Production of a GaN bulk crystal substrate and a semiconductor device formed on a GaN bulk crystal substrate

US9869033B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9869033-B2
Application numberUS-201514619237-A
CountryUS
Kind codeB2
Filing dateFeb 11, 2015
Priority dateJun 9, 1999
Publication dateJan 16, 2018
Grant dateJan 16, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

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A crystal has a diameter of 1 cm or more and shows a strongest peak in cathode luminescent spectrum at a wavelength of 360 nm in correspondence to a band edge.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of producing a group III nitride crystal in a reaction vessel pressurized to a higher pressure than that of a surrounding, said method comprising the steps of: forming a mixed melt comprising a group III metal element and an alkali metal element in the reaction vessel; disposing a seed crystal in the reaction vessel; supplying a nitrogen source of nitrogen or a compound containing nitrogen to the reaction vessel, the nitrogen source causing a reaction with the mixed melt and forming the group III nitride crystal; and growing the group III nitride crystal on an outer side of the seed crystal. 2. The method of producing a group III nitride crystal as claimed in claim 1 , wherein the step of growing causes the group III nitride crystal to grow in an outward direction from a center of said seed crystal to outward of said seed crystal. 3. The method of producing a group III nitride crystal as claimed in claim 1 , wherein the step of growing causes the group III nitride crystal to grow at least in a direction parallel to a vapor-melt interface. 4. The method of producing a group III nitride crystal as claimed in claim 1 , wherein the seed crystal has a shape of a slab.

Assignees

Inventors

Classifications

  • Nitride Group III-V materials, e.g. AlN or GaN · CPC title

  • C30B9/00Primary

    Single-crystal growth from melt solutions using molten solvents (by normal or gradient freezing C30B11/00; by zone-melting C30B13/00; by crystal pulling C30B15/00; on immersed seed crystal C30B17/00; by liquid phase epitaxial growth C30B19/00; under a protective fluid C30B27/00) · CPC title

  • Single-crystal growth by pulling from a melt, e.g. Czochralski method (under a protective fluid C30B27/00) · CPC title

  • Gallium nitride · CPC title

  • Shape defined by a solid member other than seed or product [e.g., Bridgman-Stockbarger] · CPC title

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Frequently asked questions

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What does patent US9869033B2 cover?
A crystal has a diameter of 1 cm or more and shows a strongest peak in cathode luminescent spectrum at a wavelength of 360 nm in correspondence to a band edge.
Who is the assignee on this patent?
Ricoh Co Ltd
What technology area does this patent fall under?
Primary CPC classification C30B9/00. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jan 16 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).