Illumination optical unit

Patent metadata

Field	Value
Publication number	US-9891530-B2
Application number	US-201414567645-A
Country	US
Kind code	B2
Filing date	Dec 11, 2014
Priority date	Jul 17, 2012
Publication date	Feb 13, 2018
Grant date	Feb 13, 2018

Abstract

An illumination optical unit comprises a first faceted element and a second faceted element having a multiplicity of displaceable micromirrors which can be grouped flexibly to form facets.

First claim

The invention claimed is:

1. An illumination optical unit configured to transfer illumination radiation having a predefined intensity distribution in an intermediate focal plane from the intermediate focal plane to an object field along a beam path, the illumination optical unit comprising:
a first faceted element; and
a second faceted element downstream of the first faceted element along the beam path, the second faceted element comprising a multiplicity of displaceable micromirrors that are groupable to define facets in a variably flexible manner,
wherein the displaceable micromirrors are grouped to define facets so that, during use of the illumination optical unit:
an intensity distribution on at least one facet has a minimum (I min ) and a maximum (I max ), and I min ≧0.05 I max ; and
at least 5% of the illumination radiation does not contribute to illumination of the object field.

2. The illumination optical unit of claim 1 , wherein the micro mirrors are groupable to define facets of different illumination pupils.

3. The illumination optical unit of claim 2 , wherein different illumination pupils have different étendues.

4. The illumination optical unit of claim 2 , wherein different illumination pupils have different transmissions.

5. The illumination optical unit of claim 2 , wherein different illumination pupils have different pupil fillings.

6. The illumination optical unit of claim 1 , wherein the groupable micromirrors are grouped so that different facets of a grouping have a different geometrical design.

7. The illumination optical unit of claim 1 , wherein the facets of the first faceted element are displaceable.

8. The illumination illumination optical unit of claim 1 , wherein I min ≧0.10 I max .

9. The illumination illumination optical of claim 1 , wherein I min ≧0.15 I max .

10. An illumination optical system, comprising:
a radiation source; and
an illumination optical unit according to claim 1 .

11. The illumination optical system of claim 10 , wherein the groupable micromirrors are grouped to define facets of an illumination pupil having an étendue.

12. The illumination optical system of claim 11 , wherein a geometrical design of the facets is based on properties of the radiation source.

13. The illumination optical system of claim 10 , further comprising a stop, wherein a size and/or a form of the stop is adapted to the size and/or form of the facets.

14. The illumination optical system of claim 10 , wherein the facets have a size which is smaller than a size of an image of the radiation source on the second faceted element.

15. The illumination optical system of claim 10 , wherein a totality of regions of the first faceted element configured to guide illumination radiation into an object field has a size which is smaller than a size of a region illuminatable by the radiation source on the first faceted element.

16. The illumination optical system of claim 10 , further comprising a stop in a region of the intermediate focal plane, and the stop has a radiation-transmissive region which is smaller than a size of an image of the radiation source in the region of the intermediate focal plane.

17. The illumination optical system of claim 10 , wherein, during use of the illumination system, facets that illuminate an object field contribute to the illumination of the object field that so that the contribution of two arbitrary facets deviates from each other by at most 10%.

18. The illumination optical system of claim 10 , wherein the micromirrors are grouped so that the étendue in the beam path downstream of the second faceted element is at least 5% less than the étendue in the beam path upstream of the second faceted element.

19. An apparatus, comprising:
an illumination optical unit according to claim 1 ;
a radiation source configured to generate the illumination radiation; and
a projection optical unit,
wherein the apparatus is a microlithography projection exposure apparatus.

20. A method of using a microlithography projection exposure apparatus which comprises a radiation source, an illumination optical system and a projection optical system, the method comprising:
using the illumination optical system to illuminate a reticle; and
using the projection optical system to project at least a portion of the illuminated reticle onto a light-sensitive material,
wherein the illumination optical system is an illumination optical unit according to claim 1 , and the radiation source is configured to generate the illumination radiation.

21. A method, comprising:
providing a microlithography projection exposure apparatus comprising an illumination optical unit according to claim 1 , a radiation source configured to generate the illumination radiation, and a projection optical system;
predefining an illumination pupil having an étendue;
predefining at least one parameter to be adapted to the illumination pupil;
grouping at least some of the micromirrors of the second faceted element to form facets,
wherein:
in each case one of the facets is assigned to a facet of the first faceted element so that illumination radiation from a radiation source is applied to it via the respective facet;
the micromirrors are grouped to form facets so that the parameter to be adapted lies in a predetermined range;
the illumination parameter to be adapted is the transmission and/or pupil filling; and
for adapting the illumination parameter, the number and/or size and/or arrangement of the facets are/is chosen.

22. A method according to claim 21 , wherein an étendue of the predefined illumination pupil is lower than an étendue of the radiation source.

23. The illumination optical unit of claim 1 , wherein the at least 5% of the illumination radiation that does not contribute to illumination of the object field is a phase space region of the illumination radiation having the lowest intensity.

Assignees

• Zeiss Carl Smt Gmbh

Inventors

• Endres Martin
• Patra Michael

Classifications

• G02B26/0833

  the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD (G02B26/0825 takes precedence; micromechanical devices in general B81B) · CPC title

• G03F7/70083

  Non-homogeneous intensity distribution in the mask plane · CPC title

• G03F7/70075

  Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection · CPC title

• G21K1/06

  using diffraction, refraction or reflection, e.g. monochromators (G21K1/10, G21K7/00 take precedence) · CPC title

• G03F7/70233

  Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems · CPC title