Method for treating plate

US9873935B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9873935-B2
Application numberUS-201514727131-A
CountryUS
Kind codeB2
Filing dateJun 1, 2015
Priority dateMay 31, 2014
Publication dateJan 23, 2018
Grant dateJan 23, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method for locally treating a plate is disclosed. A pattern formed from a compound containing at least one alloying element is applied onto at least one surface of the plate. At least the surface of a contacting layer including the pattern is covered by adequately heat-resistant material. The plate is subsequently heat treated in order to diffuse the alloying element into the plate.

First claim

Opening claim text (preview).

What is claimed is: 1. A method for treating a plate comprising: applying a pattern onto a major face of a first plate, wherein the pattern comprises a compound containing at least one alloying element; covering at least a portion of the major face having the pattern with a contacting layer of material that is resistant to a heat treatment; subsequently heat treating of the first plate to diffuse the alloying element into a diffusion region therein; and diffusing the alloying element so that the diffusion region extends completely through the first plate. 2. The method for treating a plate according to claim 1 , wherein the contacting layer comprises a second plate to be treated. 3. The method for treating a plate according to claim 2 , wherein the second plate is present during the heat treatment in the form of a stack of plate parts of the same geometry as the first. 4. The method for treating a plate according to claim 3 , wherein the plate parts are plate-shaped and during the heat treatment lie flat on one another. 5. The method for treating a plate according to claim 1 , wherein heat treating of the first plate comprises heat treating the first plate while the first plate is in the form of a coil. 6. The method for treating a plate according to claim 1 , wherein applying the pattern comprises printing the compound onto the major face of the first plate. 7. The method for treating a plate according to claim 6 , wherein applying the pattern comprises intaglio printing the compound onto the major face of the first plate. 8. The method for treating a plate according to claim 6 , wherein applying the pattern comprises screen printing the compound onto the major face of the first plate. 9. The method for treating a plate according claim 1 , wherein applying the pattern comprises spraying the compound onto the major face of the first plate. 10. The method for treating a plate according claim 1 , wherein the pattern is applied onto both the first major face and a second major face of the first plate. 11. The method for treating a plate according to claim 10 , further comprising bringing the second major face into contact with the pattern formed on the contacting layer. 12. The method for treating a plate according claim 10 , wherein the pattern is congruently applied onto both the first and second major faces. 13. The method for treating a plate according claim 1 , wherein the compound contains a powder of the at least one alloying element. 14. The method for treating a plate according to claim 1 , further comprising heat treating the first plate in a stationary oven. 15. The method for treating a plate according to claim 1 , further comprising heat treating the first plate in a bell oven. 16. The method for treating a plate according to claim 1 , further comprising heat treating the first plate in an inert gas atmosphere or in vacuum. 17. The method for treating a plate according to claim 1 , further comprising heat treating the first plate in a vacuum. 18. A method for treating a plate that has edges comprising: applying a pattern onto a major face of a first plate, wherein the pattern comprises a compound containing at least one alloying element; leaving a region along each of the edges free of the compound; covering at least a portion of the major face having the pattern with a contacting layer of material that is resistant to a heat treatment; heat treating the first plate to diffuse the alloying element therein; and maintaining a region along each of the edges with no diffusion of the alloying element. 19. The method for treating a plate according to claim 18 , further comprising reacting the edges with atmospheric oxygen. 20. A method for treating a plate comprising: applying a pattern onto a major face of a first plate, wherein the pattern comprises a compound containing at least one alloying element; covering at least a portion of the major face having the pattern with a contacting layer of material that is resistant to a heat treatment; heat treating the first plate to diffuse the alloying element therein; and holding a temperature of the heat treating for 10 to 60 minutes to achieve diffusion of the alloying element from the compound into the first plate, wherein the temperature is between 200° C. and 600° C.

Assignees

Inventors

Classifications

  • C23C10/04Primary

    Diffusion into selected surface areas, e.g. using masks · CPC title

  • using a layer of powder or paste on the surface (using liquid suspensions of solids C23C10/18) · CPC title

  • using solids, e.g. powders, pastes · CPC title

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Frequently asked questions

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What does patent US9873935B2 cover?
A method for locally treating a plate is disclosed. A pattern formed from a compound containing at least one alloying element is applied onto at least one surface of the plate. At least the surface of a contacting layer including the pattern is covered by adequately heat-resistant material. The plate is subsequently heat treated in order to diffuse the alloying element into the plate.
Who is the assignee on this patent?
Gm Global Tech Operations Llc
What technology area does this patent fall under?
Primary CPC classification C23C10/04. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jan 23 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).