Scanning ion beam deposition and etch
US-12176178-B2 · Dec 24, 2024 · US
US9932665B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9932665-B2 |
| Application number | US-201514603233-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 22, 2015 |
| Priority date | Jan 22, 2015 |
| Publication date | Apr 3, 2018 |
| Grant date | Apr 3, 2018 |
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A process for applying a chromized layer on a substrate by first applying an overlay coating to a portion of the substrate, and subsequently contacting a different portion of the substrate and the overlay with a gas containing gaseous chromium, wherein the gaseous chromium can be generated from a chromium source and an activator. The process prepares the substrate, often a jet engine airfoil, for service.
Opening claim text (preview).
The invention claimed is: 1. A process for applying a chromized layer on a substrate comprising the steps of: applying an overlay coating to a portion of the substrate, and contacting a different portion of the substrate and the overlay with a gas containing gaseous chromium wherein the gaseous chromium is generated from a chromium source and an activator so as to deposit the chromized layer on the different portion of the substrate, wherein the overlay is a ceramic thermal barrier coating. 2. A process according to claim 1 , wherein the ceramic thermal barrier coating contains ceramics selected from the group consisting of Lanthanum Zirconate and Gadolinium Zirconate, Yttria-stabilized zirconia and mixtures thereof. 3. A process according to claim 1 , wherein the thermal barrier coating is applied using a method selected from the group consisting of: electron beam physical deposition, air plasma spray and combinations thereof. 4. A process according to claim 1 , wherein the applying step comprises applying a metallic overlay to the portion of the substrate and applying the ceramic thermal barrier coating to the metallic overlay. 5. A process according to claim 1 , wherein the substrate is an aircraft engine airfoil. 6. A process according to claim 5 , wherein the airfoil is a high pressure stage turbine airfoil. 7. A process according to claim 1 , wherein the substrate is made of a nickel-based superalloy. 8. A process according to claim 1 , wherein the gaseous chromium comprises chromium halide compounds. 9. A process according to claim 1 , wherein the process takes place in an enclosed space. 10. A process according to claim 1 , wherein the applying step takes place in a vacuum. 11. A process according to claim 10 , wherein temperature inside the enclosed space is between 1000° F. and 1975° F. during the applying step. 12. A process according to claim 10 , wherein temperature inside the enclosed space is between 1950° F. and 2000° F. during the contacting step. 13. A process according to claim 12 , wherein temperature inside the enclosed space is held between 12 and 16 hours during the contacting step. 14. A process according to claim 1 , wherein the contacting step does not negatively affect bond coat oxidation, hot corrosion resistance, thermal bond coating spallation life, mechanical properties and thermal conductivity of the overlay. 15. A process according to claim 1 , wherein the chromized layer contains chromium in an amount between 17% and 40% by weight. 16. A process according to claim 1 , wherein the ratio of chromium to activator is 0.3:1. 17. A process according to claim 1 , wherein the chromium is present in an amount between 25 and 60% by weight of combined chromium source and activator. 18. A process according to claim 1 , wherein thickness of alpha (α) chromium at the surface of the chromized layer does not exceed 0.0002 inches. 19. A process according to claim 1 , wherein the resulting thickness of the chromized layer produced by the contacting step is between 0.0006 and 0.0013 inches on the substrate. 20. A process according to claim 1 , wherein the substrate contains internal air passageways and wherein the contacting step deposits the chromized layer on the internal passageways. 21. A process according to claim 20 , wherein the chromized layer contains at least 17% by weight chromium on the internal air passageways. 22. A process according to claim 21 , wherein thickness of the chromized layer produced by the contacting step is between 0.0003 and 0.0013 inches on the internal passageways. 23. A process according to claim 1 , wherein the substrate is put into service after the contacting step.
Chromising · CPC title
Metallic material, boron or silicon · CPC title
Ion beam deposition (C23C14/46, C23C14/48 take precedence) · CPC title
Diffusion into selected surface areas, e.g. using masks · CPC title
Efficient propulsion technologies, e.g. for aircraft · CPC title
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