Common deposition platform, processing station, and method of operation thereof

Patent metadata

Field	Value
Publication number	US-9873945-B2
Application number	US-201313871899-A
Country	US
Kind code	B2
Filing date	Apr 26, 2013
Priority date	Jan 31, 2013
Publication date	Jan 23, 2018
Grant date	Jan 23, 2018

Abstract

An apparatus includes a substrate support having an outer surface for guiding the substrate through a first vacuum processing region and at least one second vacuum processing region. First and second deposition sources correspond to the first processing region and at least one second deposition source corresponds to the at least one second vacuum processing region, wherein at least the first deposition source includes an electrode having a surface that opposes the substrate support. A processing gas inlet and a processing gas outlet are arranged at opposing sides of the surface of the electrode. At least one separation gas inlet how one or more openings, wherein the one or more openings are at least provided at one of opposing sides of the electrode surface such that the processing gas inlet and/or the processing gas outlet are provided between the one or more openings and the surface of the electrode.

First claim

The invention claimed is:

1. An apparatus for depositing a thin film on a substrate, comprising:
a substrate support having an outer surface for guiding the substrate along a surface of the substrate support through a first vacuum processing region and at least one second vacuum processing region;
a first deposition source corresponding to the first processing region and at least one second deposition source corresponding to the at least one second vacuum processing region, wherein at least the first deposition source comprises:
an electrode having a surface, wherein the surface of the electrode opposes the surface of the substrate support;
a processing gas inlet and a processing gas outlet, wherein the processing gas inlet and the processing gas outlet are arranged at opposing sides of the surface of the electrode, wherein at least the first deposition source is configured for providing a gas flow of processing gas from the processing gas inlet to the processing gas outlet along the surface of the electrode;
at least one separation gas inlet having one or more separation gas inlet openings, wherein the one or more separation gas inlet openings are at least provided at opposing sides of the surface of the electrode such that the processing gas inlet and the processing gas outlet are provided between the one or more separation gas inlet openings and the surface of the electrode; and
at least one first separation wall, wherein the at least one first separation wall is provided at opposing sides of the surface of the electrode such that the processing gas inlet and the processing gas outlet are provided between the at least one first separation wall and the surface of the electrode, wherein the at least one first separation wall is provided between the at least one separation gas inlet and the surface of the electrode, wherein at least one intermediate gas inlet area is provided between the at least one separation gas inlet and the at least one first separation wall, and wherein the at least one or more separation gas inlet openings are arranged to provide a separation gas in the at least one intermediate gas inlet area and to direct separation gas from the at least one or more separation gas inlet openings across the at least one intermediate gas inlet area towards the at least one first separation wall; and

one or more vacuum flanges providing at least a further gas outlet between the first deposition source and the at least one second deposition source, wherein the one or more vacuum flanges are configured such that one or more vacuum pumps are connected to the one or more vacuum flanges to generate a vacuum with a pressure of 10 mbar or below in either the first vacuum processing region or the at least one second vacuum processing region.

2. The apparatus according to claim 1 , wherein the one or more vacuum flanges are provided between a first separation gas inlet of the at least one separation gas inlet of the first deposition source and a second separation gas inlet of at least one separation gas inlet of the second deposition source.

3. The apparatus according to claim 1 , wherein the separation gas inlet of at least the first deposition source has the one or more separation gas inlet openings such that the one or more separation gas inlet openings surround or are distributed around the surface of the electrode.

4. The apparatus according to claim 1 , wherein the at least one first separation wall surrounds the surface of the electrode, wherein the processing gas inlet and the processing gas outlet are provided within the perimeter of the first separation wall.

5. The apparatus according to claim 1 , wherein at least the first deposition source further comprises:
at least one second separation wall, wherein the at least one second separation wall is provided at opposing sides of the surface of the electrode such that the at least one separation gas inlet is provided between the at least one second separation wall and the at least one first separation wall.

6. The apparatus according to claim 5 , wherein the at least one second separation wall surrounds the surface of the electrode, wherein the at least one separation gas inlet is provided within the perimeter of the second separation wall.

7. The apparatus according to claim 1 , wherein the surface of the substrate support is a curved surface of a coating drum and the surface of the electrode is a curved surface.

8. The apparatus according to claim 7 , wherein the substrate is a flexible substrate, and wherein the flexible substrate is guided from an unwinding roll to a winding roll via the coating drum and an arrangement of a plurality of rollers, and wherein the arrangement of plurality of rollers are arranged such that only the backside of the flexible substrate is contacted.

9. The apparatus according to claim 7 , wherein the curved surface of the coating drum and the curved surface of the electrode of at least the first deposition source are separated by a distance, and wherein the distance can be adjusted by positioning at least the first deposition source.

10. The apparatus according to claim 7 , wherein the curved surface is shaped such that the electrode has an essentially parallel surface with respect to the surface of the coating drum.

11. The apparatus according to claim 1 , wherein at least the first deposition source is included in a deposition station, and wherein the deposition station includes the first deposition source, the processing gas inlet, the processing gas outlet, and the at least one separation gas inlet, which are formed as one unit.

12. The apparatus according to claim 1 , wherein the at least one separation wall forms a gas separation unit comprising an actuator configured to adjust a position of the gas separation unit.

13. The apparatus according to claim 12 , wherein the gas separation unit comprises a support element which mechanically connects the gas separation unit to the substrate support.

14. An apparatus for depositing a thin film on a substrate, comprising:
a substrate support having an outer surface for guiding the substrate along a surface of the substrate support through a first vacuum processing region and at least one second vacuum processing region;
a first deposition station corresponding to the first vacuum processing region and at least one second deposition station corresponding to the at least one second vacuum processing region, wherein at least the first deposition station comprises:
an electrode having a surface, wherein the surface of the electrode opposes the surface of the substrate support;
a processing gas inlet and a processing gas outlet, wherein the processing gas inlet and the processing gas outlet are arranged at opposing sides of the surface of the electrode, wherein at least the first deposition station is configured for providing a gas flow of processing gas from the processing gas inlet to the processing gas outlet along the surface of the electrode;
a first separation wall surrounding the surface of the electrode and the processing gas inlet and processing gas outlet, wherein the processing gas inlet and the processing gas outlet are provided between the first separation wall and the surface of the electrode;
at least one separation gas inlet surrounding the first separation wall, wherein an at least one intermediate gas inlet area is provided between the at least one separation gas inlet and the first separation wall, and wherein the at least one separation gas inlet is arranged to provide a separation gas in the at least one intermediate gas inlet area and to direct separation gas from the at least one gas inlet

Assignees

• Applied Materials Inc

Inventors

• Morrison Neil
• Dieguez-Campo Jose Manuel
• Landgraf Heike
• Stolley Tobias
• Hein Stefan
• Ries Florian
• Buschbeck Wolfgang

Classifications

• H01J37/3277

  of continuous material · CPC title

• C23C16/45517

  Confinement of gases to vicinity of substrate · CPC title

• H01J37/32568

  Relative arrangement or disposition of electrodes; moving means · CPC title

• C23C16/45519

  Inert gas curtains · CPC title

• H01J37/32761

  Continuous moving · CPC title