the color filter of the second type, and forming a color filter of the third type positioned in the first region from the third material film by patterning the third material film. 4. The method according to claim 1 , wherein the member is arranged inside a range having a width not more than a depth of the concave portion from an edge of the concave portion to an outside of the concave portion in a planar view with respect to an upper surface of the protective film in the forming the color filter of the first type, and a thickness from the upper surface of the protective film to an upper surface of the member is not more than the depth. 5. The method according to claim 1 , wherein the member is arranged inside an edge of the concave portion in a planar view with respect to an upper surface of the protective film, and the member has a thickness not more than a depth of the concave portion. 6. The method according to claim 1 , wherein an upper surface of the protective film in the second region has a portion higher than an upper surface of the protective film in the first region. 7. The method according to claim 1 , wherein a thickness of the color filter of the first type is larger than a thickness of any color filter other than the color filter of the first type. 8. The method according to claim 1 , wherein the color filter of the first type is coupled in the first region. 9. The method according to claim 1 , wherein the color filter of the first type is a color filter which transmits green light. 10. The method according to claim 1 , wherein the color filter of the second type is a color filter which transmits blue light. 11. The method according to claim 1 , wherein the concave portion is formed along a wiring pattern of the wiring layer.
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
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